EP0419087A1
Expired / Lapsed
EP
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A process for the production of abrasives
Assignee: Sumitomo Electric Industries Ltd
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Filing: 1990-09-04
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Granted: —
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Expires: 2010-09-04
Abstract
Abstract Diamond abrasives with a narrow grain size distribution and isotropic shape can be produced in a simple and economical manner by a process for the production of abrasives of single crystal or polycrystalline diamond, which comprises synthesizing a diamond film by a gaseous phase synthesis method, subjecting the resulting diamond film to an etching treatment in an atmosphere containing oxygen and pulverizing the diamond film.
Inventors
- 👤 Tetsuo C/O Itami Works Of Sumitomo Yashiki
- 👤 Naoji C/O Itami Works Of Sumitomo Fujimori
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 20:12
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/56; C23C16/22; C23C16/26; C23C16/27; C23C16/271; C23C16/274; C23C16/276
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
44 words
A process for the production of abrasives of single crystal or polycrystalline diamond, which comprises synthesizing a diamond film by a gaseous phase synthesis method, subjecting the resulting diamond film to an etching treatment in an atmosphere containing oxygen and pulverizing the diamond film.
Claim 2
Dependent Claim
44 words
A process for the production of abrasives of single crystal or polycrystalline diamond, which comprises synthesizing a diamond film by a gaseous phase synthesis method, subjecting the resulting diamond film to an etching treatment in an atmosphere containing oxygen and pulverizing the diamond film.
Claim 3
Dependent Claim
27 words
A process as claimed in Claim 1, wherein the etching treatment is a heat treatment in an atmosphere containing oxygen at normal pressure or at reduced pressure.
Claim 4
Dependent Claim
20 words
A process as claimed in Claim 1, wherein the etching treatment is a plasma treatment in an atmosphere containing oxygen.
Claim 5
Dependent Claim
21 words
A process as claimed in Claim 1, wherein the etching treatment is an ion beam treatment in an atmosphere containing oxygen.
Claim 6
Dependent Claim
21 words
A process as claimed in Claim 1, wherein the etching treatment is a laser etching treatment in an atmosphere containing oxygen.
Claim 7
Dependent Claim
20 words
A process as claimed in any one of the preceding claims wherein the diamond film is coated onto a substrate.
Claim 8
Dependent Claim
22 words
A process as claimed in any one of the preceding claims wherein the substrate is polycrystalline silicon, single crystal silicon or molybdenum.
Claim 9
Dependent Claim
35 words
A process as claimed in any one of the preceding claims wherein the diamond film consists of polycrystalline diamond whose crystal grains have a grain diameter in the range of 0.5 to several hundreds µm.
References Cited (Backward Citations)
No citation records indexed.
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