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EP0383215A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Epitaxial-growth structure for a semiconductor light-emitting device, and semiconductor light-emitting device using the same

Assignee: NTT Inc
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Filing: 1990-02-10
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Granted: —
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Expires: 2010-02-10
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Abstract

Abstract An epitaxial growth structure for a semiconductor light-emitting device includes a sapphire substrate having a (01 1 0) face (substantially M face), and a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on the substrate. A semiconductor light-emitting device includes the sapphire substrate having a (01 1 0) face (substantially M face), the wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on the substrate, an insulating film formed on the single crystal film, and a metal electrode formed on the insulating film.

Inventors

  • 👤 Takashi Matsuoka
  • 👤 Toru Sasaki

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-06 16:17
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/822; H10H20/824; H10H20/825; H01; H01S; H01S5/00; H01S5/30; H01S5/32; H01S5/3202; H01S5/32025; H01S5/323; H01S5/32308; H01S5/32341; H10H20/01; H10H20/011; H10H20/013; H10H20/0133; H10H20/01335; H10H20/817; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/29; H10P14/2901; H10P14/2921; H10P14/2926; H10P14/32; H10P14/3202; H10P14/3214; H10P14/3216; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3416; H10P14/3438; H10P14/3441; H10P14/3444; H10P14/36; H10P14/3602; H01S2304/00; H01S2304/04; H01S5/02; H01S5/0206; H01S5/0213; H01S5/022; H01S5/0233; H01S5/0234

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 40 words
An epitaxial growth structure for a semiconductor light-emitting device, comprising: a sapphire substrate having a substantially (01 1 0) face (M face); and a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on said substrate.
Claim 2
Dependent Claim 40 words
An epitaxial growth structure for a semiconductor light-emitting device, comprising: a sapphire substrate having a substantially (01 1 0) face (M face); and a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on said substrate.
Claim 3
Dependent Claim 32 words
A structure according to claim 1, wherein said single crystal film consists of In x Ga y Al 1-x-y N (0 ≦ x ≦ 1, 0 ≦ x + y ≦ 1).
Claim 4
Dependent Claim 23 words
A structure according to claim 2, wherein said single crystal film is epitaxially grown in a (01 1 3)-axial direction on said substrate.
Claim 5
Dependent Claim 52 words
A semiconductor light-emitting device comprising: a sapphire substrate having a substantially (01 1 0) face (M face); a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on said substrate; an insulating film formed on said single crystal film; and a metal electrode formed on said insulating film.
Claim 6
Dependent Claim 52 words
A semiconductor light-emitting device comprising: a sapphire substrate having a substantially (01 1 0) face (M face); a wurtzite type Group III nitride mixed crystal semiconductor single crystal film epitaxially grown on said substrate; an insulating film formed on said single crystal film; and a metal electrode formed on said insulating film.
Claim 7
Dependent Claim 32 words
A device according to claim 4, wherein said single crystal film consists of In x Ga y Al 1-x-y N (0 ≦ x ≦ 1, 0 ≦ x + y ≦ 1).
Claim 8
Dependent Claim 23 words
A device according to claim 5, wherein said single crystal film is epitaxially grown in a <01 1 3>-axial direction on said substrate.
Claim 9
Dependent Claim 57 words
A device according to claim 4, further comprising second and third wurtzite type Group III nitride mixed crystal semiconductor single crystal films arranged and epitaxially grown between said single crystal film and said insulating film, said second single crystal film having a smaller band gap energy than those of said single crystal films at both sides thereof.

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