EP0421429A2
Expired / Lapsed
EP
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Electrode pattern forming method
Assignee: Sharp Corp
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Filing: 1990-10-04
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Granted: —
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Expires: 2010-10-04
Abstract
Abstract An electrode pattern forming method comprising the steps of: forming a transparent conductive film (4A) on a substrate (3), covering said transparent conductive film with an aluminum film (5), forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte (1A) to form a resist pattern (6), and patterning said aluminum film using said resist pattern as a mask; the formation of said resist pattern in said electrolyte being conducted with another transparent conductive film (7B) which is in direct contact with said electrolyte and electrically connected to said aluminum film.
Inventors
- 👤 Hiromi Nishino
- 👤 Keiji Tarui
- 👤 Hideyuki Toyoshi
- 👤 Tatsuo Morita
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 18:10
CPC Classifications
H; H10; H10F; H10F71/00; H10F71/138; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1343; G02F1/13439; G03; G03F; G03F7/00; G03F7/26; G03F7/30; Y; Y02; Y02E; Y02E10/00; Y02E10/50
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
100 words
An electrode pattern forming method comprising the steps of: forming a transparent conductive film on a substrate, covering said transparent conductive film with an aluminum film, forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte to form a resist pattern, and patterning said aluminum film using said resist pattern as a mask; the formation of said resist pattern in said electrolyte being conducted with another transparent conductive film which is in direct contact with said electrolyte and electrically connected to said aluminum film.
Claim 2
Dependent Claim
100 words
An electrode pattern forming method comprising the steps of: forming a transparent conductive film on a substrate, covering said transparent conductive film with an aluminum film, forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte to form a resist pattern, and patterning said aluminum film using said resist pattern as a mask; the formation of said resist pattern in said electrolyte being conducted with another transparent conductive film which is in direct contact with said electrolyte and electrically connected to said aluminum film.
Claim 3
Dependent Claim
15 words
The method of claim 1 in which the transparent conductive film is an ITO film.
Claim 4
Dependent Claim
18 words
The method of claim 1 in which the aluminum film has a thickness of 0.5 to 2.0 µm.
Claim 5
Dependent Claim
22 words
The method of claim 1 in which the resist material film is made of a positive type or negative type resist material.
Claim 6
Dependent Claim
20 words
The method of claim 4 in which the positive type resist material is of an acrylate or synthetic rubber type.
Claim 7
Dependent Claim
17 words
The method of claim 4 in which the negative type resist material is of a quinonediazine type.
Claim 8
Dependent Claim
19 words
The method of claim 1 in which the resist material film has a thichness of 1.0 to 2.0 µm.
Claim 9
Dependent Claim
16 words
The method of claim 1 in which said another transparent conductive film is an ITO film.
Claim 10
Dependent Claim
16 words
The method of claim 1 in which the electrolyte is a sodium phosphate type alkaline solution.
Claim 11
Dependent Claim
12 words
The method of claim 1 in which the electrolyte contains a saccharose.
Claim 12
Dependent Claim
11 words
The method of claim 10 in which the saccharose is D-glucose.
Claim 13
Dependent Claim
17 words
The method of claim 10 in which the content of the saccharose is 1.0 to 3.0 wt%.
Claim 14
Independent Claim
105 words
A method for forming an electrode pattern in a first conductive film overlaying a second conductive film sensitive to corrosion, and disposed on a conductive substrate, comprising the steps, forming a resist material film on the first conductive film, exposing and developing the resist material film by immersion of the substrate in an electrolyte to form a mask of the electrode pattern to be formed in the first conductive film, characterised in that, a third conductive film in electrical contact with said second conductive film is disposed for direct contact with the electrolyte on immersion of the resist material film in an electrolyte for development.
Claim 15
Independent Claim
105 words
A method for forming an electrode pattern in a first conductive film overlaying a second conductive film sensitive to corrosion, and disposed on a conductive substrate, comprising the steps, forming a resist material film on the first conductive film, exposing and developing the resist material film by immersion of the substrate in an electrolyte to form a mask of the electrode pattern to be formed in the first conductive film, characterised in that, a third conductive film in electrical contact with said second conductive film is disposed for direct contact with the electrolyte on immersion of the resist material film in an electrolyte for development.
Claim 16
Dependent Claim
95 words
Apparatus for forming an electrode pattern in a first conductive film overlaying a second conductive film sensitive to corrosion, including a film of resist material overlaying the first conductive film for providing a mask of the electrode pattern to be formed in the first conductive film on exposure and development of the resist material film by immersion in an electrolyte, characterised in that the apparatus comprises, a third conductive film in electrical contact with the first conductive film and disposed for direct contact with the electrolyte on immersion of the resist material in the electrolyte.
Claim 17
Dependent Claim
95 words
Apparatus for forming an electrode pattern in a first conductive film overlaying a second conductive film sensitive to corrosion, including a film of resist material overlaying the first conductive film for providing a mask of the electrode pattern to be formed in the first conductive film on exposure and development of the resist material film by immersion in an electrolyte, characterised in that the apparatus comprises, a third conductive film in electrical contact with the first conductive film and disposed for direct contact with the electrolyte on immersion of the resist material in the electrolyte.
Claim 18
Independent Claim
100 words
A method for forming an electrode pattern in a first conductive film overlying a second conductive film sensitive to corrosion, and disposed on a conductive substrate, comprising the steps, forming a resist material film on the first conductive film, exposing and developing the resist material film by immersion of the substrate in an electrolyte to form a mask of the electrode pattern to be formed in the first conductive film, characterised in that, the resist material is immersed in an electrolyte containing a corrosion inhibiting saccharose for development of the resist material to provide the mask of the electrode pattern.
Claim 19
Independent Claim
100 words
A method for forming an electrode pattern in a first conductive film overlying a second conductive film sensitive to corrosion, and disposed on a conductive substrate, comprising the steps, forming a resist material film on the first conductive film, exposing and developing the resist material film by immersion of the substrate in an electrolyte to form a mask of the electrode pattern to be formed in the first conductive film, characterised in that, the resist material is immersed in an electrolyte containing a corrosion inhibiting saccharose for development of the resist material to provide the mask of the electrode pattern.
References Cited (Backward Citations)
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