EP0413291A2
Expired / Lapsed
EP
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Method and device for sputtering of films
Assignee: Hauzer Industries BV
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Filing: 1990-08-13
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Granted: —
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Expires: 2010-08-13
Abstract
Abstract Solution relates to sphere of thin layer sputtering, especially titanium-nitride-type hard, abrasion-proof layers. Ionization current on substrates, especially in greater distances from cathode, is in well-known sputtering methods weak or non-homogeneous. The new solution increases density and homogeneity of both ionization and electron current on substrates and enables ionic cladding during layer sputtering and with floating potential of substrates. Substrates (5) are placed in holding space defined by lines of force of magnetic multipolar field (13,14) that includes closed tunnel of magnetron-type lines of force (14) above sputtered cathode (2) and whose direction on boundary of holding space changes by turns from positive polarity to negative one and vice versa. Interaction of glow discharge with magnetic multipolar field forms in holding space homogeneous plasma whose particles bombard substrates. Degree of plasma's holding is controlled by form of magnetic field or by voltage on auxiliary cathode that passes through holding space. Device includes sources of magnetic field (10,11) placed around holding space with alternating orientation. In order to control degree of plasma's holding the device includes electromagnets (15,17) or sliding anode extension piece or auxiliary electrode.
Inventors
- 👤 Stanislav Kadlec
- 👤 Jindrich Musil
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 20:16
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
179 words
Method of layer sputtering on substrates with particles sputtered from cathode's surface during glow discharge in gas or in gas mixture under reduced pressure held in vacuum chamber containing substrates, anode and cathode above which a closed tunnel of magnetron-type magnetic field's lines of force is formed, whilst in chamber there is defined a holding space by aid of magnetic field, characterized by the fact that holding space containing substrates, outside which anode and vacuum chamber's walls are situated, is bounded by means or magnetic multipolar field's lines of force, whilst magnetic multipolar field is connected with closed tunnel of magnetron-type magnetic field's lines of force above sputtered cathode, and its direction changes by turns on boundary of holding space from positive polarity into negative one and vice versa and in direction from boundary to volume of holding space induction of magnetic field is reduced and owing to interaction of holding field and glue discharge, burning between cathode and anode, there is formed and held in holding space a plasma, by particles of which substrates and layers are bombarded.
Claim 2
Dependent Claim
179 words
Method of layer sputtering on substrates with particles sputtered from cathode's surface during glow discharge in gas or in gas mixture under reduced pressure held in vacuum chamber containing substrates, anode and cathode above which a closed tunnel of magnetron-type magnetic field's lines of force is formed, whilst in chamber there is defined a holding space by aid of magnetic field, characterized by the fact that holding space containing substrates, outside which anode and vacuum chamber's walls are situated, is bounded by means or magnetic multipolar field's lines of force, whilst magnetic multipolar field is connected with closed tunnel of magnetron-type magnetic field's lines of force above sputtered cathode, and its direction changes by turns on boundary of holding space from positive polarity into negative one and vice versa and in direction from boundary to volume of holding space induction of magnetic field is reduced and owing to interaction of holding field and glue discharge, burning between cathode and anode, there is formed and held in holding space a plasma, by particles of which substrates and layers are bombarded.
Claim 3
Dependent Claim
57 words
Method in accordance with clause 1, characterized by the fact that degree of plasma's holding in holding space is controlled by changing intensity and/or form of holding magnetic multipolar field with regard to anode and/or with regard to chamber's walls and/or with regard to cathode, which changes plasma's density around substrates and energy of plasma's charged particles.
Claim 4
Dependent Claim
57 words
Method in accordance with clause 1, characterized by the fact that degree of plasma's holding in holding space is controlled by changing intensity and/or form of holding magnetic multipolar field with regard to anode and/or with regard to chamber's walls and/or with regard to cathode, which changes plasma's density around substrates and energy of plasma's charged particles.
Claim 5
Dependent Claim
36 words
Method in accordance with clause 1, characterized by the fact that degree of plasma's holding in holding space is affected by polarity and intensity of voltage led between anode and auxiliary electrode passing through holding space.
Claim 6
Dependent Claim
36 words
Method in accordance with clause 1, characterized by the fact that degree of plasma's holding in holding space is affected by polarity and intensity of voltage led between anode and auxiliary electrode passing through holding space.
Claim 7
Dependent Claim
29 words
Method in accordance with clause 1, characterized by the fact that surface of substrates and/or layers growing on substrates is held on selected potential with regard to anode's potential.
Claim 8
Dependent Claim
29 words
Method in accordance with clause 1, characterized by the fact that surface of substrates and/or layers growing on substrates is held on selected potential with regard to anode's potential.
Claim 9
Dependent Claim
53 words
Method in accordance with clause 1, characterized by the fact that substrates and/or growing layers are charged on floating potential and owing to difference between plasma's potential and floating potential they are bombarded by charged particles, energy and density of which are controlled by plasma's holding degree, gas pressure and sputtering discharge's output.
Claim 10
Dependent Claim
53 words
Method in accordance with clause 1, characterized by the fact that substrates and/or growing layers are charged on floating potential and owing to difference between plasma's potential and floating potential they are bombarded by charged particles, energy and density of which are controlled by plasma's holding degree, gas pressure and sputtering discharge's output.
Claim 11
Dependent Claim
127 words
Device for carrying out method in accordance with clause 1, consisting in vacuum chamber where cathode of sputtering source, holder with substrates and anode are placed, whilst in wall of vacuum chamber there are inlet of working gas and pumping output, outside vacuum chamber there is placed source of direct-current or high-frequency voltage, connected between cathode and anode, and magnetic field sources, characterized by the fact that sources (10, 11, 12, 15, 17, 27, 28) of magnetic field for forming a holding magnetic multipolar field are accommodated around whole holding space that contains substrates so that groups (22) of magnetic field sources (10) have like poles in one direction and alternate with adjacent groups (23) of magnetic field sources (10) that have like poles in opposite direction.
Claim 12
Dependent Claim
127 words
Device for carrying out method in accordance with clause 1, consisting in vacuum chamber where cathode of sputtering source, holder with substrates and anode are placed, whilst in wall of vacuum chamber there are inlet of working gas and pumping output, outside vacuum chamber there is placed source of direct-current or high-frequency voltage, connected between cathode and anode, and magnetic field sources, characterized by the fact that sources (10, 11, 12, 15, 17, 27, 28) of magnetic field for forming a holding magnetic multipolar field are accommodated around whole holding space that contains substrates so that groups (22) of magnetic field sources (10) have like poles in one direction and alternate with adjacent groups (23) of magnetic field sources (10) that have like poles in opposite direction.
Claim 13
Dependent Claim
83 words
Device in accordance with clause 6 for carrying out method according to clause 1, characterized by the fact that sources (10, 11, 12, 15, 17, 27, 28) of magnetic field are placed inside chamber (1) and/or in wall of chamber (1) and/or outside chamber (1) and/or behind cathode (2), whilst groups (27, 28) of sources placed behind cathode (2) are arranged in concentric closed curves for forming at least one closed tunnel (14) of magnetic field's lines of force above cathode's (2) surface.
Claim 14
Dependent Claim
83 words
Device in accordance with clause 6 for carrying out method according to clause 1, characterized by the fact that sources (10, 11, 12, 15, 17, 27, 28) of magnetic field are placed inside chamber (1) and/or in wall of chamber (1) and/or outside chamber (1) and/or behind cathode (2), whilst groups (27, 28) of sources placed behind cathode (2) are arranged in concentric closed curves for forming at least one closed tunnel (14) of magnetic field's lines of force above cathode's (2) surface.
Claim 15
Dependent Claim
39 words
Device in accordance with clause 6 for carrying out method according to clause 4, characterized by the fact that source (7) of direct-current or high-frequency voltage U S is connected between holder (4) of substrates (5) and anode (3).
Claim 16
Dependent Claim
39 words
Device in accordance with clause 6 for carrying out method according to clause 4, characterized by the fact that source (7) of direct-current or high-frequency voltage U S is connected between holder (4) of substrates (5) and anode (3).
Claim 17
Dependent Claim
34 words
Device in accordance with clause 6 for carrying out method according to clause 2, characterized by the fact thatit includes a sliding anode extension piece (31) made of conductive material, electrically connected across anode.
Claim 18
Dependent Claim
34 words
Device in accordance with clause 6 for carrying out method according to clause 2, characterized by the fact thatit includes a sliding anode extension piece (31) made of conductive material, electrically connected across anode.
Claim 19
Dependent Claim
59 words
Device in accordance with clause 6 for carrying out method according to clause 3, characterized by the fact that in holding space there is accommodated at least one auxiliary electrode (40) and outside chamber there is placed a direct-current voltage source U E (41), attached with one pole across auxiliary electrode (40) and with other pole across anode (3).
Claim 20
Dependent Claim
59 words
Device in accordance with clause 6 for carrying out method according to clause 3, characterized by the fact that in holding space there is accommodated at least one auxiliary electrode (40) and outside chamber there is placed a direct-current voltage source U E (41), attached with one pole across auxiliary electrode (40) and with other pole across anode (3).
References Cited (Backward Citations)
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