EP0379738A2
Expired / Lapsed
EP
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Optical layer
Assignee: OC Oerlikon Balzers AG
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Filing: 1989-12-29
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Granted: —
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Expires: 2009-12-29
Abstract
Abstract An optical layer and arrangements with such a layer are proposed which is predominantly of Ta2O5 and having an extinction coefficient for ultra-violet light less than 0.0075 for light of 308nm. Such a layer is produced by ion-beam-sputtering of a target which target is predominantly made of Ta2O5.
Inventors
- 👤 Eduard Dr. Kügler
- 👤 Roland Pfefferkorn
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-05 10:05
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; G02B1/11; G02B1/113; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/46
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
29 words
An optical layer being predominantly of Ta₂O₅ having an improved extinction coefficient for ultra-violet light, said layer having an extinction coefficient less than 0.0075 for light of 308nm wave-length.
Claim 2
Dependent Claim
29 words
An optical layer being predominantly of Ta₂O₅ having an improved extinction coefficient for ultra-violet light, said layer having an extinction coefficient less than 0.0075 for light of 308nm wave-length.
Claim 3
Dependent Claim
18 words
The optical layer of claim 1, having an extinction coefficient less than 0.005 for light of 308nm wave-length.
Claim 4
Dependent Claim
18 words
The layer of claim 1, being processed by ion-beam-sputtering of a target, said target being predominantly of Ta₂O₅.
Claim 5
Dependent Claim
21 words
The layer of claim 1, comprising further at least one of the following materials: ZrO₂, Y₂O₃, HfO₂, Sc₂O₃, MgO, Al₂O₃, SiO₂.
Claim 6
Dependent Claim
35 words
The layer of claim 4, being processed by ion-beam-sputtering of a target, said target being predominantly of Ta₂O₅ and comprising further at least one of the following materials: ZrO₂, Y₂O₃, HfO₂, Sc₂O₃, MgO, Al₂O₃, SiO₂.
Claim 7
Dependent Claim
11 words
The layer of claim 1, being of at least 99% Ta₂O₅.
Claim 8
Dependent Claim
14 words
The layer of claim 2, said target being of at le ast 99% Ta₂O₅.
Claim 9
Dependent Claim
63 words
An optical element for ultra-violet light comprising at least one optical layer being predominantly of Ta₂O₅ and having an extinction coefficient less than 0.0075 if used for light of 308nm wave-length said layer having a thickness of λ/4 further comprising at least one further layer of λ/4 optical thickness made of a material of lower refractive index than the refractive index of Ta₂O₅.
Claim 10
Dependent Claim
63 words
An optical element for ultra-violet light comprising at least one optical layer being predominantly of Ta₂O₅ and having an extinction coefficient less than 0.0075 if used for light of 308nm wave-length said layer having a thickness of λ/4 further comprising at least one further layer of λ/4 optical thickness made of a material of lower refractive index than the refractive index of Ta₂O₅.
Claim 11
Dependent Claim
26 words
The optical element of claim 8, the λ/4 optical thickness of said at least two layers being λ/4 for light of 308nm or of 325nm wave-length.
Claim 12
Dependent Claim
20 words
The optical element of claim 8, said further layer being made of at least one of SiO₂ and of Al₂O₃.
Claim 13
Dependent Claim
25 words
The optical element of claim 8, said optical layer and said further layer forming a double layer, comprising at least two of said double layers.
Claim 14
Dependent Claim
25 words
The optical element of claim 11, comprising at least six double layers and having a reflection of at least 95% for light of 308nm wave-length.
Claim 15
Independent Claim
39 words
An apparatus comprising at least one XeCl excimer laser and at least one optical layer being predominantly of Ta₂O₅ and having an extinction coeffi cient less than 0.0075 for light of 308nm wave-length, co-operating with said XeCl excimer laser.
Claim 16
Independent Claim
39 words
An apparatus comprising at least one XeCl excimer laser and at least one optical layer being predominantly of Ta₂O₅ and having an extinction coeffi cient less than 0.0075 for light of 308nm wave-length, co-operating with said XeCl excimer laser.
Claim 17
Dependent Claim
24 words
The apparatus according to claim 13, said at least one layer being processed by ion-beam-sputtering of a target, said target being predominantly of Ta₂O₅.
Claim 18
Independent Claim
40 words
An apparatus comprising at least one HeCd- or N₂-gas laser and at least one optical layer being predominantly of Ta₂O₅ and having an extinction coefficient less than 0.0075 for light of 308nm wave-length, co-operating with said HeCd- or N₂-gas laser.
Claim 19
Independent Claim
40 words
An apparatus comprising at least one HeCd- or N₂-gas laser and at least one optical layer being predominantly of Ta₂O₅ and having an extinction coefficient less than 0.0075 for light of 308nm wave-length, co-operating with said HeCd- or N₂-gas laser.
Claim 20
Dependent Claim
24 words
The apparatus according to claim 15, said at least one layer being processed by ion-beam-sputtering of a target, said target being predominantly of Ta₂O₅.
Claim 21
Dependent Claim
40 words
A process for producing an optical layer being predominantly of Ta₂O₅ and having an extinction coefficient of less than 0.0075 for light of 308nm wave-length, said process comprising ion beam sputtering of a target, said target being predominantly of Ta₂O₅.
Claim 22
Dependent Claim
40 words
A process for producing an optical layer being predominantly of Ta₂O₅ and having an extinction coefficient of less than 0.0075 for light of 308nm wave-length, said process comprising ion beam sputtering of a target, said target being predominantly of Ta₂O₅.
References Cited (Backward Citations)
No citation records indexed.
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