Process for depositing layers on substrates

Abstract

Abstract In order to obtain coatings of greater density and compactness than were possible until now when coating substrates with magnetic field-supported cathode sputtering, a given fraction of metal vapor obtained by vaporization of an electric arc discharge from the anode or cathode is deposited on the functional areas of the substrates together with the sputtered material and, specifically, at least 5 atom percent of the total metal fraction of the coating to be deposited averaged over time is applied by vaporization of an electric arc discharge. A suitable vacuum coating installation for carrying out the method has within a vacuum chamber, a device for vaporizing a part of the coating-forming material with an electric arc discharge and an additional device for magnetic field-supported sputtering of another part of the coating-forming material.

Inventors

• 👤 Erich Dr. Bergmann

Bibliographic Details