EP0488048A1
Expired / Lapsed
EP
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A low emissivity film
Assignee: AGC Inc
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Filing: 1991-11-21
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Granted: —
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Expires: 2011-11-21
Abstract
Abstract A low emissivity film formed on a substrate, which comprises a coating of oxide films and films whose major component is Ag alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein an integral width βi(°) of (111) diffraction line of a cubic Ag in an X-ray diffraction diagram of the low emissivity film exists in a first range of 180λ/(dπcosϑ)≦βi≦180λ/(dπcosϑ)+0.15, where d(Å) designates a thickness of a film whose major component is Ag, λ(Å), a wave length of an X-ray for measurement and ϑ, Bragg angle.
Inventors
- 👤 Masami Miyazaki
- 👤 Eiichi Ando
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-05 18:03
CPC Classifications
C; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3613; C03C17/3618; C03C17/3639; C03C17/3644; C03C17/3657; C03C17/366; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/086; C23C14/14; C23C14/18; C03C2217/00; C03C2217/70; C03C2217/78
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
110 words
A low emissivity film formed on a substrate, which comprises: a coating of oxide films and films whose major component is Ag alternately formed on the first substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein an integral width βi(°) of (111) diffraction line of a cubic Ag in an X-ray diffraction diagram of the low emissivity film exists in a first range of 180λ/(dπcosϑ)≦βi≦180λ/(dπcosϑ)+0.15, where d(Å) designates a thickness of a film whose major component is Ag, λ(Å), a wave length of an X-ray for measurement and ϑ, Bragg angle.
Claim 2
Dependent Claim
20 words
The low emissivity film according to Claim 1, wherein the integral width βi(°) exists in a second range of 180λ/(dπcosϑ)≦βi≦180λ/(dπcosϑ)+0.10.
Claim 3
Dependent Claim
20 words
The low emissivity film according to Claim 1, wherein the integral width βi(°) exists in a third range of 180λ/(dπcosϑ)≦βi≦180λ/(dπcosϑ)+0.05.
Claim 4
Dependent Claim
38 words
The low emissivity film according to Claim 1, further comprising: an interstitial layer or layers for alleviating the crystalline imperfection of Ag, formed at the interface between the film whose major component is Ag and the oxide film.
Claim 5
Dependent Claim
48 words
The low emissivity film according to Claim 1, wherein the oxide film (B) formed on outer side of the film (A) whose major component is Ag being most apart from the first substrate, has an internal stress which is equal to or less than 1.1 × 10¹⁰ dyne/cm².
Claim 6
Dependent Claim
100 words
The low emissivity film according to Claim 1, wherein the oxide film (B) formed on outer side of the film (A) whose major component is Ag being most apart from the first substrate, is composed of a single layer or a multi-layer, comprising at least a layer whose major component is zinc oxide, the crystal structure of the zinc oxide being hexagonal, and a value of a diffraction angle 2ϑ (center of gravity position) of (002) diffraction line of the hexagonal zinc oxide in X-ray diffraction method using CuKα radiation is not smaller than 33.88° and not larger than 35.00°.
Claim 7
Dependent Claim
68 words
The low emissivity film according to Claim 1, wherein the oxide film (B) formed on outer side of the film (A) whose major component is Ag being most apart from the substrate, is composed of a multi-layer film, the outermost layer of which is a controlling layer for controlling the adhesive strength between the low emissivity film and an intermediate plastic film interposed for lamination with another substrate.
References Cited (Backward Citations)
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