EP0334381A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Coating film comprising a negative-working photosensitive composition and pattern-formation method
Assignee: Hitachi Ltd
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Filing: 1989-03-23
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Granted: —
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Expires: 2009-03-23
Abstract
Abstract A negative-working photosensitive composition comprising at least one aromatic azide compound and the balance of a polymer compound, the numerical value of product of the film thickness expressed in micron and the absorbance at 248 nm of a coating film of said photosensitive composition ranging from 0.5 to 1.5. Since said composition has a high sensitivity and a high resolution in the region of exposing wavelength, a fine pattern for practical purposes can be obtained by coating the composition on a substrate, then exposing the thus formed coating film to light to print a predetermined pattern, and developing the film.
Inventors
- 👤 Minoru Toriumi
- 👤 Nobuaki Hayashi
- 👤 Michiaki Hashimoto
- 👤 Takumi Ueno
- 👤 Takao Iwayanagi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 11:19
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
49 words
A negative-working photosensitive composition comprising at least one aromatic azide compound and the balance of a polymer compound, the numerical value of product of the film thickness expressed in micron and the absorbance at 248 nm of a coating film of said photosensitive composition ranging from 0.5 to 1.5.
Claim 2
Dependent Claim
49 words
A negative-working photosensitive composition comprising at least one aromatic azide compound and the balance of a polymer compound, the numerical value of product of the film thickness expressed in micron and the absorbance at 248 nm of a coating film of said photosensitive composition ranging from 0.5 to 1.5.
Claim 3
Dependent Claim
31 words
A negative-working photosensitive composition according to Claim 1, wherein said aromatic azide compound is at least one member selected from the group consisting of 4,4′-diazido-3,3′-dimethoxybiphenyl, 3,3′-diazidodiphenylsulfone, 1-(4-azidobenzylidene)-3-(α-hydroxy-4-azidobenzyl)indene, 4-nitro-2-methylphenylazide, 4-methoxy-4′-azidochalcone, and 3,4′-diazidodiphenylsulfone.
Claim 4
Dependent Claim
96 words
A pattern-formation method comprising a step of coating a photosensitive composition comprising at least aromatic azide compound and a polymer compound on a substrate to form a coating film, a step of exposing the coating film to light to print a predetermined pattern, and a step of forming the predetermined negative pattern by development, wherein the numerical value of product of the film thickness expressed in micron and the absorbance at a predetermined wavelength of said coating film is ranging from 0.5 to 1.5, and the exposure is carried out by light having the above wavelength.
Claim 5
Dependent Claim
96 words
A pattern-formation method comprising a step of coating a photosensitive composition comprising at least aromatic azide compound and a polymer compound on a substrate to form a coating film, a step of exposing the coating film to light to print a predetermined pattern, and a step of forming the predetermined negative pattern by development, wherein the numerical value of product of the film thickness expressed in micron and the absorbance at a predetermined wavelength of said coating film is ranging from 0.5 to 1.5, and the exposure is carried out by light having the above wavelength.
Claim 6
Dependent Claim
30 words
A pattern-formation method according to Claim 3, wherein said aromatic azide compound is at least one member selected from the group consisting of 4,4′-diazido-3,3′-dimethoxybiphenyl, 3,3′-diazidodiphenylsulfone, 1-(4-azidobenzylidene)-3-(α-hydroxy-4-azidobenzyl)indene, 4-nitro-2-methylphenylazide, 4-methoxy-4′-azidochalcone, and 3,4′-diazidodiphenylsulfone.
Claim 7
Dependent Claim
14 words
A pattern-formation method according to Claim 3, wherein said predetermined wavelength is 248 nm.
References Cited (Backward Citations)
No citation records indexed.
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