Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes

Abstract

Abstract Coatings produced by means of the deposition of thin films formed by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes having the structure [RR′SiO] x , where R is an alkyl group with 1-6 carbon atoms, R′ is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. The process consists of introducing vaporized siloxane into a deposition chamber containing the substrate to be coated; the reaction of the vapor is then induced by means of a plasma that has been excited by radio-frequency (RF) [electric field]. The particular coatings thus produced have useful physical properties.

Inventors

• 👤 Riccardo D'agostino
• 👤 Gerardo Caporiccio
• 👤 Pietro Favia

Bibliographic Details