← Back to Patent Explorer
EP0518467A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Substrate for recording head, recording head and method for producing same

Assignee: Canon Inc
•
Filing: 1992-04-16
•
Granted: —
•
Expires: 2012-04-16
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A method for producing a substrate (100) for a recording head wherein a plurality of electro-thermal converting elements (110), a plurality of driving functional elements (120) for respectively driving the electro-thermal converting elements (110) and a plurality of wiring electrodes (104) for respectively connecting each of the driving functional elements (120) and each of the electro-thermal converting elements (110) are formed on a supporting member by photolithography comprises forming the wiring electrodes by etching a material layer for the wiring electrodes (104) while etchingwise removing a photoresist for masking the material layer for the wiring electrodes (104). <IMAGE>

Inventors

  • 👤 Shigeyuki C/O Canon Kabushiki Kaisha Matsumoto
  • 👤 Yasuhiro C/O Canon Kabushiki Kaisha Naruse
  • 👤 Genzo c/o Canon Kabushiki Kaisha Monma
  • 👤 Kei C/O Canon Kabushiki Kaisha Fujita
  • 👤 Seiji c/o Canon Kabushiki Kaisha Kamei
  • 👤 Yutaka c/o Canon Kabushiki Kaisha Akino
  • 👤 Yasuhiro c/o Canon Kabushiki Kaisha Sekine
  • 👤 Yukihiro C/O Canon Kabushiki Kaisha Hayakawa

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 04:26
CPC Classifications
B; B41; B41J; B41J2/00; B41J2/005; B41J2/01; B41J2/135; B41J2/16; B41J2/1621; B41J2/1626; B41J2/1629; B41J2/14; B41J2/14016; B41J2/14088; B41J2/14112; B41J2/14129; B41J2/1601; B41J2/1604; B41J2/1628; B41J2/1631; B41J2/164; B41J2/1642; H; H10; H10P; H10P50/00; H10P50/60; H10P50/66; H10P50/663; H10P50/667; H10P95/00; B41J2202/00; B41J2202/01; B41J2202/03; B41J2202/13

Claims Analysis

Total Claims: 57
Claim 1
Independent Claim 89 words
A method for producing a substrate for a recording head wherein a plurality of electro-thermal converting elements, a plurality of driving functional elements for respectively driving said electro-thermal converting elements, and a plurality of wiring electrodes for respectively connecting each of said driving functional elements and each of said electro-thermal converting elements are formed on a supporting member by photolithography, which comprises forming said wiring electrodes by etching a material layer for said wiring electrodes while etchingwise removing a photoresist for masking said material layer for said wiring electrodes.
Claim 2
Dependent Claim 53 words
A method according to Claim 1, wherein said wiring electrodes are formed by etching said material layer for said wiring electrodes while etchingwise removing said photoresist for masking said material layer for said wiring electrodes by spraying alternatively an etching liquid for said wiring electrodes and an alkaline solution comprising mainly tetramethylammonium hydroxide.
Claim 3
Dependent Claim 51 words
A method according to Claim 1, wherein said wiring electrodes are formed by etching said material layer for said electrode wiring while etchingwise removing said photoresist for masking said material layer for said wiring electrodes by spraying alternatively two kinds of alkaline solutions comprising mainly tetramethylammonium hydroxide kept at different temperatures.
Claim 4
Dependent Claim 18 words
A method according to Claim 1, wherein said material layer for said wiring electrodes is an aluminum layer.
Claim 5
Dependent Claim 21 words
A method according to Claim 2, wherein the concentration of tetramethylammonium hydroxide in said alkaline solution is 1.5 - 3.0 %.
Claim 6
Dependent Claim 21 words
A method according to Claim 3, wherein the concentration of tetramethylammonium hydroxide in said alkaline solution is 1.5 - 3.0 %.
Claim 7
Dependent Claim 29 words
A method according to Claim 2, further comprising a step of developing said photoresist for masking using an alkaline solution comprising mainly tetramethylammonium hydroxide kept at 30 - 55°C.
Claim 8
Dependent Claim 29 words
A method according to Claim 3, further comprising a step of developing said photoresist for masking using an alkaline solution comprising mainly tetramethylammonium hydroxide kept at 35 - 55°C.
Claim 9
Independent Claim 142 words
A method for producing a recording head including a substrate forming step of forming a substrate for said recording head by forming a plurality of electro-thermal converting elements, a plurality of driving functional elements for respectively driving said electro-thermal converting elements and a plurality of wiring electrodes for respectively connecting each of said electro-thermal converting elements and each of said driving functional elements on a supporting member by photolithography and an ink discharging portion forming step of forming an ink discharging portion having a plurality of ink discharging openings for discharging an ink on said substrate for said recording head, which comprises a wiring electrode etching step of forming said wiring electrodes by etching a material layer for said wiring electrodes while etchingwise removing a photoresist for masking said material layer for said wiring electrodes in the step of forming said substrate.
Claim 10
Dependent Claim 55 words
A method according to Claim 9, wherein in the wiring electrode etching step, said wiring electrodes are formed by etching said material layer while etchingwise removing said photoresist for masking said material layer for said wiring electrodes by spraying alternatively an etching liquid for said wiring electrodes and an alkaline solution comprising mainly tetramethylammonium hydroxide.
Claim 11
Dependent Claim 53 words
A method according to Claim 9, wherein in the wiring electrode etching step, said wiring electrodes are formed by etching said material layer while etchingwise removing said photoresist for masking said material layer for said wiring electrodes by spraying alternatively two kinds of alkaline solutions comprising mainly tetramethylammonium hydroxide kept at different temperatures.
Claim 12
Dependent Claim 18 words
A method according to Claim 9, wherein said material layer for said wiring electrodes is an aluminum layer.
Claim 13
Dependent Claim 21 words
A method according to Claim 10, wherein the concentration of tetramethylammonium hydroxide in said alkaline solution is 1.5 - 3.0 %.
Claim 14
Dependent Claim 21 words
A method according to Claim 11, wherein the concentration of tetramethylammonium hydroxide in said alkaline solution is 1.5 - 3.0 %.
Claim 15
Dependent Claim 29 words
A method according to Claim 10, further comprising a step of developing said photoresist for masking using an alkaline solution comprising mainly tetramethylammonium hydroxide kept at 30 - 55°C.
Claim 16
Dependent Claim 29 words
A method according to Claim 11, further comprising a step of developing said photoresist for masking using an alkaline solution comprising mainly tetramethylammonium hydroxide kept at 30 - 50°C.
Claim 17
Independent Claim 98 words
A method for producing a substrate for an ink jet recording head wherein a group of electro-thermal converting elements, a group of functional elements for respectively driving each of said group of electro-thermal converting elements, and a group of wiring electrodes for connecting each of said group of functional elements and said electro-thermal converting elements are formed on a supporting member by photolithography, which comprises a wiring electrode group etching step of forming stepwise the connecting face of each electrode of said group of wiring electrodes by etching of plural times while etchingwise removing a photoresist for masking.
Claim 18
Dependent Claim 42 words
A method according to Claim 17, wherein in the wiring electrode group etching step, the side face of each electrode of said group of wiring electrodes together with the connecting face of said electrode is etched plural times to be shaped stepwise.
Claim 19
Dependent Claim 52 words
A method according to Claim 17, wherein in the wiring electrode group etching step, the etching is effected by immersing a material layer for said wiring electrodes alternatively in an etching liquid for said wiring electrodes and in an aqueous solution comprising mainly tetramethyl ammonium hydroxide for etching said photoresist for masking.
Claim 20
Dependent Claim 14 words
A method according to Claim 17, wherein said material for wiring electrodes is aluminum.
Claim 21
Independent Claim 135 words
A method for producing an ink jet recording head including a substrate forming step of forming a substrate by forming a group of electro-thermal converting elements, a group of functional elements for respectively driving each of said group of electro-thermal converting elements, and a group of wiring electrodes for connecting each of said group of functional elements and said electro-thermal converting elements on a supporting member and an ink discharge portion forming step of forming an ink discharging portion having a plurality of ink discharging openings for discharging an ink on said substrate by photolithography, which comprises a wiring electrode group etching step of forming stepwise the connecting face of each electrode of said group of wiring electrodes by etching of plural times while etchingwise removing a photoresist for masking in the substrate forming step.
Claim 22
Dependent Claim 42 words
A method according to Claim 21, wherein in the wiring electrode group etching step, the side face of each electrode of said group of wiring electrodes together with the connecting face of said electrode is etched plural times to be shaped stepwise.
Claim 23
Dependent Claim 52 words
A method according to Claim 12, wherein in the wiring electrode group etching step, the etching is effected by immersing a material layer for said wiring electrodes alternatively in an etching liquid for said wiring electrodes and in an aqueous solution comprising mainly tetramethyl ammonium hydroxide for etching said photoresist for masking.
Claim 24
Dependent Claim 14 words
A method according to Claim 21, wherein said material for wiring electrodes is aluminum.
Claim 25
Independent Claim 102 words
A method for producing a substrate for a recording head wherein a plurality of electro-thermal converting elements, driving functional elements for respectively driving said electro-thermal converting elements, a plurality of wiring electrodes for respectively connecting each of said driving functional elements and each of said electro-thermal converting elements and an electrical isolation film formed on said wiring elements are formed on a supporting member by photolithography, which comprises forming said electrical isolation film by depositing a material for said electrical isolation film on said wiring electrodes while changing the temperature of the supporting member from a low temperature to a high temperature.
Claim 26
Dependent Claim 37 words
A method according to Claim 25, wherein the material for said electrical isolation film is deposited on said wiring electrodes while changing stepwise the temperature of the supporting member from a low temperature to a high temperature.
Claim 27
Dependent Claim 36 words
A method according to Claim 25, wherein the material for said electrical isolation film is deposited on said wiring electrodes while changing the temperature of the supporting member continuously from low temperature to a high temperature.
Claim 28
Dependent Claim 46 words
A method according to Claim 25, wherein the material for said electrical isolation film is deposited on said wiring electrodes at a supporting member temperature of 150 - 250°C and then further deposited thereon at a supporting member temperature of 250 - 450°C of support temperature.
Claim 29
Dependent Claim 20 words
A method according to Claim 25, wherein the deposition of the electrical isolation film is deposited by a CVD method.
Claim 30
Dependent Claim 15 words
A method according to Claim 29, wherein the CVD method is a plasma CVD method.
Claim 31
Dependent Claim 13 words
A method according to Claim 25, wherein said electrical isolation film is SiO.
Claim 32
Dependent Claim 13 words
A method according to Claim 25, wherein said electrical isolation film is SiN.
Claim 33
Dependent Claim 13 words
A method according to Claim 25, wherein said electrical isolation film is SiO₂.
Claim 34
Dependent Claim 13 words
A method according to Claim 25, wherein said electrical isolation film is SiON.
Claim 35
Independent Claim 55 words
A method for producing a substrate for a recording head comprising a plurality of electro-thermal converting elements and driving functional elements for driving each said electro-thermal converting elements, the method comprising forming a P-type semiconductor layer by epitaxial growth on a P-type semiconductor supporting member and forming said driving functional elements utilizing said P-type semiconductor.
Claim 36
Independent Claim 144 words
A method for producing recording head including a substrate forming step of forming a substrate for said recording head by forming a plurality of electro-thermal converting elements, driving functional elements for driving said each electro-thermal converting element, a plurality of wiring electrodes for connecting said each driving functional element and said electro-thermal converting element and an electrical isolation film provided on said wiring electrodes on a supporting member and an ink discharge portion forming step of forming an ink discharging portion having a plurality of ink discharging openings for discharging an ink on said substrate for said recording head, which comprises a deposition step of forming said electrical isolation film by depositing a material for said electrical isolation film on said wiring electrodes while changing the temperature of the supporting member from a low temperature to a high temperature in the substrate forming step.
Claim 37
Dependent Claim 48 words
A method for producing utilizing a photolithography a support for a recording head according to Claim 36, wherein the material for said electrical. isolation film is deposited on said wiring electrodes while changing stepwise the temperature of the supporting member from a low temperature to a high temperature.
Claim 38
Dependent Claim 37 words
A method according to Claim 36, wherein the material for said electrical isolation film is deposited on said wiring electrodes while changing the temperature of the supporting member continuously from a low temperature to a high temperature.
Claim 39
Dependent Claim 46 words
A method according to Claim 36, wherein the material for said electrical isolation film is deposited on said wiring electrodes at a supporting member temperature of 150 - 250°C and then further deposited thereon at a supporting member temperature of 250 - 450°C of support temperature.
Claim 40
Dependent Claim 20 words
A method according to Claim 36, wherein the deposition of the electrical isolation film is deposited by a CVD method.
Claim 41
Dependent Claim 15 words
A method according to Claim 40, wherein the CVD method is a plasma CVD method.
Claim 42
Dependent Claim 13 words
A method according to Claim 36, wherein said electrical isolation film is SiO.
Claim 43
Dependent Claim 13 words
A method according to Claim 36, wherein said electrical isolation film is SiN.
Claim 44
Dependent Claim 13 words
A method according to Claim 36, wherein said electrical isolation film is SiO₂.
Claim 45
Dependent Claim 13 words
A method according to Claim 36, wherein said electrical isolation film is SiON.
Claim 46
Dependent Claim 44 words
A substrate for a recording head produced according to the method of Claim 1, wherein the edge faces of said wiring electrodes have an angle of from 30 degree to 75 degree to the normal line of the surface of said electro-thermal converting element.
Claim 47
Dependent Claim 41 words
A recording head produced according to the method of Claim 9, wherein, the edge faces of said wiring electrodes have an angle of from 30 degree to 75 degree to the normal line of the surface of said electro-thermal converting element.
Claim 48
Dependent Claim 34 words
A recording apparatus comprising the recording head of Claim 47 and means for transferring a recording medium to be recorded by the ink discharged from said head while being opposed to said recording head.
Claim 49
Dependent Claim 28 words
A substrate for a recording head produced by the method according to Claim 17, wherein the edge faces of said wiring electrodes are in the form of steps.
Claim 50
Dependent Claim 28 words
A substrate for a recording head produced by the method according to Claim 21, wherein the edge faces of said wiring electrodes are in the form of steps.
Claim 51
Dependent Claim 34 words
A recording apparatus comprising the recording head of Claim 50 and means for transferring a recording medium to be recorded by the ink discharged from said head while being opposed to said recording head.
Claim 52
Dependent Claim 14 words
A substrate for a recording head produced by the method according to Claim 25.
Claim 53
Dependent Claim 11 words
A recording head produced by the method according to Claim 36.
Claim 54
Dependent Claim 34 words
A recording apparatus comprising the recording head of Claim 53 and means for transferring a recroding medium to be recorded by the ink discharged from said head, while being opposed to said recording head.
Claim 55
Dependent Claim 45 words
A semiconductor device having a heat generating portion and an electrode portion adjacent the heat generating portion and extending above the level of the heat generating portion, the side of the electrode portion toward the heat generating portion sloping down to the heat generating portion.
Claim 56
Independent Claim 42 words
A method of making a semiconductor device having a heat generating portion and an electrode portion therefor, comprising etching an electrode material layer to form the electrode portion while also etching a masking layer over a part of the electrode material layer.
Claim 57
Independent Claim 28 words
A method depositing an electrical isolation layer over a semiconductor device having a conductive layer, comprising raising the temperature of the device while depositing the electrical isolation layer.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Maintenance schedule is calculated for granted US utility patents.

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag