EP0501492A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method for cleaning semiconductor products
Assignee: Okmetic Oy
•
Filing: 1992-02-27
•
Granted: —
•
Expires: 2012-02-27
Abstract
Abstract The invention relates to a method for cleaning a semiconductor product of particles accumulated on its surface and of metallic and organic contamination. According to the invention, the washing of the semiconductor product is carried out with an acid-water solution with a dilution ratio between 1:10⁶ - 1:10³, advantageously between 1:10⁵ - 1:10⁴. Advantageously the employed acid is for instance hydrochloric acid, nitric acid, acetic acid or hydrofluoric acid.
Inventors
- 👤 Olli Anttila
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 00:34
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/15
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
50 words
A method for cleaning a semiconductor product of particles accumulated on its surface as well as of metallic and organic contamination, characterized in that the washing of the semiconductor product is carried out with an acid-water solution, with a dilution ratio between 1:10⁶ - 1:10³, advantageously between 1:10⁵ - 1:10⁴.
Claim 2
Dependent Claim
24 words
The method of claim 1, characterized in that the washing is carried out at the temperature of 15 - 40°C, advantageously 18 - 25°C.
Claim 3
Dependent Claim
16 words
The method of claim 1 or 2, characterized in that the employed acid is hydrochloric acid.
Claim 4
Dependent Claim
16 words
The method of claim 1 or 2, characterized in that the employed acid is nitric acid.
Claim 5
Dependent Claim
16 words
The method of claim 1 or 2, characterized in that the employed acid is acetic acid.
Claim 6
Dependent Claim
16 words
The method of claim 1 or 2, characterized in that the employed acid is hydrofluoric acid.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.