EP0592017A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
Assignee: ASM America Inc
•
Filing: 1988-03-30
•
Granted: —
•
Expires: 2008-03-30
Abstract
Abstract The invention describes an apparatus used for chemical vapor deposition of materials on substrates such as semi conductor wafers, comprising: a circular, substantially planar susceptor having an upper surface for centrally receiving a substrate for chemical deposition purposes; and a susceptor ring structure separate from said susceptor having an inner diameter slightly larger than the outer diameter of said susceptor to enable the positioning of said ring structure in substantially concentric relation with the susceptor and to enable said susceptor to be rotated while the ring structure is fixed, including a passage for supporting one or more sensors close to the periphery of the susceptor to monitor the temperature adjacent the periphery of the susceptor.
Inventors
- 👤 Wiebe De Boer
- 👤 Albert E. Ozias
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 02:28
CPC Classifications
B; B65; B65G; B65G11/00; C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45519; C23C16/45521; B05; B05C; B05C11/00; B05C11/02; B05C11/08; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4584; H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0436; H10P72/06; H10P72/0602; H10P72/50; H10P72/70; H10P72/76; H10P72/7604; H10P72/7624; H10P72/7626
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
111 words
An apparatus used for chemical vapor deposition of materials on substrates such as semiconductor wafers, comprising: a circular, substantially planar susceptor having an upper surface for centrally receiving a substrate for chemical deposition purposes; and a susceptor ring structure separate from said susceptor having an inner diameter slightly larger than the outer diameter of said susceptor to enable the positioning of said ring structure in substantially concentric relation with the susceptor and to enable said susceptor to be rotated while the ring structure is fixed, including a passage for supporting one or more sensors close to the periphery of the susceptor to monitor the temperature adjacent the periphery of the susceptor.
Claim 2
Dependent Claim
25 words
The apparatus of Claim 1, wherein said passage is annular and said ring structure includes one or more apertures for inserting sensors into said passage.
Claim 3
Dependent Claim
84 words
The apparatus of Claim 2, wherein said apertures include an aperture on a side of said ring structure for inserting a sensor to a location at a leading edge of the ring structure, with respect to the direction of gaseous flow across the ring structure, an aperture for positioning a sensor at a trailing edge of said susceptor spaced about 180° from the leading edge, and an aperture for positioning a sensor in the passage at a location between the leading and trailing edges.
Claim 4
Dependent Claim
24 words
The apparatus of Claim 1, wherein said ring structure includes an inner ring body and an outer ring body which cooperatively define said passage.
Claim 5
Dependent Claim
57 words
The apparatus of Claim 4, wherein said inner ring body has an inner, imperforate annular vertical wall and an imperforate, annular, radially extending horizontal wall, and said outer ring body engages a surface of said horizontal wall and includes a vertical, outer, annular wall with one or more apertures formed therein for inserting sensors into said passage.
Claim 6
Independent Claim
40 words
The apparatus of any of Claims 1-5 and 13, wherein said ring structure includes one or more recesses in a lower surface for receiving one or more upwardly extending pins to removably support said ring within a vapor deposition chamber.
Claim 7
Independent Claim
33 words
The apparatus of any of Claims 1-6 and 12, wherein said susceptor has one or more recesses in its lower surface for removably receiving at least three upstanding pegs for supporting said susceptor.
Claim 8
Independent Claim
31 words
The apparatus of Claims 7 or 12, including a support spider having a central hub with a plurality of spaced radially extending arms with upstanding pegs which fit into said recesses.
Claim 9
Independent Claim
15 words
The apparatus of any of Claims 1-8, wherein said susceptor upper surface is generally non-smooth.
Claim 10
Independent Claim
27 words
The apparatus of any of Claims 1-9, wherein said susceptor has a central recess in its upper surface for receiving and retaining a substrate within a rim.
Claim 11
Independent Claim
35 words
The apparatus of any of Claims 1-10, wherein said susceptor upper surface has a plurality of grooves and channels which cooperatively interact to allow the free flow of gases between the substrate and the susceptor.
Claim 12
Dependent Claim
49 words
Chemical vapor deposition apparatus comprising a generally circular substantially planar susceptor having an upper surface for centrally receiving a substrate for deposition purposes, said upper surface having a plurality of grooves and channels that cooperatively interact to allow the free flow of gases between the substrate and the susceptor.
Claim 13
Dependent Claim
60 words
Chemical vapor deposition apparatus comprising a separate ring structure for positioning in concentric relation with a susceptor adapted to receive a substrate for deposition purposes, said ring structure having an annular passage about said ring structure, and apertures leading into said passage for receiving and supporting one or more sensors for monitoring the temperature adjacent the periphery of the susceptor.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.