EP0374876A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Bubble free liquid solder mask-coated printed circuit boards by fluid pressurizing
Assignee: EIDP Inc
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Filing: 1989-12-20
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Granted: —
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Expires: 2009-12-20
Abstract
Abstract A method is disclosed of obtaining a bubble free photosensitive liquid layer and an interface with a substrate by applying uniform fluid pressure after coating the liquid on the substrate.
Inventors
- 👤 Gary Karl Stout
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 22:41
CPC Classifications
B; B32; B32B; B32B37/00; B32B37/0007; G; G03; G03F; G03F7/00; G03F7/16; G03F7/161; H; H05; H05K; H05K3/00; H05K3/22; H05K3/28; B32B2457/00; B32B2457/08; H05K2203/00; H05K2203/07; H05K2203/0736; H05K2203/074; H05K2203/0756; H05K2203/0759; H05K3/0073; H05K3/0079
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
83 words
A method of obtaining a substantially bubble free photosensitive liquid layer on a substrate including an interface between the layer and substrate comprising the steps of (a) applying at least one photosensitive liquid layer to a surface of the substrate to form a coated substrate; (b) applying elevated pressure of at least 0.3 atmospheres above ambient uniformly to the coated substrate by a pressurized fluid whereby any bubbles entrapped in the liquid layer and interface are eliminated; and (c) releasing the elevated pressure.
Claim 2
Independent Claim
83 words
A method of obtaining a substantially bubble free photosensitive liquid layer on a substrate including an interface between the layer and substrate comprising the steps of (a) applying at least one photosensitive liquid layer to a surface of the substrate to form a coated substrate; (b) applying elevated pressure of at least 0.3 atmospheres above ambient uniformly to the coated substrate by a pressurized fluid whereby any bubbles entrapped in the liquid layer and interface are eliminated; and (c) releasing the elevated pressure.
Claim 3
Dependent Claim
16 words
The method of claim 1 where the elevated pressure is at least 3 atmospheres above ambient.
Claim 4
Dependent Claim
15 words
The method of claim 1 wherein a pressurized chamber is employed which surrounds the substrate.
Claim 5
Dependent Claim
12 words
The method of claim 1 wherein the substrate has a raised relief.
Claim 6
Dependent Claim
11 words
The method of claim 1 wherein the liquid layer is photopolymerizable.
Claim 7
Dependent Claim
14 words
The method of claim 1 wherein the liquid is imagewise exposed to actinic radiation.
Claim 8
Dependent Claim
11 words
The method of claim 1 wherein the fluid is a gas.
Claim 9
Dependent Claim
10 words
The method of claim 7 wherein the gas is air.
Claim 10
Dependent Claim
12 words
The method of claim 1 wherein the fluid is a pressurizing liquid.
Claim 11
Dependent Claim
11 words
The method of claim 9 wherein the pressurizing liquid is water.
Claim 12
Dependent Claim
14 words
The method of claim 1 wherein the pressurized fluid is applied at ambient temperature.
Claim 13
Dependent Claim
22 words
The method of claim 1 wherein the pressurized fluid is applied for a duration between about 1 minute and about 10 minutes.
Claim 14
Dependent Claim
20 words
The method of claim 1 wherein the pressurized fluid is applied for a duration of about 1 minute or less.
References Cited (Backward Citations)
No citation records indexed.
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