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EP0383491A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

A low pressure vapour phase growth apparatus

Assignee: Canon Anelva Corp
•
Filing: 1990-02-08
•
Granted: —
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Expires: 2010-02-08
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Abstract

Abstract A low pressure vapour phase growth apparatus is disclosed. The apparatus comprises a window (5) made of a light-transmissive material, a gas feeder (2) for feeding a reactive gas, an exhaust exit (3) for pumping gases out after a chemical reaction, a lamp (6) for effecting radiant heating of a substrate (4) with a radiation emitted therefrom and transmitted through said light-transmissive window, and a cooling mechanism (8,11) for forcibly cooling said light-transmissive window. The substrate and the light-transmissive window are maintained in no mutual contact with a gap therebetween having a width of at most the mean free path of a gas existing in the gap. The reactive gas fed through the gas feeder undergoes the chemical reaction on the obverse surface of the substrate to form a thin film thereon.

Inventors

  • 👤 Shigeru Mizuno
  • 👤 Isamu Morisako

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 03:55
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/46; C23C16/48; C23C16/481

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 130 words
A low pressure vapour phase growth apparatus comprising a window (5) comprising a light-transmissive material, a gas feed (2) for introducing a reactive gas into the apparatus, an exhaust exit (3) for removing gases after chemical reaction, a lamp (6) for effecting radiant heating of a substrate (4) with radiation emitted therefrom, the radiation being transmitted through said light-transmissive window, and a cooling mechanism (8,11) for cooling said light-transmissive window; wherein there is no mutual contact between said substrate and said light-transmissive window and a gap therebetween has a width of at most the mean free path of a gas in said gap; and wherein said reactive gas fed through said gas feed undergoes said chemical reaction on the obverse surface of said substrate to form a thin film thereon.
Claim 2
Dependent Claim 130 words
A low pressure vapour phase growth apparatus comprising a window (5) comprising a light-transmissive material, a gas feed (2) for introducing a reactive gas into the apparatus, an exhaust exit (3) for removing gases after chemical reaction, a lamp (6) for effecting radiant heating of a substrate (4) with radiation emitted therefrom, the radiation being transmitted through said light-transmissive window, and a cooling mechanism (8,11) for cooling said light-transmissive window; wherein there is no mutual contact between said substrate and said light-transmissive window and a gap therebetween has a width of at most the mean free path of a gas in said gap; and wherein said reactive gas fed through said gas feed undergoes said chemical reaction on the obverse surface of said substrate to form a thin film thereon.
Claim 3
Dependent Claim 24 words
A low pressure vapour phase growth apparatus as claimed in claim 1, wherein an inert gas is used as said gas in said gap.
Claim 4
Dependent Claim 34 words
A low pressure vapour phase growth apparatus according to either of claims 1 and 2, wherein the substrate is held in position by means of a fixing tool, on which the substrate is placed.

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