EP0404206A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Resist compositions
Assignee: International Business Machines Corp
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Filing: 1983-05-02
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Granted: —
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Expires: 2003-05-02
Abstract
Abstract Resists sensitive to UV, electron beam and x-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
Inventors
- 👤 Hiroshi Ito
- 👤 Carlton Grant Willson
- 👤 Jean M.J. Frechet
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 04:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/016; G03F7/021; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/109; Y10S430/111; Y10S430/114; Y10S430/115
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
103 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone; said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a nonpolar solvent to remove unexposed areas of the composition; and wherein said photoinitiator is selected from the group consisting of unsubstituted diaryliodonium salts, symmetrically substituted diaryliodonium salts, or unsymmetrically substituted diaryliodonium salts.
Claim 2
Dependent Claim
103 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone; said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a nonpolar solvent to remove unexposed areas of the composition; and wherein said photoinitiator is selected from the group consisting of unsubstituted diaryliodonium salts, symmetrically substituted diaryliodonium salts, or unsymmetrically substituted diaryliodonium salts.
Claim 3
Dependent Claim
103 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone; said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a nonpolar solvent to remove unexposed areas of the composition; and wherein said photoinitiator is selected from the group consisting of unsubstituted triarylsulfonium salts, symmetrically substituted triarylsulfonium salts, or unsymmetrically substituted triarylsulfonium salts.
Claim 4
Dependent Claim
103 words
A resist composition comprising: a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone; said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a nonpolar solvent to remove unexposed areas of the composition; and wherein said photoinitiator is selected from the group consisting of unsubstituted triarylsulfonium salts, symmetrically substituted triarylsulfonium salts, or unsymmetrically substituted triarylsulfonium salts.
Claim 5
Dependent Claim
27 words
3 . A resist composition as claimed in claim 1 or Claim 2 which also contains a sensitizer that absorbs radiation and transfers energy to the photoinitiator.
Claim 6
Dependent Claim
16 words
4 . A resist composition as claimed in claim 3 wherein the sensitizer is a dye.
Claim 7
Dependent Claim
18 words
5 . A resist composition as claimed in claim 3 wherein the sensitizer is a polycyclic aromatic compound.
Claim 8
Dependent Claim
15 words
6 . A resist composition as claimed in claim 3 wherein the sensitizer is pyrene.
Claim 9
Dependent Claim
15 words
7 . A resist composition as claimed in claim 3 wherein the sensitizer is perylene.
Claim 10
Dependent Claim
28 words
A resist composition as claimed in claim 1 or claim 2, wherein said photoinitiator is taken from the group consisting of symmetrically or unsymmetrically substituted diaryliodonium or triarylsulfonium.
References Cited (Backward Citations)
No citation records indexed.
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