EP0309294A2
Expired / Lapsed
EP
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Method and apparatus for the manufacture of superconducting oxide materials
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1988-09-26
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Granted: —
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Expires: 2008-09-26
Abstract
Abstract A sputtering apparatus for producing a thin film of a superconducting oxide material comprises a pair of sputter targets of compacted superconducting material which are mutually separated and opposed to each other so as to define a region wherein a substrate which is required to be coated with sputtered material may be located, and means for subjecting such substrate to the action of a magnetic field oriented perpendicular to or parallel with the substrate surface whereby crystal orientation is caused to occur during the growth of the film.
Inventors
- 👤 Shunpei Yamazaki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 12:26
CPC Classifications
H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0408; C; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/087; C23C14/22; C23C14/34; C23C14/35; C23C14/351; Y; Y10; Y10S; Y10S505/00; Y10S505/725; Y10S505/727; Y10S505/73; Y10S505/731
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
82 words
An apparatus for manufacturing a superconducting oxide material by sputtering, said apparatus comprising: first and second spaced-apart sputtering targets provided in a sputtering chamber in mutual opposition; means for supporting an object having a film-forming surface portion on which a superconducting oxide material is required to be formed; and means for creating a magnetic field between the two targets; and wherein the film-forming surface portion is positioned in the magnetic field so as to expedite the formation of a superconducting oxide material.
Claim 2
Independent Claim
82 words
An apparatus for manufacturing a superconducting oxide material by sputtering, said apparatus comprising: first and second spaced-apart sputtering targets provided in a sputtering chamber in mutual opposition; means for supporting an object having a film-forming surface portion on which a superconducting oxide material is required to be formed; and means for creating a magnetic field between the two targets; and wherein the film-forming surface portion is positioned in the magnetic field so as to expedite the formation of a superconducting oxide material.
Claim 3
Dependent Claim
26 words
The apparatus of Claim 1, wherein the superconducting oxide material is oriented on the film-forming surface portion in accordance with the direction of the magnetic field.
Claim 4
Dependent Claim
51 words
The apparatus of Claim 1 or 2, wherein means are provided for defining a closed magnetic circuit in a region outside of the space between the two targets, so that a plasma developed between the two sputtering targets may be concentrated by the magnetic field to form a high density plasma.
Claim 5
Independent Claim
105 words
The apparatus of any preceding Claim, wherein the superconducting oxide material is generally represented by the expression (A 1-x B x ) y Cu z O w , where x = 0.1 to 1, y = 2.0 to 4.0, z = 1.0 to 4.0, and w = 4.0 to 10.0, A is at least one member selected from the group comprising Y (yttrium), Gd (gadolinium), Yb (ytterbium), Eu (europium), Tb (terbium), Dy (dysprosium), Ho (holmium), Er (erbium), Tm (thulium), Lu (lutetium), Sc (scandium) and other lanthanides, and B is at least one member selected from the group of Ba (barium), Sr (strontium) and Ca (calcium).
Claim 6
Independent Claim
89 words
A method of manufacturing a superconducting oxide material, said method comprising: providing a target having a surface portion on which a superconducting oxide material is to be formed; creating a magnetic field in the region of the target so that the said surface portion thereof is subjected to the action of the magnetic field; and sputtering superconducting oxide material on to the said surface portion so that a film of the superconducting oxide material is formed on said surface portion with a crystalline orientation determined by said magnetic field.
Claim 7
Independent Claim
89 words
A method of manufacturing a superconducting oxide material, said method comprising: providing a target having a surface portion on which a superconducting oxide material is to be formed; creating a magnetic field in the region of the target so that the said surface portion thereof is subjected to the action of the magnetic field; and sputtering superconducting oxide material on to the said surface portion so that a film of the superconducting oxide material is formed on said surface portion with a crystalline orientation determined by said magnetic field.
Claim 8
Dependent Claim
37 words
The method of claim 5, wherein the said surface portion is oriented parallel to the magnetic field, whereby the superconducting oxide material that is formed on the target has its c axis parallel to said surface portion.
Claim 9
Dependent Claim
37 words
The method of claim 5, wherein the said surface portion is oriented perpendicular to the magnetic field, whereby the superconducting oxide material that is formed on the target has its c axis perpendicular to said surface portion.
Claim 10
Independent Claim
107 words
The method of any of Claims 5 to 7 wherein the superconducting material is generally represented by the expression (A 1-x B x ) y Cu z O w , where x = 0.1 to 1, y = 2.0 to 4.0, z = 1.0 to 4.0, and w = 4.0 to 10.0, A is at least one member selected from the group comprising Y (yttrium), Gd (gadolinium), Yb (ytterbium), Eu (europium), Tb (terbium), Dy (dysprosium), Ho (holmium), Er (erbium), Tm (thulium), Lu (lutetium), Sc (scandium), and other lanthanides, and B is at least one member selected from the group comprising Ba (barium), Sr (strontium) and Ca (calcium).
Claim 11
Independent Claim
46 words
An apparatus for the formation of a film of superconducting material by sputtering and wherein the deposition of the sputtered material upon a substrate surface is effected under the action of a magnetic field so as to provide the deposited material with a preferential magnetic orientation.
Claim 12
Independent Claim
46 words
An apparatus for the formation of a film of superconducting material by sputtering and wherein the deposition of the sputtered material upon a substrate surface is effected under the action of a magnetic field so as to provide the deposited material with a preferential magnetic orientation.
Claim 13
Independent Claim
29 words
A method of depositing a film of superconducting material by sputtering, said method including the utilization of a magnetic field to obtain a preferential orientation of the deposited material.
Claim 14
Independent Claim
29 words
A method of depositing a film of superconducting material by sputtering, said method including the utilization of a magnetic field to obtain a preferential orientation of the deposited material.
References Cited (Backward Citations)
No citation records indexed.
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