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EP0301571A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Thin film transistor array

Assignee: Sharp Corp
•
Filing: 1988-07-29
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Granted: —
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Expires: 2008-07-29
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Abstract

Abstract A thin film transistor array which comprises an insulating substrate (1); gate electrodes (2) formed on one surface of the substrate; a first insulating layer (6) made of anodical­ly oxidized film and formed on the substrate so as to overlay each of the gate electrodes; a second insulating layer (7) and a semiconductor layer (8) positioned one above the other and formed so as to overlay the first insulating layer (6) with the second insulating layer (7) intervening between the semiconductor layer (8) and the first insulating layer (6); and source (11) and drain (13) electrodes formed on the semiconductor layer (8). Each of the gate electrode (2) is of a double-layered structure including a first metal layer (4) made of metal having a high electroconductivity and a second metal layer (5) made of metal having a high property of being anodically oxidized.

Inventors

  • 👤 Hirohisa Tanaka

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-03 05:02
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/67; H10D30/6729; H10D30/6737; H10D30/6739

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 129 words
A thin film transistor array which comprises an insulating substrate; gate electrodes formed on one surface of the substrate; a first insulating layer made of anodical­ly oxidized film and formed on the substrate so as to overlay each of the gate electrodes; a second insulating layer and a semiconductor layer positioned one above the other and formed so as to overlay the first insulating layer with the second insulating layer intervening between the semiconductor layer and the first insulating layer; and source and drain electrodes formed on the semiconductor layer, wherein each of said gate electrode is of a double­layered structure including a first metal layer made of metal having a high electroconductivity and a second metal layer made of metal having a high property of being anodi­cally oxidized.
Claim 2
Dependent Claim 129 words
A thin film transistor array which comprises an insulating substrate; gate electrodes formed on one surface of the substrate; a first insulating layer made of anodical­ly oxidized film and formed on the substrate so as to overlay each of the gate electrodes; a second insulating layer and a semiconductor layer positioned one above the other and formed so as to overlay the first insulating layer with the second insulating layer intervening between the semiconductor layer and the first insulating layer; and source and drain electrodes formed on the semiconductor layer, wherein each of said gate electrode is of a double­layered structure including a first metal layer made of metal having a high electroconductivity and a second metal layer made of metal having a high property of being anodi­cally oxidized.

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