EP0319325A2
Expired / Lapsed
EP
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Photosensitive material and process for forming pattern using the same
Assignee: Fujifilm Wako Pure Chemical Corp
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Filing: 1988-12-02
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Granted: —
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Expires: 2008-12-02
Abstract
Abstract A photosensitive composition comprising a resin such as an alkali-soluble resin and a photosensitive compound such as a novel 3-diazo-2,4-dione derivative, a novel Meldrum's acid derivative, or the like is effective for forming a fine pattern using deep UV light of less than about 300 nm.
Inventors
- 👤 Kazufumi Ogawa
- 👤 Keiji Ohno
- 👤 Masayuki Endo
- 👤 Mamoru Kosumotopia 201 Nagoya
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 20:17
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; C; C07; C07D; C07D295/00; C07D295/22; C07D295/26; C07C; C07C245/00; C07C245/12; C07C245/14; C07C309/00; C07C309/78; C07C309/86; C07C309/88; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163; G03F7/04
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
232 words
A photosensitive composition comprising a resin and a photosensitive compound of the formula: X¹ and Y¹ are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁵ or a functional group reactive with the resin; R³ and R⁴ are independently a hydrogen atom or an alkyl group which may contain one or more functional groups, or R³, R⁴ and N taken together may form a heterocyclic ring; R⁵ is an alkyl group; m is an integer of 1 or more; R² is an alkyl group, a cycloalkyl group, a hydroxyalkyl group, an alkoxyalkyl group, X² and Y² are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁸ or a functional group reactive with the resin; R⁶ and R⁷ are independently a hydrogen atom or an alkyl group which may contain one or more functional groups, or R⁶, R⁷ and N taken together may form a heterocyclic ring; R⁸ is an alkyl group; n is an integer of 1 or more; or R¹ and R² taken together may form a group of the formula: R⁹ is an alkyl group, an aralkyl group, a hydroxyalkyl group, or an alkoxyalkyl group; X³ and Y³ are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁵, or a functional group reactive with the resin; and p is an integer of 1 or more.
Claim 2
Dependent Claim
232 words
A photosensitive composition comprising a resin and a photosensitive compound of the formula: X¹ and Y¹ are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁵ or a functional group reactive with the resin; R³ and R⁴ are independently a hydrogen atom or an alkyl group which may contain one or more functional groups, or R³, R⁴ and N taken together may form a heterocyclic ring; R⁵ is an alkyl group; m is an integer of 1 or more; R² is an alkyl group, a cycloalkyl group, a hydroxyalkyl group, an alkoxyalkyl group, X² and Y² are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁸ or a functional group reactive with the resin; R⁶ and R⁷ are independently a hydrogen atom or an alkyl group which may contain one or more functional groups, or R⁶, R⁷ and N taken together may form a heterocyclic ring; R⁸ is an alkyl group; n is an integer of 1 or more; or R¹ and R² taken together may form a group of the formula: R⁹ is an alkyl group, an aralkyl group, a hydroxyalkyl group, or an alkoxyalkyl group; X³ and Y³ are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, ―SO₃R⁵, or a functional group reactive with the resin; and p is an integer of 1 or more.
Claim 3
Dependent Claim
32 words
A photosensitive composition according to Claim 1, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 1.
Claim 4
Dependent Claim
32 words
A photosensitive composition according to Claim 1, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 1.
Claim 5
Dependent Claim
45 words
A photosensitive composition according to Claim 1, wherein the photosensitive compound is a compound represented by the formula: wherein R¹⁰ is an alkyl group, a cycloalkyl group, a hydroxyalkyl group, or an alkoxyalkyl group; and X¹, Y¹ and m are as defined in Claim 1.
Claim 6
Dependent Claim
30 words
A photosensitive composition according to Claim 1, wherein the photosensitive compound is a compound represented by the formula: wherein R⁹, X³, Y³ and p are as defined in Claim 1.
Claim 7
Dependent Claim
67 words
A process for forming a fine pattern which comprises forming a film of a photosensitive composition comprising a resin and a photosensitive compound of the formula: wherein R¹ and R² are as defined in Claim 1, on a substrate, exposing the film to deep UV light of less than about 300 nm, and subjecting to development to form a pattern by removing exposed portions of the film.
Claim 8
Dependent Claim
31 words
A process according to Claim 6, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 6.
Claim 9
Dependent Claim
31 words
A process according to Claim 6, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 6.
Claim 10
Dependent Claim
44 words
A process according to Claim 6, wherein the photosensitive compound is a compound represented by the formula: wherein R¹⁰ is an alkyl group, a cycloalkyl group, a hydroxyalkyl group, or an alkoxyalkyl group; and X¹, Y¹ and m are as defined in Claim 6.
Claim 11
Dependent Claim
29 words
A process according to Claim 6, wherein the photosensitive compound is a compound represented by the formula: wherein R⁹, X³, Y³ and p are as defined in Claim 6.
Claim 12
Dependent Claim
90 words
A process for forming a fine pattern which comprises forming a photoresist layer on a substrate, forming a contrast enhancing material layer comprising a resin and a photosensitive compound of the formula: wherein R¹ and R² are as defined in Claim 1, on the photoresist layer, exposing the contrast enhancing material layer to deep UV light of less than about 300 nm, removing the contrast enhancing material layer, and at the same time, developing the photoresist layer to form a fine pattern by removing exposed portions of the phtoresist layer.
Claim 13
Dependent Claim
37 words
A process according to Claim 11, wherein a water-soluble organic film is formed between the photoresist layer and the contrast enhancing material layer, and said water-soluble organic film is removed simultaneously with the contrast enhancing material layer.
Claim 14
Dependent Claim
31 words
A process according to Claim 11, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 11.
Claim 15
Dependent Claim
31 words
A process according to Claim 11, wherein the photosensitive compound is a compound represented by the formula: wherein X¹, Y¹, X², Y², m and n are as defined in Claim 11.
Claim 16
Dependent Claim
44 words
A process according to Claim 11, wherein the photosensitive compound is a compound represented by the formula: wherein R¹⁰ is an alkyl group, a cycloalkyl group, a hydroxyalkyl group, or an alkoxyalkyl group; and X¹, Y¹ and m are as defined in Claim 11.
Claim 17
Dependent Claim
29 words
A process according to Claim 11, wherein the photosensitive compound is a compound represented by the formula: wherein R⁹, X³, Y³ and p are as defined in Claim 11.
References Cited (Backward Citations)
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