EP0428733A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Device for forming tungsten film
Assignee: HASHIMOTO KASEI KABUSHIKI-KAISYA
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Filing: 1990-04-04
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Granted: —
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Expires: 2010-04-04
Abstract
Abstract The device has a film-forming chamber, means for introducing a WF₆ gas into the film-forming chamber, and means for introducing a H₂ gas into the film-forming chamber. At least a portion that comes in contact with the WF₆ gas in the film-forming chamber is composed of a metal material that has on the surface thereof a fluoride-containing passivation film composed chiefly of a metal fluoride that nearly satisfies the stoichiometric ratio. The tungsten film of high quality can be formed even at low substrate temperatures.
Inventors
- 👤 Tadahiro Ohmi
- 👤 Nobuhiro Miki
- 👤 Matagoroh Maeno
- 👤 Hirohisa Kikuyama
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 03:22
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10P14/43; C; C23; C23C; C23C16/00; C23C16/06; C23C16/08; C23C16/14; C23C16/44; C23C16/4401; C23C16/4402; C23C16/4404
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
67 words
A tungsten film forming apparatus comprising a reaction chamber, means for introducing WF₆ gas to said reaction chamber, and means for introducing H₂ gas to said reaction chamber, wherein at least the portion of said reaction chamber which is to be in contact with WF₆ is made of a metal material having a fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 2
Dependent Claim
19 words
A tungsten film forming apparatus according to claim 1 including means for introducing F₂ gas to said reaction chamber.
Claim 3
Dependent Claim
42 words
A tungsten film forming apparatus according to claim 1 wherein at least the portion of said WF₆ introducing means which is to be in contact with WF₆ gas is made of a stainless steel having an oxidized passivation film on the surface.
Claim 4
Dependent Claim
50 words
A tungsten film forming apparatus according to claim 1 wherein at least the portion of said WF₆ gas introducing means which is to be in contact with WF₆ is made of the metal materials having the fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 5
Dependent Claim
41 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of a F₂ introducing means which is to be in contact with F₂ is made of a stainless steel having the oxidized paasivation film on the surface.
Claim 6
Dependent Claim
49 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of the F₂ introducing means which is to be in contact with F₂ is made of a metal material having the fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 7
Dependent Claim
38 words
A tungsten film forming apparatus according to claim 1 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of a stainless steel having the oxidation passivation film on the surface.
Claim 8
Dependent Claim
45 words
A tungsten film forming apparatus according to claim 1 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of metal materials having the fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 9
Dependent Claim
19 words
A tungsten film forming apparatus according to claim 2 including means for heating the whole of said reaction chamber.
Claim 10
Dependent Claim
29 words
A tungsten film forming apparatus according to claim 1 wherein the fluorinated passivation film is formed on the surface having a flatness R max of 0.03 - 1.0 µm
Claim 11
Dependent Claim
32 words
A tungsten film forming apparatus according to claim 1 wherein metal materials are stainless steel, nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy, chromium, cobalt, cobalt alloy, titan, and titan alloy.
Claim 12
Dependent Claim
32 words
A tungsten film forming apparatus according to claim 1 wherein a surface flatness R max is in the range from 0.03 -1.0 µ m within any circle having radius of 5 µm.
Claim 13
Dependent Claim
42 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of said WF₆ introducing means which is to be in contact with WF₆ gas is made of a stainless steel having an oxidized passivation film on the surface.
Claim 14
Dependent Claim
50 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of said WF₆ gas introducing means which is to be in contact with WF₆ is made of the metal materials having the fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 15
Dependent Claim
38 words
A tungsten film forming apparatus according to claim 6 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of a stainless steel having the oxidation passivation film on the surface.
Claim 16
Dependent Claim
45 words
A tungsten film forming apparatus according to claim 6 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of metal materials having the fluorinated passivation film mainly consisting of an almost stoichiometric metal fluoride on the surface.
Claim 17
Dependent Claim
19 words
A tungsten film forming apparatus according to claim 8 including means for heating the whole of said reaction chamber.
Claim 18
Dependent Claim
29 words
A tungsten film forming apparatus according to claim 4 wherein the fluorinated passivation film is formed on the surface having a flatness R max of 0.03 - 1.0 µm
Claim 19
Dependent Claim
32 words
A tungsten film forming apparatus according to claim 4 wherein metal materials are stainless steel, nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy, chromium, cobalt, cobalt alloy, titan, and titan alloy.
Claim 20
Dependent Claim
31 words
A tungsten film forming apparatus according to claim 4 wherein a surface flatness R max is in the range from 0.03 -1.0 µm within any circle having radius of 5 µm.
References Cited (Backward Citations)
No citation records indexed.
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