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EP0386797A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Optical apparatus using wavelength selective photocoupler

Assignee: Canon Inc
•
Filing: 1990-03-12
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Granted: —
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Expires: 2010-03-12
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Abstract

Abstract The present invention relates to optical apparatus such as a photosensor, a semiconductor laser, an optical amplifier in which a wavelength selective photo­coupler is used so as to couple two waveguides through a diffraction grating. A photosensor which is one of the optical apparatus according to the present invention comprises a substrate, a first waveguide layer formed on the substrate, a second waveguide layer formed on the first waveguide layer to be stacked in a direction of thickness and which has a guided mode difference from that of the first waveguide layer, a diffraction grating formed on an overlapping region of the guided modes of the first and second waveguide layers and which couples light components of a specific wavelength range of light propagating through the first waveguide layer to the second waveguide layer, a light absorption layer for absorbing at least some light components of the light components coupled to the second waveguide layer, and an electrode for converting the light components absorbed by the light absorption layer into an electrical signal and outputting the electrical signal.

Inventors

  • 👤 Hajime Sakata
  • 👤 Hidetoshi Nojiri

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-06 13:19
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/50; H01S5/5045; G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/122; G02B6/124; G02B6/24; G02B6/42; H01S3/00; H01S3/005; H01S3/0064; H01S5/10; H01S5/1028; H01S5/1032; H10; H10H; H10H29/00; H10H29/10; G02B6/26; G02B6/28; G02B6/293; G02B6/29304; G02B6/29316; H01S5/02; H01S5/026; H01S5/0262; H01S5/0264; H01S5/04; H01S5/042; H01S5/0425; H01S5/04256; H01S5/1035

Claims Analysis

Total Claims: 64
Claim 1
Independent Claim 134 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; a light absorption layer for absorbing at least some light components of the light components coupled to said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 2
Dependent Claim 134 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; a light absorption layer for absorbing at least some light components of the light components coupled to said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 3
Dependent Claim 26 words
A photosensor according to claim 1, wherein said light absorption layer is formed in series with said second waveguide layer in a propagation direction of light.
Claim 4
Dependent Claim 39 words
A photosensor according to claim 1, wherein said light absorption layer comprises an i-type semiconductor, and p- and n-type semiconductor layers are formed on two sides of said light absorption layer, so that said photosensor constitutes a PIN photodiode.
Claim 5
Dependent Claim 18 words
A photosensor according to claim 1, wherein said diffraction grating comprises corrugations formed on said second waveguide layer.
Claim 6
Dependent Claim 63 words
A photosensor according to claim 1, wherein said photosensor satisfies the following equation: β₁(λ) - β₀(λ) = 2π/Λ where λ is a wavelength of guided light, β₀(λ) is a propagation constant of the guided mode of said first waveguide layer, β₁(λ) is a propagation constant of the guided mode of said second waveguide layer, and Λ is a pitch of said diffraction grating.
Claim 7
Dependent Claim 81 words
A photosensor according to claim 5, wherein said photosensor satisfies the following equation: ℓ = π/2g g = ∫ ε₁A₁(x)ε₀dx where ℓ is a region length of said diffraction grating, ε₀ is an electric field intensity distribution of the guided mode of said first waveguide layer, and ε₁ is an electric field intensity distribution of the guided mode of said second waveguide layer, and A₁(x) is a component corresponding to 1st-order diffracted light of the Fourier expansion of said diffraction grating.
Claim 8
Dependent Claim 40 words
A photosensor according to claim 1, further comprising first, second, and third cladding layers, said first cladding layer, said first waveguide layer, said second cladding layer, and said waveguide layer being sequentially stacked in an order named on said substrate.
Claim 9
Dependent Claim 24 words
A photosensor according to claim 7, wherein said substrate and said layers comprise a compound selected from the group consisting of GaAs and AlGaAs.
Claim 10
Dependent Claim 20 words
A photosensor according to claim 8, wherein each of said first and second waveguide layers comprises a multi-quantum well structure.
Claim 11
Dependent Claim 118 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer, and absorbing light propagating therethrough; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 12
Dependent Claim 118 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer, and absorbing light propagating therethrough; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 13
Dependent Claim 40 words
A photosensor according to claim 10, further comprising first, second, and third cladding layers, said first cladding layer, said first waveguide layer, said second cladding layer, and said waveguide layer being sequentially stacked in an order named on said substrate.
Claim 14
Dependent Claim 24 words
A photosensor according to claim 11, wherein said substrate and said layers comprise a compound selected from the group consisting of GaAs and AlGaAs.
Claim 15
Dependent Claim 20 words
A photosensor according to claim 12, wherein each of said first and second waveguide layers comprises a multi-quantum well structure.
Claim 16
Dependent Claim 55 words
A photosensor according to claim 11, wherein said first waveguide layer and said first and second cladding layers comprise a semiconductor of a first conductivity type, said third cladding layer comprises a semiconductor of a second conductivity type, and said second waveguide layer comprises an i-type semiconductor, so that said photosensor constitutes a PIN photodiode.
Claim 17
Dependent Claim 24 words
A photosensor according to claim 14, wherein the first conductivity type is an n type, and the second conductivity type is a p type.
Claim 18
Dependent Claim 90 words
A photosensor according to claim 11, wherein said substrate comprises a semi-insulating semiconductor, said first and second waveguide layers and said first, second, and third cladding layers comprise an i-type semiconductor, and a stripe-like region extending in a propagation direction of light is formed in a portion of a multilayered structure consisting of said substrate, said first and second waveguide layers, and said first, second, and third cladding layers, p- and n-type regions being formed on two sides of said stripe-like region, so that said photosensor constitutes a PIN photodiode.
Claim 19
Dependent Claim 127 words
A photosensor according to claim 11, wherein said substrate comprises a semi-insulating semiconductor, said first waveguide layer and said first, second, and third cladding layers comprise an i-type semiconductor, said second waveguide layer comprises an n-type semiconductor, and a stripe-like region extending in a propagation direction of light is formed in a portion of a multilayered structure consisting of said substrate, said first and second waveguide layers, and said first, second, and third cladding layers, p- and n-type regions being formed on two sides of said stripe-like region, source and drain electrodes being in contact with said p- and n-type regions, an insulating layer being formed on a portion said third cladding layer on said stripe-like region, and a gate electrode being formed on said insulating layer.
Claim 20
Dependent Claim 18 words
A photosensor according to claim 17, wherein said diffraction grating comprises corrugations formed on said second cladding layer.
Claim 21
Dependent Claim 18 words
A photosensor according to claim 10, wherein said diffraction grating comprises corrugations formed on said second waveguide layer.
Claim 22
Dependent Claim 63 words
A photosensor according to claim 10, wherein said photosensor satisfies the following equation: β₁(λ) - β₀(λ) = 2π/Λ where λ is a wavelength of guided light, β₀(λ) is a propagation constant of the guided mode of said first waveguide layer, β₁(λ) is a propagation constant of the guided mode of said second waveguide layer, and Λ is a pitch of said diffraction grating.
Claim 23
Dependent Claim 81 words
A photosensor according to claim 20, wherein said photosensor satisfies the following equation: ℓ = π/2g g = ∫ ε₁A₁(x)ε₀dx where ℓ is a region length of said diffraction grating, ε₀ is an electric field intensity distribution of the guided mode of said first waveguide layer, and ε₁ is an electric field intensity distribution of the guided mode of said second waveguide layer, and A₁(x) is a component corresponding to 1st-order diffracted light of the Fourier expansion of said diffraction grating.
Claim 24
Dependent Claim 154 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having guided modes different from those of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; a light absorption layer formed on said second waveguide layer to be stacked in a direction of thickness, guided modes of said light absorption layer less overlapping those of said first waveguide layer, and much overlapping those of said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 25
Dependent Claim 154 words
A photosensor comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having guided modes different from those of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling light components of a specific wavelength range of light propagating through said first waveguide layer to said second waveguide layer; a light absorption layer formed on said second waveguide layer to be stacked in a direction of thickness, guided modes of said light absorption layer less overlapping those of said first waveguide layer, and much overlapping those of said second waveguide layer; and an electrode for converting the light components absorbed by said light absorption layer into an electrical signal and outputting the electrical signal.
Claim 26
Dependent Claim 43 words
A photosensor according to claim 22, wherein said photosensor is divided into a waveguide region, a wavelength section region, and a light detection region in a propagation direction of light, and said light absorption layer is formed in only said light detection region.
Claim 27
Dependent Claim 18 words
A photosensor according to claim 23, wherein said diffraction grating is formed in only the wavelength selection region.
Claim 28
Dependent Claim 40 words
A photosensor according to claim 22, further comprising first, second, and third cladding layers, said first cladding layer, said first waveguide layer, said second cladding layer, and said waveguide layer being sequentially stacked in an order named on said substrate.
Claim 29
Dependent Claim 26 words
A photosensor according to claim 25, wherein said second cladding layer and said second waveguide layer constitute stripe-like ridges extending in the propagation direction of light.
Claim 30
Dependent Claim 61 words
A photosensor according to claim 25, further comprising a fourth cladding layer formed on said light absorption layer, and wherein said first waveguide layer and said first, second and third cladding layers comprise a semiconductor of a first conductivity type, and said fourth cladding layer comprises a semiconductor of a second conductivity type, so that said photosensor constitutes a PIN photodiode.
Claim 31
Dependent Claim 24 words
A photosensor according to claim 27, wherein the first conductivity type is an n type, and the second conductivity type is a p type.
Claim 32
Dependent Claim 24 words
A photosensor according to claim 25, wherein said substrate and said layers comprise a compound selected from the group consisting of GaAs and AlGaAs.
Claim 33
Dependent Claim 20 words
A photosensor according to claim 26, wherein each of said first and second waveguide layers comprises a multi-quantum well structure.
Claim 34
Dependent Claim 27 words
A photosensor according to claim 22, wherein said electrode comprises source, drain, and gate electrodes which constitute a field effect transistor together with said light absorption layer.
Claim 35
Dependent Claim 22 words
A photosensor according to claim 22, wherein said diffraction grating comprises diffraction grating formation layers cyclically formed on said second waveguide layer.
Claim 36
Dependent Claim 63 words
A photosensor according to claim 22, wherein said photosensor satisfies the following equation: β₁(λ) - β₀(λ) = 2π/Λ where λ is a wavelength of guided light, β₀(λ) is a propagation constant of the guided mode of said first waveguide layer, β₁(λ) is a propagation constant of the guided mode of said second waveguide layer, and Λ is a pitch of said diffraction grating.
Claim 37
Dependent Claim 81 words
A photosensor according to claim 33, wherein said photosensor satisfies the fc,llowing equation: ℓ = π/2g g = ∫ ε₁A₁(x)ε₀dx where ℓ is a region length of said diffraction grating, ε₀ is an electric field intensity distribution of the guided mode of said first waveguide layer, and ε₁ is an electric field intensity distribution of the guided mode of said second waveguide layer, and A₁(x) is a component corresponding to 1st-order diffracted light of the Fourier expansion of said diffraction grating.
Claim 38
Dependent Claim 116 words
A semiconductor laser comprising: a substrate; a first waveguide layer formed on said substrate and including a laser active layer, said laser active layer emitting a laser beam upon injection of a current; an electrode for supplying a current to said laser active layer; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; and a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling the laser beam emitted from said laser active layer to said second waveguide layer.
Claim 39
Dependent Claim 116 words
A semiconductor laser comprising: a substrate; a first waveguide layer formed on said substrate and including a laser active layer, said laser active layer emitting a laser beam upon injection of a current; an electrode for supplying a current to said laser active layer; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; and a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating coupling the laser beam emitted from said laser active layer to said second waveguide layer.
Claim 40
Dependent Claim 35 words
A semiconductor laser according to claim 35, wherein said second waveguide layer comprises a light isolator for rotating a polarization direction of light propagating through said second waveguide layer through 45° by a Faraday effect.
Claim 41
Dependent Claim 16 words
A semiconductor laser according to claim 36, wherein said second waveguide layer essentially consists of CdMnTe.
Claim 42
Dependent Claim 38 words
A semiconductor laser according to claim 36, wherein said semiconductor laser is divided into a laser unit and an isolator unit in the propagation direction of light, and said diffraction grating is formed on only said isolator unit.
Claim 43
Dependent Claim 19 words
A semiconductor laser according to claim 38, wherein said second waveguide layer is formed on only said isolator unit.
Claim 44
Dependent Claim 16 words
A semiconductor laser according to claim 38, wherein said laser unit comprises a distributed feedback reflector.
Claim 45
Dependent Claim 49 words
A semiconductor laser according to claim 38, wherein two said diffraction gratings are formed to be separated by a predetermined distance in a propagation direction of light, light coupled from said first waveguide layer and propagating through said second waveguide layer being coupled to said first waveguide layer again.
Claim 46
Dependent Claim 41 words
A semiconductor laser according to claim 36, further comprising first, second, and third cladding layers, said first cladding layer, said first waveguide layer, said second cladding layer, and said waveguide layer being sequentially stacked in an order named on said substrate.
Claim 47
Dependent Claim 58 words
A semiconductor laser according to claim 42, wherein said substrate, said first cladding layer, and said first wave guide layer comprise a compound selected from the group consisting of GaAs and AlGaAs, and said second cladding layer, said second waveguide layer, and said third cladding layer comprise a compound selected from the group consisting of CdTe and CdMnTe.
Claim 48
Dependent Claim 21 words
A semiconductor laser according to claim 35, wherein each of said first and second waveguide layers comprises a multi-quantum well structure.
Claim 49
Dependent Claim 19 words
A semiconductor laser according to claim 35, wherein said diffraction grating comprises corrugations formed on said second waveguide layer.
Claim 50
Dependent Claim 19 words
A semiconductor laser according to claim 35, wherein said diffraction grating comprises corrugations formed on said first waveguide layer.
Claim 51
Dependent Claim 65 words
A semiconductor laser according to claim 35, wherein said semiconductor laser satisfies the following equation: β₁(λ) - β₀(λ) = 2π/Λ where λ is a wavelength of guided light, β₀(λ) is a propagation constant of the guided mode of said first waveguide layer, β₁(λ) is a propagation constant of the guided mode of said second waveguide layer, and Λ is a pitch of said diffraction grating.
Claim 52
Dependent Claim 83 words
A semiconductor laser according to claim 47, wherein said semiconductor laser satisfies the following equation: ℓ = π/2g g = ∫ ε₁A₁(x)ε₀dx where ℓ is a region length of said diffraction grating, ε₀ is an electric field intensity distribution of the guided mode of said first waveguide layer, and ε₁ is an electric field intensity distribution of the guided mode of said second waveguide layer, and A₁(x) is a component corresponding to 1st-order diffracted light of the Fourier expansion of said diffraction grating.
Claim 53
Dependent Claim 127 words
An optical amplifier comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating optically coupling said first and second waveguide layers in a specific wavelength range; a laser active region formed on at least a portion of said second waveguide layer, said laser active region amplifying light propagating through said second waveguide layer upon supply of a current; and an electrode for supplying a current to said laser active region.
Claim 54
Dependent Claim 127 words
An optical amplifier comprising: a substrate; a first waveguide layer formed on said substrate; a second waveguide layer formed on said first waveguide layer to be stacked in a direction of thickness, said second waveguide layer having a guided mode different from that of said first waveguide layer; a diffraction grating formed on an overlapping region of the guided modes of said first and second waveguide layers, said diffraction grating optically coupling said first and second waveguide layers in a specific wavelength range; a laser active region formed on at least a portion of said second waveguide layer, said laser active region amplifying light propagating through said second waveguide layer upon supply of a current; and an electrode for supplying a current to said laser active region.
Claim 55
Dependent Claim 67 words
An optical amplifier according to claim 49, wherein two said diffraction gratings are formed to be separated by a predetermined distance in a propagation direction of light, light propagating through said first waveguide layer being coupled to said second waveguide layer by one diffraction grating, and the light coupled by said second waveguide layer being coupled to said first waveguide layer again by the other diffraction grating.
Claim 56
Dependent Claim 32 words
An optical amplifier according to claim 50, wherein an impurity is diffused in a portion of said second waveguide layer located on a region excluding a portion between said two diffraction gratings.
Claim 57
Dependent Claim 41 words
An optical amplifier according to claim 49, further comprising first, second, and third cladding layers, said first cladding layer, said first waveguide layer, said second cladding layer, and said waveguide layer being sequentially stacked in an order named on said substrate.
Claim 58
Dependent Claim 25 words
An optical amplifier according to claim 52, wherein said substrate and said layers comprise a compound selected from the group consisting of GaAs and AlGaAs.
Claim 59
Dependent Claim 20 words
An optical amplifier according to claim 53, each of said first and second waveguide layers comprises a multi-quantum well structure.
Claim 60
Dependent Claim 53 words
An optical amplifier according to claim 52, wherein said first cladding layer, said first waveguide layer, said second cladding layer, said second waveguide layer, and said third cladding layer are mesa-etched excluding a stripe-like region extending in a propagation direction of light, buried layers being formed on two sides of the mesa region.
Claim 61
Dependent Claim 35 words
An optical amplifier according to claim 52, wherein stripe-like ridges extending in a propagation direction of light are formed in said second cladding layer, said second waveguide layer, and said third cladding layer by etching.
Claim 62
Dependent Claim 19 words
An optical amplifier according to claim 49, wherein said diffraction grating comprises corrugations formed on said first waveguide layer.
Claim 63
Dependent Claim 65 words
An optical amplifier according to claim 49, wherein said optical amplifier satisfies the following equation: β₁(λ) - β₀(λ) = 2π/Λ where λ is a wavelength of guided light, β₀(λ) is a propagation constant of the guided mode of said first waveguide layer, β₁(λ) is a propagation constant of the guided mode of said second waveguide layer, and Λ is a pitch of said diffraction grating.
Claim 64
Dependent Claim 83 words
An optical amplifier according to claim 58, wherein said optical amplifier satisfies the following equation: ℓ = π/2g g = ∫ ε₁A₁(x)ε₀dx where ℓ is a region length of said diffraction grating, ε₀ is an electric field intensity distribution of the guided mode of said first waveguide layer, and ε₁ is an electric field intensity distribution of the guided mode of said second waveguide layer, and A₁(x) is a component corresponding to 1st-order diffracted light of the Fourier expansion of said diffraction grating.

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