EP0311439A2
Expired / Lapsed
EP
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Ozone gas sensor and ozone gas detecting device having ozone gas sensor
Assignee: New Cosmos Electric Co Ltd
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Filing: 1988-10-07
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Granted: —
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Expires: 2008-10-07
Abstract
Abstract An ozone gas sensor comprising a film type semiconductor element including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate, and a layer of silica (21) formed on a surface of the film type semiconductor element. At least one thin film layer of one or a plurality of types selected from metals and metal oxides is interposed between the semiconductor film and the layer of silica.
Inventors
- 👤 Tadashi Takada
- 👤 Riichiro Kasahara
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 15:23
CPC Classifications
G; G01; G01N; G01N33/00; G01N33/0004; G01N33/0009; G01N33/0027; G01N33/0036; G01N33/0039; G01N27/00; G01N27/02; G01N27/04; G01N27/12; Y; Y02; Y02A; Y02A50/00; Y02A50/20
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
81 words
An ozone gas sensor (7) comprising a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), and a layer of silica (29) formed on a surface of the film type semiconductor element (18), wherein at least one thin film layer of one or a plurality of types selected from metals and metal oxides is interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 2
Dependent Claim
81 words
An ozone gas sensor (7) comprising a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), and a layer of silica (29) formed on a surface of the film type semiconductor element (18), wherein at least one thin film layer of one or a plurality of types selected from metals and metal oxides is interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 3
Dependent Claim
22 words
An ozone gas sensor as claimed in Claim 1, wherein the metal forming said thin film layer (21) comprises a transition metal.
Claim 4
Dependent Claim
22 words
An ozone gas sensor as claimed in Claim 1 or 2, wherein said semiconductor film (18b) comprises at least indium oxide (In₂O₃).
Claim 5
Dependent Claim
117 words
An ozone gas detecting device comprising a sensor probe (1) for contacting a gas to be detected and including an ozone gas sensor (7) therein, and an indicator (24) for indicating concentration of the gas detected, wherein said ozone gas sensor (7) comprises a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), a layer of silica (29) formed on a surface of the film type semiconductor element (18), and at least one thin film layer of one or a plurality of types selected from metals and metal oxides and interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 6
Dependent Claim
117 words
An ozone gas detecting device comprising a sensor probe (1) for contacting a gas to be detected and including an ozone gas sensor (7) therein, and an indicator (24) for indicating concentration of the gas detected, wherein said ozone gas sensor (7) comprises a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), a layer of silica (29) formed on a surface of the film type semiconductor element (18), and at least one thin film layer of one or a plurality of types selected from metals and metal oxides and interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 7
Dependent Claim
23 words
An ozone gas detecting device as claimed in Claim 4, wherein the metal forming said thin film layer (21) comprises a transition metal.
Claim 8
Dependent Claim
23 words
An ozone gas detecting device as claimed in Claim 4 or 5, wherein said semiconductor film (18b) comprises at least indium oxide (In₂O₃).
Claim 9
Dependent Claim
210 words
An ozone gas detecting device comprising an ozone gas sensor (5) mounted on a gas intake passage (R) connected to a suction pump (3) for detecting ozone gas concentration in a gas being measured, a catalyzer (6) mounted between said ozone gas sensor (5) and said suction pump (3) for reducing ozone gas to oxygen gas, an ozone gas removal confirming gas sensor (7′) mounted on said gas intake passage (R) downstream of said catalyzer (6), and automatic control means (9) for automatically stopping a gas drawing operation of said suction pump (3) only when said ozone gas removal confirming sensor (7′) gives a detection result that ozone gas remains in the gas having passed through said catalyzer (6) in an amount exceeding a predetermined level, wherein said ozone gas removal confirming gas sensor (7′) comprises a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), a layer of silica (29) formed on a surface of the film type semiconductor element (18), and at least one thin film layer of one or a plurality of types selected from metals and metal oxides and interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 10
Dependent Claim
210 words
An ozone gas detecting device comprising an ozone gas sensor (5) mounted on a gas intake passage (R) connected to a suction pump (3) for detecting ozone gas concentration in a gas being measured, a catalyzer (6) mounted between said ozone gas sensor (5) and said suction pump (3) for reducing ozone gas to oxygen gas, an ozone gas removal confirming gas sensor (7′) mounted on said gas intake passage (R) downstream of said catalyzer (6), and automatic control means (9) for automatically stopping a gas drawing operation of said suction pump (3) only when said ozone gas removal confirming sensor (7′) gives a detection result that ozone gas remains in the gas having passed through said catalyzer (6) in an amount exceeding a predetermined level, wherein said ozone gas removal confirming gas sensor (7′) comprises a film type semiconductor element (18) including a substrate (18a) and a semiconductor film (18b) consisting of a metallic oxide formed on the substrate (18a), a layer of silica (29) formed on a surface of the film type semiconductor element (18), and at least one thin film layer of one or a plurality of types selected from metals and metal oxides and interposed between said semiconductor film (18b) and said layer of silica (29).
Claim 11
Dependent Claim
23 words
An ozone gas detecting device as claimed in Claim 7, wherein the metal forming said thin film layer (21) comprises a transition metal.
Claim 12
Dependent Claim
23 words
An ozone gas detecting device as claimed in Claim 7 or 8, wherein said semiconductor film (18b) comprises at least indium oxide (In₂O₃).
References Cited (Backward Citations)
No citation records indexed.
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