Apparatus for exposing peripheral portion of substrate

Claim 2

An exposing apparatus for exposing the periphery portion of a substrate on which resist is uniformly applied while rotating said substrate by rotating means around a substantially central portion of said substrate, said exposing apparatus comprising: irradiating means capable of irradiating a first light beam, which is not sensed by said resist, and a second light beam, which is sensed by said resist, toward the periphery portion of said resist; light receiving means disposed to confront said irradiating means, receiving said light beam and outputting a light receipt signal in accordance with the quantity of received light, said substrate being disposed between said irradiating means and said light receiving means so as to shield a portion of said light beam; detection means for detecting the rotational angle of said resist and outputting an angular signal; moving means for relatively moving said light beam irradiated and said substrate in a radial direction; determining means for determining the quantity of a relative movement between said light beam and said substrate, which is necessary to make the radial directional width of a region of said peripheral portion of said resist which is irradiated with said first light beam to be uniform, in accordance with said light receipt signal when said first light beam is emitted from said irradiating means and said resist is rotated; memorizing means for memorizing said quantity of said relative movement in such a manner that it is made correspond to said angular signal; and control means for controlling said moving means in accordance with said quantity of said relative movement and said angular signal memorized by said memorizing means when said second light beam is emitted from said irradiating means and said resist is rotated so as to relatively move said light beam and said substrate in such a manner that the radial directional width of a region which is irradiated with said second light beam is substantially constant in said periphery portion of said resist.

Claim 3

An exposing apparatus according to Claim 2, wherein said control means has movement quantity detection means for detecting the quantity of said relative movement between said light beam and said substrate and a servo mechanism for determining the difference between an actual relative movement quantity between said light beam and said substrate detected by said movement quantity detection means and a relative movement quantity memorized by said memorizing means by making a comparison between them and driving said moving means in accordance with said difference.

Claim 4

An exposing apparatus according to Claim 2 further comprising: calibration means having a light shielding member, said calibration means previously determining the relationship between the quantity of light received by said light receiving means when said light shielding member is interposed between said irradiating means and said light receiving means and the position of said light shielding member, wherein said moving means is controlled in accordance with said relationship.

Claim 5

An exposing apparatus according to Claim 2, wherein said irradiating means comprises an irradiating member and a filter member capable of filtering said light beam emitted from said irradiating member, wherein said filter member filters said light beam so that said first light beam is irradiated and said filter member does not filter said light beam so that said second light beam is irradiated.

Claim 7

A method as claimed in claim 6, including the step of causing relative movement in the radial direction between, on the one hand, the substrate, and, on the other hand, the non-exposing light and/or a sensor thereof in order to maintain the sensed light intensity substantially constant during the irradiation of the peripheral portion with the non-exposing light, whereby the detected position of the peripheral portion can be determined by detecting said relative movement.