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EP0409370A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Bipolar transistor

Assignee: NTT Inc
•
Filing: 1986-05-07
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Granted: —
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Expires: 2006-05-07
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Abstract

Abstract A bipolar transistor includes collector, base and emitter regions. The collector region consists of a first semiconductor region (2) of a first conductivity type and formed in contact with a surface of a semiconductor layer. The base region consists of a second semiconductor region (6) of a second conductivity type formed within the collector region to be in contact with the surface of the semiconductor layer. The emitter region consists of a third semiconductor region (8) of the first conductivity type formed within the base region to be in contact with the surface of the semiconductor layer. The transistor also includes collector, base, and emitter electrodes. The collector and base electrodes are connected to the collector and base regions at opposite edges of a single opening formed in a field insulating film (4A, 15) covering the surface of the semi­conductor layer. The collector and base electrodes (14B,13) consist of a conductor. The emitter electrode (14A) is connected to the emitter region and consists of a conductor. The transistor further includes first and second insulating interlayers. The first insulating interlayer is formed between the collector and emitter electrodes. The second insulating interlayer is formed between the emitter and base electrode. The distance between the collector and emitter electrodes on the surface of the semiconductor layer is substan­tially the same as that between the emitter and base electrodes.

Inventors

  • 👤 Tetsushi Sakai
  • 👤 Yoshiji Kobayashi

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-01 13:22
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/069; H10D; H10D10/00; H10D10/01; H10D10/051; H10D10/40; H10D10/421; H10D64/00; H10D64/20; H10D64/23; H10D64/231; H10P; H10P32/00; H10P32/10; H10P32/14; H10P32/1408; H10P32/1414; H10P32/17; H10P32/171

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 279 words
A bipolar transistor comprising: a collector region (2,51) consisting of a first semiconductor region of a first conductivity type, said collector region being formed in contact with a surface of a semiconductor layer; a base region (6,34,52) consisting of a second semiconductor region of a second conductivity type formed within said collector region to be in contact with the surface of said semiconductor layer; an emitter region (8,38,53) consisting of a third semiconductor region of the first conductivity type formed within said base region to be in contact with the surface of said semiconductor layer; a base contact region (40,55) contacting the base region and being of the same conductivity type but having a higher concentration than the base region, the width of the base contact region being constant, a collector contact region (39,54) contacting the collector region and being of the same conductivity type but having a higher concentration than the collector region, the width of the collector contact region being constant; collector and base electrodes (19A,19B,32A′,32B′) connected to said collector and base contact regions at opposite edges of a single opening formed in a field insulating film (17,18) covering the surface of said semiconductor layer, said collector and base electrodes consisting of a conductor; an emitter electrode (37,56) connected to said emitter region and consisting of a conductor; a first insulating interlayer (33) formed between said collector electrode and said emitter electrode; and a second insulating interlayer (33) formed beween said emitter electrode and said base electrode, wherein a distance between said collector and emitter electrodes on the surface of said semiconductor layer is substantially the same as that between said emitter electrode and said base electrode.
Claim 2
Dependent Claim 279 words
A bipolar transistor comprising: a collector region (2,51) consisting of a first semiconductor region of a first conductivity type, said collector region being formed in contact with a surface of a semiconductor layer; a base region (6,34,52) consisting of a second semiconductor region of a second conductivity type formed within said collector region to be in contact with the surface of said semiconductor layer; an emitter region (8,38,53) consisting of a third semiconductor region of the first conductivity type formed within said base region to be in contact with the surface of said semiconductor layer; a base contact region (40,55) contacting the base region and being of the same conductivity type but having a higher concentration than the base region, the width of the base contact region being constant, a collector contact region (39,54) contacting the collector region and being of the same conductivity type but having a higher concentration than the collector region, the width of the collector contact region being constant; collector and base electrodes (19A,19B,32A′,32B′) connected to said collector and base contact regions at opposite edges of a single opening formed in a field insulating film (17,18) covering the surface of said semiconductor layer, said collector and base electrodes consisting of a conductor; an emitter electrode (37,56) connected to said emitter region and consisting of a conductor; a first insulating interlayer (33) formed between said collector electrode and said emitter electrode; and a second insulating interlayer (33) formed beween said emitter electrode and said base electrode, wherein a distance between said collector and emitter electrodes on the surface of said semiconductor layer is substantially the same as that between said emitter electrode and said base electrode.
Claim 3
Dependent Claim 38 words
A transistor according to claim 1, wherein the distance between said collector and emitter electrodes on the surface of said semiconductor layer and the distance between said emitter and base electrodes are not more than 0.5 µm each.
Claim 4
Dependent Claim 29 words
A transistor according to claim 1, wherein said collector, emitter, and base electrodes are made of a material selected from the group consisting of doped polysilicon and doped silicide.
Claim 5
Dependent Claim 23 words
A transistor according to claim 1, wherein said collector and base electrodes extend from edges of said opening onto said field insulating film.
Claim 6
Dependent Claim 14 words
A transistor according to claim 1, wherein said semiconductor layer comprises a semiconductor substrate.

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