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EP0425891A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Radiation sensitive mixture

Assignee: BASF SE
•
Filing: 1990-10-17
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Granted: —
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Expires: 2010-10-17
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Abstract

Abstract Translated from German Die Erfindung betrifft ein strahlungsempfindliches Gemisch, aus a) einem in Wasser unlöslichen, in wäßrig-alkalischen Lösungen löslichen Bindemittel oder Bindemittelgemisch auf Basis parasubstituierter Phenol/Formaldehyd-Harze, die an ihren Kettenenden in ortho-Stellung teilweise Methylolgruppen oder Gruppierungen, die bei Einwirkung von Säure Methylolgruppen ergeben, und in para-Stellung -OR-Gruppen, worin R für Alkyl, Aralkyl oder Acyl steht, enthalten und b) einer bei Bestrahlung eine starke Säure bildenden Verbindung The invention relates to a radiation-sensitive mixture a) a water-insoluble binder or mixture of binders based on parasubstituted phenol / formaldehyde resins which is soluble in aqueous alkaline solutions and which, at its chain ends in the ortho position, partially contains methylol groups or groups which give methylol groups when exposed to acid, and in para Position -OR groups, in which R represents alkyl, aralkyl or acyl, contain and b) a compound which forms a strong acid when irradiated Das strahlungsempfindliche Gemisch eignet sich zur Herstellung lichtempfindlicher Beschichtungsmaterialien und Reliefstrukturen. The radiation-sensitive mixture is suitable for the production of light-sensitive coating materials and relief structures.

Inventors

  • 👤 Son Dr. Nguyen Kim

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 03:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; C; C08; C08G; C08G8/00; C08G8/04; C08G8/08; C08K; C08K5/00; C08K5/0008; C08K5/0025

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