EP0357423A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
An exposure apparatus
Assignee: Canon Inc
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Filing: 1989-08-31
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Granted: —
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Expires: 2009-08-31
Abstract
Abstract The mask(3) and the wafer (4) are closely disposed, and predetermined exposure energy is applied to the respective shot areas of the wafer(4) through the mask (3). The exposure energy is soft-X-ray source, for example. The pattern of the mask (3) is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus (fig 1), a temperature control medium liquid is supplied into the wafer chuck (5) for supporting the wafer (4) at the exposure position. The flow rate is different during the exposure operation than during the non-exposure-operation. The flow control (10) is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also to the heat generation in the wafer(4) by the exposure energy, so that the vibration of the wafer chuck (5) during the exposure operation is suppressed, and simultaneously, the temperature rise of the wafer (4) can be also suppressed. The pattern transfer from the mask (3) to the wafer (4) can be precisely performed.
Inventors
- 👤 Tetsuzo Mori
- 👤 Eiji Sakamoto
- 👤 Shinichi Hara
- 👤 Koji Uda
- 👤 Isamu Shimoda
- 👤 Shinichi Uzawa
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 18:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70858; G03F7/709; G03F7/70691; G03F7/707; G03F7/70716; G03F7/70866; G03F7/70875
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
85 words
An exposure apparatus, comprising: a chuck for supporting a member to be exposed; exposure means for exposing the member supported on said chuck to exposure energy; supplying means for supply a temperature controlling medium to said supporting chuck through a medium passage; flow control means in said passage; control means for controlling said flow control means to provide different flow rate of the medium supplied to said chuck between when the member being exposed to the exposure energy and when it is not exposed thereto.
Claim 2
Dependent Claim
85 words
An exposure apparatus, comprising: a chuck for supporting a member to be exposed; exposure means for exposing the member supported on said chuck to exposure energy; supplying means for supply a temperature controlling medium to said supporting chuck through a medium passage; flow control means in said passage; control means for controlling said flow control means to provide different flow rate of the medium supplied to said chuck between when the member being exposed to the exposure energy and when it is not exposed thereto.
Claim 3
Dependent Claim
23 words
An apparatus according to Claim 1, wherein the flow rate is lower when the member being exposed than when it is not exposed.
Claim 4
Dependent Claim
40 words
An apparatus according to Claim 1, wherein said control means is provided with a temperature detector for detecting a temperature of the chuck, and it controls said flow rate control means in accordance with an output of said temperature detector.
Claim 5
Dependent Claim
22 words
An apparatus according to Claim 1, wherein said control means changes the rate of flow when the member is not being exposed.
Claim 6
Dependent Claim
184 words
An exposure apparatus, comprising: a chuck for supporting a member to be exposed; exposure means for exposing to exposure energy respective ones of plural shot areas of the member supported on said chuck; a movable stage for moving said chuck for the sequential exposures of the plural shot areas; supply means for supplying a temperature control medium to said chuck through plural passages; flow rate control means in the respective passages; control means for controlling said flow rate control means so as to provide different flow rates of the medium to said chuck when the member being exposed to the exposure energy and when it is not exposed thereto, wherein said control means controls said flow rate control means such that a total flow of the medium to the chuck through all passages is smaller when the member is being exposed than when the member is not being exposed, and wherein when the member is being exposed, the flow rate or rates through the passage or passages for the shot area being exposed and adjacent thereto is higher than that through the other passages.
Claim 7
Dependent Claim
184 words
An exposure apparatus, comprising: a chuck for supporting a member to be exposed; exposure means for exposing to exposure energy respective ones of plural shot areas of the member supported on said chuck; a movable stage for moving said chuck for the sequential exposures of the plural shot areas; supply means for supplying a temperature control medium to said chuck through plural passages; flow rate control means in the respective passages; control means for controlling said flow rate control means so as to provide different flow rates of the medium to said chuck when the member being exposed to the exposure energy and when it is not exposed thereto, wherein said control means controls said flow rate control means such that a total flow of the medium to the chuck through all passages is smaller when the member is being exposed than when the member is not being exposed, and wherein when the member is being exposed, the flow rate or rates through the passage or passages for the shot area being exposed and adjacent thereto is higher than that through the other passages.
Claim 8
Dependent Claim
38 words
An apparatus according to Claim 5, wherein said control means includes a temperature detector for detecting a temperature of said chuck, and it controls said flow rate control means in accordance with an output of said detecting means.
Claim 9
Dependent Claim
22 words
An apparatus according to Claim 5, wherein said control means changes the rate of flow when the member is not being exposed.
Claim 10
Dependent Claim
51 words
An apparatus according to Claim 1 or 5, wherein the difference is so determined that a vibration of said chuck is smaller when the member is being exposed than when the member is not being exposed, and that the temperature rise of the chuck due to the exposure energy is suppressed.
References Cited (Backward Citations)
No citation records indexed.
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