EP0343695A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Sputtered films for metal alloy oxides
Assignee: PPG Industries Ohio Inc
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Filing: 1985-10-24
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Granted: —
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Expires: 2005-10-24
Abstract
Abstract A metal alloy oxide film and sputtering method for its production are disclosed, as well as a high transmittance, low emissivity coated product employing said metal alloy oxide film as an antireflective film in combination with a metallic film such as silver. A method for improving the adhesion between metal and metal oxide films and an improved multiple layer coated article comprising primer layers between metal and metal oxide films are also disclosed.
Inventors
- 👤 Frank Howard Gillery
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-29 07:01
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; G02B1/11; G02B1/113; G02B1/115; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3613; C03C17/3618; C03C17/3644; C03C17/3652; C03C17/3657; C03C17/366; C03C17/3681; C23C14/06; C23C14/08; C23C14/086; C23C14/14; C23C14/18; C23C14/185; G02B1/116; G02B5/00; G02B5/20; G02B5/208; C03C2217/00; C03C2217/70; C03C2217/78
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
83 words
A method for depositing a film comprising a metal alloy oxide on a substrate comprising the steps of (a) forming a cathode target comprising a metal alloy, (b) placing a substrate to be coated in an evacuated chamber with said cathode target and (c) sputtering said metal alloy cathode target in a reactive atmosphere comprising oxygen thereby depositing a metal alloy oxide film on a surface of said substrate characterized in that the cathode target is a metal alloy of zinc and tin.
Claim 2
Independent Claim
83 words
A method for depositing a film comprising a metal alloy oxide on a substrate comprising the steps of (a) forming a cathode target comprising a metal alloy, (b) placing a substrate to be coated in an evacuated chamber with said cathode target and (c) sputtering said metal alloy cathode target in a reactive atmosphere comprising oxygen thereby depositing a metal alloy oxide film on a surface of said substrate characterized in that the cathode target is a metal alloy of zinc and tin.
References Cited (Backward Citations)
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