EP0420596A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Gas feeding device and deposition film forming apparatus employing the same
Assignee: Canon Inc
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Filing: 1990-09-25
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Granted: —
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Expires: 2010-09-25
Abstract
Abstract Provided is a gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; a gas-introducing means connected to the container and having a plurality of gas-introducing openings for introducing the the carrier gas or the starting gas into the container to generate the starting gas; and a gas generation-accelerating means for accelerating the generation of the starting gas.
Inventors
- 👤 Nobuo Mikoshiba
- 👤 Kazuo Tsubouchi
- 👤 Kazuya Masu
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-24 13:32
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4485; C23C16/06; C23C16/18; C23C16/20; C23C16/4481; C23C16/4482; C23C16/4486; C30; C30B; C30B25/00; C30B25/02; C30B25/14
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
81 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; a gas-introducing means connected to the container and having a plurality of gas-introducing openings for introducing the the carrier gas or the starting gas into the container to generate the starting gas; and a gas generation-accelerating-means for accelerating the generation of the starting gas.
Claim 2
Dependent Claim
81 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; a gas-introducing means connected to the container and having a plurality of gas-introducing openings for introducing the the carrier gas or the starting gas into the container to generate the starting gas; and a gas generation-accelerating-means for accelerating the generation of the starting gas.
Claim 3
Dependent Claim
42 words
The gas-feeding device of Claim 1, wherein the gas-generation-accelerating means is a gas-switching means which turns on or turns off feed lines of the carrier gas to the plurality of gas-introducing means to distribute the carrier gas through a turned-on feed line.
Claim 4
Dependent Claim
14 words
The gas-feeding device of Claim 1, wherein the gas-generation-accelerating means is an ultrasonic oscillator.
Claim 5
Dependent Claim
26 words
The gas-feeding device of Claim 1, wherein the gas-generation-accelerating means is an atomizer employing a piezoelectric element to eject the organometallic compound in a mist state.
Claim 6
Dependent Claim
18 words
The gas-feeding device of any one of Claims 1 to 4, wherein the organometallic compound is dimethylaluminum hydride.
Claim 7
Dependent Claim
12 words
The gas-feeding device of Claim 1, wherein the carrier gas is hydrogen.
Claim 8
Dependent Claim
86 words
A gas feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas; a plurality of gas-introducing members for introducing the carrier gas into the storing means; and a gas switching means for turning on or turning off feed lines of the carrier gas connected to the plurality of gas-introducing members, and for distributing the carrier gas through the turned-on feed line.
Claim 9
Dependent Claim
86 words
A gas feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas; a plurality of gas-introducing members for introducing the carrier gas into the storing means; and a gas switching means for turning on or turning off feed lines of the carrier gas connected to the plurality of gas-introducing members, and for distributing the carrier gas through the turned-on feed line.
Claim 10
Dependent Claim
30 words
The gas-feeding device of Claim 7, wherein the feed lines of the carrier gas to the plurality of gas-introducing members are turned on or turned off with delays of timing.
Claim 11
Dependent Claim
27 words
The gas-feeding device of Claim 7, wherein each of the plurality of gas-introducing members has a plurality of gas-introducing openings for introducing gas into the organometallic compound.
Claim 12
Dependent Claim
63 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas; a gas-introducing member having a plurality of small openings for introducing the carrier gas into the storing means; and a ultrasonic oscillator arranged in the storing means.
Claim 13
Dependent Claim
63 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas; a gas-introducing member having a plurality of small openings for introducing the carrier gas into the storing means; and a ultrasonic oscillator arranged in the storing means.
Claim 14
Dependent Claim
53 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; and an injection means for injecting the organometallic compound in a mist state into the container.
Claim 15
Dependent Claim
53 words
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; and an injection means for injecting the organometallic compound in a mist state into the container.
Claim 16
Dependent Claim
20 words
The gas-feeding device of Claim 11, wherein a means for generating energy for the injection means is a piezoelectric element.
Claim 17
Dependent Claim
18 words
The gas-feeding device of any one of Claims 7 to 12, wherein the organometallic compound is dimethylaluminum hydride.
Claim 18
Dependent Claim
12 words
The gas-feeding device of Claim 13, wherein the carrier gas is hydrogen.
Claim 19
Dependent Claim
118 words
A deposition-film-forming apparatus for is the chemical vapor deposition method comprising: (1) a gas-feeding device comprising a container having a space for introducing and discharging a starting gas containing an organometallic compound for formation of deposition film by aid of a carrier gas; a gas-introducing means connected to the container and having a plurality of gas-introducing openings for introducing the the carrier gas or the starting gas into the container to generate the starting gas; and a gas-generation-accelerating means for accelerating the generation of the starting gas; (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 20
Dependent Claim
118 words
A deposition-film-forming apparatus for is the chemical vapor deposition method comprising: (1) a gas-feeding device comprising a container having a space for introducing and discharging a starting gas containing an organometallic compound for formation of deposition film by aid of a carrier gas; a gas-introducing means connected to the container and having a plurality of gas-introducing openings for introducing the the carrier gas or the starting gas into the container to generate the starting gas; and a gas-generation-accelerating means for accelerating the generation of the starting gas; (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 21
Dependent Claim
42 words
The gas-feeding device of Claim 15, wherein the gas-generation-accelerating means is a gas-switching means which turns on or turns off feed lines of the carrier gas to the plurality of gas-introducing means to distribute the carrier gas through a turned-on feed line.
Claim 22
Dependent Claim
14 words
The gas-feeding device of Claim 15, wherein the gas-generation-accelerating means is an ultrasonic oscillator.
Claim 23
Dependent Claim
26 words
The gas-feeding device of Claim 15, wherein the gas-generation-accelerating means is an atomizer employing a piezoelectric element to eject the organometallic compound in a mist state.
Claim 24
Dependent Claim
18 words
The gas-feeding device of any one of Claims 15 to 18, wherein the organometallic compound is dimethylaluminum hydride.
Claim 25
Dependent Claim
12 words
The gas-feeding device of Claim 19, wherein the carrier gas is hydrogen.
Claim 26
Dependent Claim
117 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas for deposition film formation; a plurality of gas-introducing members for introducing the carrier gas into the storing means; and a gas switching means for turning on or turning off feed lines of the carrier gas to the plurality of gas-introducing means, and distributing the carrier gas through a turned-on feed line, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 27
Dependent Claim
117 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas for deposition film formation; a plurality of gas-introducing members for introducing the carrier gas into the storing means; and a gas switching means for turning on or turning off feed lines of the carrier gas to the plurality of gas-introducing means, and distributing the carrier gas through a turned-on feed line, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 28
Dependent Claim
96 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas for deposition film formation; a gas-introducing member having a plurality of openings for introducing the carrier gas into the storing means; and a ultrasonic oscillator installed in the storing means, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 29
Dependent Claim
96 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising an organometallic compound-storing means for discharging the starting gas containing the organometallic compound by introduction of a carrier gas for deposition film formation; a gas-introducing member having a plurality of openings for introducing the carrier gas into the storing means; and a ultrasonic oscillator installed in the storing means, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 30
Dependent Claim
88 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas for deposition film formation; and an injection means for injecting the organometallic compound in a is mist state into the container, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 31
Dependent Claim
88 words
A deposition-film-forming apparatus for the chemical vapor deposition method comprising: (1) a gas feeding device comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas for deposition film formation; and an injection means for injecting the organometallic compound in a is mist state into the container, (2) a reaction chamber connected to the gas-feeding device to receive the starting gas fed therein, and (3) an exhausting means connected to the reaction chamber for exhausting the reaction chamber.
Claim 32
Dependent Claim
57 words
A gas-feeding device suitable for use in chemical vapour deposition or a component therefor comprising means for accelerating a gas and/or switching means between a plurality of gas supply lines and/or an ultrasonic oscillator that can act on a starting material and/or means for injecting starting material into a mist and/or means for exhausting a reaction chamber.
Claim 33
Dependent Claim
57 words
A gas-feeding device suitable for use in chemical vapour deposition or a component therefor comprising means for accelerating a gas and/or switching means between a plurality of gas supply lines and/or an ultrasonic oscillator that can act on a starting material and/or means for injecting starting material into a mist and/or means for exhausting a reaction chamber.
References Cited (Backward Citations)
EP0139134A2
Cited
EP0283874A1
Cited
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