EP0470580A2
Expired / Lapsed
EP
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Plasma processing apparatus
Assignee: Canon Inc
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Filing: 1991-08-06
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Granted: —
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Expires: 2011-08-06
Abstract
Abstract A plasma processing apparatus comprises: a first electrode (1) connectable with a plasma generating power source; a second electrode (2) capable of supporting a substrate (6) to be subjected to a plasma-involving surface treatment; a third electrode (3) enclosing a space between the first and second electrodes, all the electrodes being positioned in an evacuatable chamber; and potential control means (10) for controlling the potential of the third electrode. <IMAGE>
Inventors
- 👤 Atsushi Yamagami
- 👤 Nobuyuki Okamura
- 👤 Tadahiro Ohmi
- 👤 Haruhiro Harry Goto
- 👤 Tadashi Shibata
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 11:53
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3435; C23C14/345; C23C14/35; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32697; H01J37/34; H01J37/3402; H01J37/3405; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
64 words
A plasma processing apparatus comprising: a first electrode connectable with a plasma generating power source; a second electrode capable of supporting a substrate to be subjected to a plasma-involving surface treatment; a third electrode enclosing a space between said first and second electrodes, all said electrodes being positioned in an evacuatable chamber; and potential control means for controlling the potential of said third electrode.
Claim 2
Dependent Claim
64 words
A plasma processing apparatus comprising: a first electrode connectable with a plasma generating power source; a second electrode capable of supporting a substrate to be subjected to a plasma-involving surface treatment; a third electrode enclosing a space between said first and second electrodes, all said electrodes being positioned in an evacuatable chamber; and potential control means for controlling the potential of said third electrode.
Claim 3
Dependent Claim
42 words
An apparatus according to claim 1, wherein said first electrode is so constructed as to support a target, and said apparatus is adapted to form a film with a material supplied from said target, on the substrate supported by said second electrode.
Claim 4
Dependent Claim
19 words
An apparatus according to claim 1 or 2, wherein said third electrode is electrically insulated from said evacuatable chamber.
Claim 5
Dependent Claim
18 words
An apparatus according to claim 1 or 2, wherein said evacuatable chamber serves also as said third electrode.
Claim 6
Dependent Claim
21 words
An apparatus according to claim 3, wherein said third electrode is divided into plural portions, of which potentials are independently controllable.
Claim 7
Dependent Claim
23 words
An apparatus according to claim 3 or 5, wherein said third electrode is connected through a DC power source to the evacuatable chamber.
Claim 8
Independent Claim
22 words
An apparatus according to any of claims 1 to 6, wherein said second electrode is connected to a high frequency power source.
Claim 9
Dependent Claim
35 words
An apparatus according to claim 7, wherein the frequency of the high frequency power source connected to said second electrode is different from that of the plasma generating power source connected to said first electrode.
References Cited (Backward Citations)
No citation records indexed.
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