EP0440374A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Chemical amplified resist material
Assignee: Fujifilm Wako Pure Chemical Corp
•
Filing: 1991-01-24
•
Granted: —
•
Expires: 2011-01-24
Abstract
Abstract A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.
Inventors
- 👤 Fumiyoshi Urano
- 👤 Masaaki Nakahata
- 👤 Hirotoshi Fujie
- 👤 Keiji Oono
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 15:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/108; Y10S430/11; Y10S430/114; Y10S430/122; Y10S430/124; Y10S430/126
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
86 words
A resist material comprising (a) a polymer represented by the formula: wherein R¹ is a methyl group, an isopropyl group, a tert-butyl group, a tetrahydropyranyl group, a trimethylsilyl group or a tert-butoxycarbonyl group; R² is a hydrogen atom or a methyl group; and k and p are independently an integer of 1 or more provided that k/(k+p) = 0.1 to 0.9, (b) a photosensitive compound being able to generate an acid by exposure to light, and (c) a solvent for dissolving the components (a) and (b).
Claim 2
Dependent Claim
30 words
A resist material according to Claim 1, wherein in the formula (I), R¹ is a tert-butyl group, a tetrahydropyranyl group or a trimethylsilyl group; and R² is a hydrogen atom.
Claim 3
Dependent Claim
23 words
A resist material according to Claim 1, wherein in the formula (I), R¹ is a tert-butyl group; and R² is a hydrogen atom.
Claim 4
Dependent Claim
161 words
A resist material comprising (a) a polymer represented by the formula: wherein R¹ is a methyl group, an isopropyl group, a tert-butyl group, a tetrahydropyranyl group, a trimethylsilyl group or a tert-butoxycarbonyl group; R² is a hydrogen atom or a methyl group; R³ and R⁵ are independently a hydrogen atom or a methyl group; R⁴ is a hydrogen atom, a carboxyl group, a cyano group, or a group of the formula: wherein R⁷ is a hydrogen atom, a halogen atom or a lower alkyl group; R⁶ is a hydrogen atom, a cyano group, or -COOR⁸; R⁸ is a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms; k′, p′ and m are independently an integer of 1 or more, provided that 0,1 ≦ k′/(k′+p′) ≦ 0.9 and 0.05 ≦ m/(k′ +p′+m) ≦ 0.50, (b) a photosensitive compound being able to generate an acid by exposure to light, and (c) a solvent for dissolving the components (a) and (b).
Claim 5
Dependent Claim
52 words
A resist material according to Claim 4, wherein in the formula (II), R¹ is a tert-butyl group, a tetrahydropyranyl group, or a trimethylsilyl group; R⁴ is a hydrogen atom or a cyano group; R⁶ is a cyano group or a tert-butoxycarbonyl group; and R², R³ and R⁵ are independently a hydrogen atom.
Claim 6
Dependent Claim
41 words
A resist material according to Claim 4, wherein in the formula (II), R¹ is a tert-butyl group; R⁴ is a hydrogen atom or a cyano group; R⁶ is a cyano group; and R², R³ and R⁵ are independently a hydrogen atom.
Claim 7
Dependent Claim
33 words
A resist material according to Claim 4, wherein in the formula (II), R¹ is a tert-butyl group; R⁶ is a tert-butoxycarbonyl group; and R², R³, R⁴ and R⁵ are independently a hydrogen atom.
Claim 8
Dependent Claim
43 words
A resist material according to Claim 1, wherein the polymer of the formula (I) is obtained by polymerizing a monomer of the formula: wherein R¹ and R² are as defined in Claim 1, and eliminating R¹ at predetermined proportion using a suitable acid.
Claim 9
Dependent Claim
29 words
A resist material according to Claim 1, wherein the polymer of the formula (I) is obtained by polymerizing p-tert-butoxystyrene and eliminating R¹ at predetermined proportion using a suitable acid.
Claim 10
Dependent Claim
59 words
A resist material according to Claim 4, wherein the polymer of the formula (II) is obtained by copolymerizing a monomer of the formula: wherein R¹ and R² are as defined in Claim 4, with a monomer of the formula: wherein R³ through R⁶ are as defined in Claim 4, and eliminating R¹ at predetermined proportion using a suitable acid.
Claim 11
Dependent Claim
45 words
A resist material according to Claim 4, wherein the polymer of the formula (II) is obtained by copolymerizing p-tert-butoxystyrene and a monomer of the formula: wherein R³ through R⁶ are as defined in Claim 4, and eliminating R¹ at predetermined proportion using a suitable acid.
Claim 12
Dependent Claim
108 words
A resist material according to any one of Claims 1 to 11, wherein the photosensitive compound (b) is a compound of the formula: wherein R⁹ and R¹⁰ are independently a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, a haloalkyl group having 1 to 10 carbon atoms or a group of the formula: wherein R¹¹ and R¹² are independently a hydrogen atom, a lower alkyl group having 1 to 5 carbon atom, or a haloalkyl group having 1 to 5 carbon atoms; n is zero or an integer of 1 or more; X is a carbonyl group, a carbonyloxy group or a sulfonyl group.
Claim 13
Dependent Claim
113 words
A resist material according to any one of Claims 1 to 11, wherein the photosensitive compound (b) is a compound of the formula: wherein R¹³ is a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, a trifluoromethyl group, or a group of the formula: wherein R¹⁷ is a hydrogen atom or a methyl group; R¹⁴ and R¹⁵ are independently a hydrogen atom, or a lower alkyl group having 1 to 5 carbon atoms; and R¹⁶ is a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, a phenyl group, a halogen-substituted phenyl group, an alkyl-substituted phenyl group, an alkoxy-substituted phenyl group, or an alkylthio-substituted phenyl group.
Claim 14
Dependent Claim
73 words
A resist material according to any one of Claims 1 to 11, wherein the photosensitive compound (b) is a compound of the formula: wherein R¹⁸, R¹⁹, R²⁰ and R²¹ are independently a hydrogen atom, a halogen atom, a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms; and Z⁻ is a perchlorate ion, a p-toluenesulfonate ion or a trifluoromethanesulfonate ion.
Claim 15
Dependent Claim
58 words
A resist material according to any one of Claim 1 to 11, wherein the photosensitive compound (b) is a compound of the formula: wherein R²² is a trichloroacetyl group, a p-toluenesulfonyl group, a p-trifluoromethylbenzenesulfonyl group, a methanesulfonyl group or a trifluoromethanesulfonyl group; and R²³ and R²⁴ are independently a hydrogen atom, a halogen atom, or a nitro group.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.