Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
103 words
A process for forming a ceramic coating on a substrate which process comprises: (A) applying to the substrate a flowable solution of a mixture comprising hydrogen silsesquioxane resin and a metal oxide precursor selected from the group consisting of acyloxy and alkoxy compounds of aluminum, titanium and zirconium wherein the proportion by weight of metal oxide precursor as metal oxide is about 0.1 to about 30 percent; (B) drying the resin solution to deposit a preceramic coating on the substrate; and (C) heating the coated substrate in a substantially ammonia atmosphere to a temperature sufficient to produce a ceramic coating on the substrate.
Claim 2
Dependent Claim
103 words
A process for forming a ceramic coating on a substrate which process comprises: (A) applying to the substrate a flowable solution of a mixture comprising hydrogen silsesquioxane resin and a metal oxide precursor selected from the group consisting of acyloxy and alkoxy compounds of aluminum, titanium and zirconium wherein the proportion by weight of metal oxide precursor as metal oxide is about 0.1 to about 30 percent; (B) drying the resin solution to deposit a preceramic coating on the substrate; and (C) heating the coated substrate in a substantially ammonia atmosphere to a temperature sufficient to produce a ceramic coating on the substrate.
Claim 3
Dependent Claim
83 words
A process as claimed in claim 1 further comprising: (D) applying to the ceramic coating a passivating coating selected from the group consisting of (i) a silicon coating, (ii) a silicon carbon coating, (iii) a silicon-nitrogen coating, and (iv) a silicon-carbon-nitrogen coating, wherein the passivating coating is applied by a means selected from the group consisting of (a) chemical vapor deposition, (b) plasma enhanced chemical vapor deposition, and (c) application of a preceramic polymer coating and subsequent ceramification of the preceramic polymer coating.
Claim 4
Dependent Claim
68 words
A process as claimed in claim 2 further comprising: (E) applying to the passivating coating a barrier coating selected from the group consisting of (i) a silicon coating, (ii) a silicon carbon coating, (iii) a silicon-nitrogen coating, and (iv) a silicon-carbon-nitrogen coating, wherein the barrier coating is applied by a means selected from the group consisting of (a) chemical vapor deposition and (b) plasma enhanced chemical vapor deposition.
Claim 5
Dependent Claim
9 words
A substrate coated by the process of claim 1.
Claim 6
Dependent Claim
9 words
A substrate coated by the process of claim 2.
Claim 7
Dependent Claim
9 words
A substrate coated by the process of claim 3.
Claim 8
Dependent Claim
14 words
A process as claimed in claim 1 wherein the substrate is an electronic device.
Claim 9
Dependent Claim
10 words
An electronic device coated by the process of claim 1.
Claim 10
Dependent Claim
10 words
An electronic device coated by the process of claim 2.
Claim 11
Dependent Claim
10 words
An electronic device coated by the process of claim 3.
Claim 12
Dependent Claim
18 words
A coated substrate as claimed in claim 2 wherein the coating is used as an interlevel dielectric layer.