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EP0442490A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Method for producing single crystal boron nitride film

Assignee: Sumitomo Electric Industries Ltd
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Filing: 1991-02-14
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Granted: —
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Expires: 2011-02-14
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Abstract

Abstract A single crystal cubic boron nitride film is pepared by alternately supplying a raw material gas comprising boron atoms (TB2H6) and a raw material gas comprising nitrogen atoms (T NH3 in a vacuum chamber to form a cubic boron nitride film on a heated substrate and evacuating the vacuum chamber (T vac1 -T vac4 ) and optionally purging the vacuum chamber with a gas (T H2 ) which is inactive with the raw materials when one raw material gas is switched to the other to prevent coexistence of the both raw materials in the vacuum chamber.

Inventors

  • 👤 Tunenobu C/O Itami Works Of Sumitomo Kimoto
  • 👤 C/O Itami Works Of Sumitomo Tomikawa Tadashi
  • 👤 Nobuhiko C/O Itami Works Of Sumitomo Fujita

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 01:34
CPC Classifications
C; C30; C30B; C30B29/00; C30B29/10; C30B29/40; C30B29/403; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; C23C16/342; C23C16/44; C23C16/455; C23C16/45523; C23C16/45525; C23C16/45527; C23C16/45531; C23C16/45536; C23C16/45542; C30B25/00; C30B25/02; C30B25/14

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 69 words
A method for producing a cubic boron nitride film comprising alternately supplying a raw material gas comprising boron atoms and a raw material gas comprising nitrogen atoms in a vacuum chamber to form a cubic boron nitride film on a heated substrate and evacuating the vacuum chamber when one raw material gas is switched to the other to prevent coexistence of the both raw materials in the vacuum chamber.
Claim 2
Dependent Claim 17 words
The method according to claim 1, wherein a temperature of the substrate is from 300 to 1400°C.
Claim 3
Dependent Claim 28 words
The method according to claim 1, wherein the raw material comprising the boron atoms is selected from the group consisting, of B₂H₆, BF₃, BCl₃, BBr₃, B(CH₃)₃ and B(C₂H₅)₃.
Claim 4
Dependent Claim 24 words
The method according to claim 1, wherein the raw material comprising the nitrogen atoms is selected from the group consistingof NH₃, N₂ and NF₃.
Claim 5
Independent Claim 84 words
A method for producing a cubic boron nitride film comprising alternately supplying a raw material gas comprising boron atoms and a raw material gas comprising nitrogen atoms in a vacuum chamber to form a cubic boron nitride film on a heated substrate and evacuating the vacuum chamber and purging the vacuum chamber with a gas which is inactive with the raw materials when one raw material gas is switched to the other to prevent coexistence of the both raw materials in the vacuum chamber.
Claim 6
Dependent Claim 17 words
The method according to claim 5, wherein a temperature of the substrate is from 300 to 1400°C.
Claim 7
Dependent Claim 28 words
The method according to claim 5, wherein the raw material comprising the boron atoms is selected from the group consisting of B₂H₆, BF₃, BCl₃, BBr₃, B(CH₃)₃ and B(C₂H₅)₃.
Claim 8
Dependent Claim 24 words
The method according to claim 5, wherein the raw material comprising the nitrogen atoms is selected from the group consistingof NH₃, N₂ and NF₃.
Claim 9
Dependent Claim 14 words
The method according to claim 5, wherein a purging gas is hydrogen or argon.

References Cited (Backward Citations)

US3561920A Cited

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