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EP0439360A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Rotating sputtering apparatus for selected erosion

Assignee: Varian Medical Systems Inc
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Filing: 1991-01-24
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Granted: —
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Expires: 2011-01-24
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Abstract

Abstract A magnetron sputter source providing a predetermined erosion distribution over the surface of a sputter target material is described. When the distribution is uniform, close coupling of the sputter target with the substrate to be coated is achieved, resulting in improved collection efficiency of the sputtered material by the wafer and improved film thickness uniformity. Elimination of erosion grooves provide for greater target consumption and longer target life. The cathode magnetron sputter source includes a rotating magnet assembly of a specific shape and a specific magnetic strength provides the desirred erosion distribution. The target may be dished to improve uniformity near the periphery of the wafer. The resulting magnetron cathode is used for the deposition of thin films. Further applications of uniform magnetron erosion or preselected erosion include uniform or preselected magnetron sputter etch or reactive ion etch and concurrent deposition and etch.

Inventors

  • 👤 Richard Ernest Demaray
  • 👤 John C. Helmer
  • 👤 Robert L Anderson
  • 👤 Young Hoon Park
  • 👤 Ronald R Cochran
  • 👤 Vance Eber Hoffman Jr.

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-08 02:46
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3447; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/3402; H01J37/3405; H01J37/3408; H01J37/345; H01J37/3455; H01J37/3488; H01J37/3494; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332; H01J2237/3322; H01J2237/3327

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 76 words
A magnetron sputter apparatus comprising: a vacuum chamber; a first magnetron structure including an anode; a cathode having a front surface in said vacuum chamber and a back surface; magnetic means positioned behind said back surface for generating a magnetic field defining a closed loop erosion path on said front surface; and means for rotating said magnetic means about an axis normal to said surface, said axis passing through said erosion path at a point P.
Claim 2
Dependent Claim 30 words
A magnetron apparatus as in claim 1 wherein said front surface is flat so that rotation of said magnetic means sweeps out a circular erosion region on said front surface.
Claim 3
Dependent Claim 49 words
A magnetron apparatus as in claim 1 wherein said magnetic means comprises a first pole piece and a second pole piece, said first pole piece having opposite magnetic polarity from said second pole piece, said axis of rotation passing between said first pole piece and said second pole piece.
Claim 4
Dependent Claim 48 words
A magnetron apparatus as in claim 2 wherein said magnetic means is configured so that said erosion path contains a circular region of radius R₁ centered at P and the average magnetic strength of said field at radius R, denoted by M (R), is substantially constant for R≦R₁.
Claim 5
Dependent Claim 22 words
A magnetron apparatus as in claim 4 wherein the parallel component of said magnetic field is substantially constant in said circular region.
Claim 6
Dependent Claim 52 words
A magnetron apparatus as in claim 2 wherein said magnetic means is configured so that there are numbers R₁ and R₂ greater than zero such that the average magnetic strength of said field at radius R has a substantially constant value for R₁≦R≦R₂ where R is the distance from said point P.
Claim 7
Dependent Claim 45 words
A magnetron apparatus as in claim 2 wherein said magnetic means is configured so that there are numbers R₁ and R₂ greater than zero such that the average magnetic strength of said field at radius R, denoted by M (R), is not constant and varies
Claim 8
Dependent Claim 57 words
A magnetron apparatus as in claim 1 wherein said magnetic means is configured so that said point P passes through the boundary of said path and there is a number R₁ such that the average magnetic strength of said field at radius R has substantially constant value for 0≦R≦R₁ were R is the distance from said point.
Claim 9
Dependent Claim 22 words
A magnetron apparatus as in claim 8 wherein a boundary of said path has a v-shaped configuration in a neighborhood of P.
Claim 10
Dependent Claim 53 words
A magnetron apparatus as in claim 2 wherein said magnetic means is configured so that there are numbers R₁ and R₂ greater than zero such that the product of the average magnetic strength M (R) of said field at radius R and ΣL(Arc(R))/R varies as the erosion profile E(R) with R for R₁≦R≦R₂.

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