EP0365318A2
Expired / Lapsed
EP
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Radiation-sensitive resin composition
Assignee: JSR Corp
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Filing: 1989-10-18
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Granted: —
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Expires: 2009-10-18
Abstract
Abstract A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of: 95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′): wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I′) with at least one aldehyde] and 5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): wherein n is 0, 1, 2 or 3, with at least one aldehyde]. In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.
Inventors
- 👤 Satoshi Miyashita
- 👤 Akihiro Yamanouchi
- 👤 Ikuo Nozue
- 👤 Takao Miura
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 15:20
CPC Classifications
G; G03; G03C; G03C1/00; C; C08; C08G; C08G8/00; C08G8/04; C08G8/08; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
159 words
A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of: 95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′): wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I′) with at least one aldehyde] and 5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): wherein n is 0, 1, 2 or 3, with at least one aldehyde].
Claim 2
Dependent Claim
159 words
A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of: 95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′): wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I′) with at least one aldehyde] and 5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): wherein n is 0, 1, 2 or 3, with at least one aldehyde].
Claim 3
Dependent Claim
177 words
A radiation-sensitive resin composition comprising an alkali-soluble novlak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of: 50-95 parts by weight of Resin A having a standard, polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′): wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I′) with at least one aldehyde], 0-45 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): wherein n is 0, 1, 2 or 3, with at least one aldehyde], and 5-50 parts by weight of Resin C (Resin C is an ester of Resin B with 1,2-quinonediazidesulfonic acid).
Claim 4
Dependent Claim
177 words
A radiation-sensitive resin composition comprising an alkali-soluble novlak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of: 50-95 parts by weight of Resin A having a standard, polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′): wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I′) with at least one aldehyde], 0-45 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): wherein n is 0, 1, 2 or 3, with at least one aldehyde], and 5-50 parts by weight of Resin C (Resin C is an ester of Resin B with 1,2-quinonediazidesulfonic acid).
Claim 5
Dependent Claim
38 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the at least one phenol represented by the structural formula (I) or (I′) is selected from the group consisting of 2,3-xylenol, 2,5-xylenol, 3,4-xylenol, 3,5-xylenol, 2,3,5-trimethylphenol and 3,4,5-trimethylphenol.
Claim 6
Dependent Claim
42 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the at least one phenol represented by the structural formula (II) is selected from the group consisting of phenol, o-cresol, m-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol, 3,6-xylenol, 2,3,5-trimethylphenol and 3,4,5-trimethylphenol.
Claim 7
Dependent Claim
29 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the at least one aldehyde is selected from the group consisting of formaldehyde, paraformaldehyde, benzaldehyde, furfural and acetaldehyde.
Claim 8
Dependent Claim
22 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein Resin A has a standard polystyrene-reduced weight-average molecular weight of 5,000-15,000.
Claim 9
Dependent Claim
22 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein Resin B has a standard polystyrene-reduced weight-average molecular weight of 300-1,000.
Claim 10
Dependent Claim
32 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the molar ratio of m-cresol/the at least one phenol represented by the structural formula (I) or (I′) is 40/60 to 95/5.
Claim 11
Dependent Claim
38 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the molar ratio or m-cresol/p-cresol/the at least one phenol represented by the structural formula (I) or (I′) is 20-90/5-75/5-75 (the total of the three is 100 moles).
Claim 12
Dependent Claim
34 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein in Resin A, the amount of the at least one aldehyde used is 0.7-3 mole per mole of the at least one phenol.
Claim 13
Dependent Claim
34 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein in Resin B, the amount of the at least one aldehyde used is 0.1-1.5 moles per mole of the at least one phenol.
Claim 14
Dependent Claim
23 words
A radiation-sensitive resin composition according to Claim 2, wherein the 1,2-quinone diazidesulfonic acid is 1,2-benzoquinonediazide-4-sulfonic acid, 1,2-naphthoquinonediazide-4-sulfonic acid, 1,2-naphthoquinonediazide-4-sulfonic acid or 1,2-naphthoquinone-5-sulfonic acid.
Claim 15
Dependent Claim
35 words
A radiation-sensitive resin composition according to Claim 1 or 2, wherein the 1,2-quinonediazide compound is at least one compound selected from the group consisting of 1,2-benzoquinonediazide-4-sulfonic acid esters, 1,2-naphthoquinonediazide-4-sulfonic acid ester and 1,2-naphthoquinonediazide-5-sulfonic acid esters.
References Cited (Backward Citations)
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