Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
112 words
A II-VI group compound crystal article comprising a substrate having a non-nucleation surface with smaller nucleation density (S NDS ) and a nucleation surface (S NDL ) which is arranged adjacent to said non-nucleation surface (S NDS ), has a sufficiently small area for a crystal to grow only from a single nucleus and a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and is comprised of an amorphous material, and a II-VI group compound monocrystal grown from said single nucleus on said substrate and spread on said non-nucleation surface (S NDS ) beyond said nucleation surface (S NDL ).
Claim 2
Dependent Claim
112 words
A II-VI group compound crystal article comprising a substrate having a non-nucleation surface with smaller nucleation density (S NDS ) and a nucleation surface (S NDL ) which is arranged adjacent to said non-nucleation surface (S NDS ), has a sufficiently small area for a crystal to grow only from a single nucleus and a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and is comprised of an amorphous material, and a II-VI group compound monocrystal grown from said single nucleus on said substrate and spread on said non-nucleation surface (S NDS ) beyond said nucleation surface (S NDL ).
Claim 3
Dependent Claim
23 words
A II-VI group compound crystal article according to claim 1, wherein said nucleation surface (S NDL ) is arranged in a plural number.
Claim 4
Dependent Claim
25 words
A II-VI group compound crystal article according to claim 1, wherein said nucleation surface (S NDL ) is arranged in a plural number as sectionalized.
Claim 5
Dependent Claim
33 words
A II-VI group compound crystal article according to claim 1, wherein said nucleation surface (S NDL ) is arranged in a plural number as sectionalized regularly within the non-nucleation surface (S NDS ).
Claim 6
Dependent Claim
33 words
A II-VI group compound crystal article according to claim 1, wherein said nucleation surface (S NDL ) is arranged in a plural number as sectionalized irregularly within the non-nucleation surface (S NDS ).
Claim 7
Dependent Claim
36 words
A II-VI group compound crystal article according to claim 2, wherein the monocrystals grown respectively from said nucleation surfaces (S NDL ) are adjacent to the monocrystals grown from the adjoining nucleation surfaces (S NDL ).
Claim 8
Dependent Claim
37 words
A II-VI group compound crystal article according to claim 2, wherein the monocrystals grown respectively from said nucleation surfaces (S NDL ) are spatially apart from the monocrystals grown from the adjoining nucleation surfaces (S NDL ).
Claim 9
Dependent Claim
45 words
A II-VI group compound crystal article according to claim 1, wherein said nucleation surface (S NDL ) is formed on the bottom surface of a recess provided in said non-nucleation surface (S NDS ), and said monocrystal is formed so as to fill said recess
Claim 10
Dependent Claim
21 words
A II-VI group compound crystal article according to claim 1, wherein said non-nucleation surface (S NDL ) comprises an amorphous material.
Claim 11
Dependent Claim
16 words
A II-VI group compound crystal article accrding to claim 9, wherein said amorphous material is SiO₂.
Claim 12
Dependent Claim
24 words
A II-VI group compound crystal article according to claim 1, wherein said II-VI group compound semiconductor is a binary system II-VI group compound semiconductor.
Claim 13
Dependent Claim
24 words
A II-VI group compound crystal article according to claim 1, wherein said II-VI group compound semiconductor is a mixed crystal II-VI group compound semiconductor.
Claim 14
Dependent Claim
117 words
A process for forming a II-VI group compound crystal, which comprises applying, in a gas phase including a starting material for supplying Group II atoms and a starting material for supplying Group VI atoms, crystal forming treatment on a substrate having a free surface comprising a non-nucleation surface (S NDS ) with smaller nucleation density and a nucleation surface (SNDL) arranged adjacent thereto having a sufficiently small area for a crystal to grow only from a single nucleus and a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and comprised of an amorphous material, thereby growing a II-VI group compound monocrystal from said single nucleus.
Claim 15
Dependent Claim
117 words
A process for forming a II-VI group compound crystal, which comprises applying, in a gas phase including a starting material for supplying Group II atoms and a starting material for supplying Group VI atoms, crystal forming treatment on a substrate having a free surface comprising a non-nucleation surface (S NDS ) with smaller nucleation density and a nucleation surface (SNDL) arranged adjacent thereto having a sufficiently small area for a crystal to grow only from a single nucleus and a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and comprised of an amorphous material, thereby growing a II-VI group compound monocrystal from said single nucleus.
Claim 16
Dependent Claim
139 words
A process for forming a II-VI group compound crystal, which comprises forming with an amorphous material, in a gas phase including a starting material for supplying Group II atoms and a starting material for supplying Group VI atoms, on a substrate having a non-nucleation surface (S NDS ) with smaller nucleation density at a desired position of said non-nucleation surface (S NDS ) , a nucleation surface (S NDL ) having a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and a sufficiently small area for a crystal to grow only from a single nucleus and then applying crystal forming treatment on said substrate to form a single nucleus on said nucleation surface (S NDL ) to grow a II-VI group compound monocrystal from said single nucleus.
Claim 17
Dependent Claim
139 words
A process for forming a II-VI group compound crystal, which comprises forming with an amorphous material, in a gas phase including a starting material for supplying Group II atoms and a starting material for supplying Group VI atoms, on a substrate having a non-nucleation surface (S NDS ) with smaller nucleation density at a desired position of said non-nucleation surface (S NDS ) , a nucleation surface (S NDL ) having a larger nucleation density (ND L ) than the nucleation density (ND S ) of said non-nucleation surface (S NDS ) and a sufficiently small area for a crystal to grow only from a single nucleus and then applying crystal forming treatment on said substrate to form a single nucleus on said nucleation surface (S NDL ) to grow a II-VI group compound monocrystal from said single nucleus.
Claim 18
Dependent Claim
30 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed internally of said non-nucleation surface (S NDS ).
Claim 19
Dependent Claim
32 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed on the face of said non-nucleation surface (S NDS ).
Claim 20
Dependent Claim
28 words
A process for forming a II-VI group compound crystal according to claim 15, wherein said nucleation surface (S NDL ) is formed in a plural number as sectionalized.
Claim 21
Dependent Claim
29 words
A process for forming a II-VI group compound crystal according to claim 15, wherein said nucleation surface (S NDL ) is formed in a plural number as sectionalized regularly.
Claim 22
Dependent Claim
29 words
A process for forming a II-VI group compound crystal according to claim 15, wherein said nucleation surface (S NDL ) is formed in a plural number as sectionalized irregularly.
Claim 23
Dependent Claim
27 words
A process for forming a II-VI group compound crystal according to claim 15, wherein said nucleation surface (S NDL ) is formed in shape of a lattice.
Claim 24
Dependent Claim
40 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed in a plural number as sectionalized, and monocrystals are formed from said nucleation surfaces (S NDL ), respectively.
Claim 25
Dependent Claim
46 words
A process for forming a II-VI group compound crystal according to claim 21, wherein the monocrystals grown from the above respective nucleation surfaces (S NDL ) are grown in the directions of the respective nucleation surfaces (S NDL ) beyond said nucleation surfaces (S NDL ).
Claim 26
Dependent Claim
40 words
A process for forming a II-VI group compound crystal according to claim 21, wherein the monocrystals grown from the respective nucleation surfaces (S NDL ) are grown to the sizes to be adjacent to adjoining nucleation surfaces (S NDL ).
Claim 27
Dependent Claim
39 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed of a material which is modified from the material for forming said non-nucleation surface (S NDS ).
Claim 28
Dependent Claim
27 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed by the ion implantation method.
Claim 29
Dependent Claim
54 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said nucleation surface (S NDL ) is formed by depositing a material having sufficiently larger nucleation density than the material for forming said non-nucleation surface (S NDS ) on said non-nucleation surface (S NDS ), followed by sufficiently fine patterning.
Claim 30
Dependent Claim
76 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said non-nucleation surface (S NDS ) is formed so as to cover over the surface comprising the material constituting said nucleation surface (S NDL ) and the desired portion of said non-nucleation surface (S NDS ), is removed thereby having exposed a nucleation surface (S NDL ) with a suficiently small area for a crystal to grow only from a single nucleus.
Claim 31
Dependent Claim
22 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said substrate is constituted of an amorphous material.
Claim 32
Dependent Claim
19 words
A process for forming a II-VI group compound crystal according to claim 28, wherein said amorphous material is SiO₂.
Claim 33
Dependent Claim
25 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said II-VI group compound is a binary system II-VI group compound.
Claim 34
Dependent Claim
25 words
A process for forming a II-VI group compound crystal according to claim 14, wherein said II-VI group compound is a mixed crystal II-VI group compound.
Claim 35
Dependent Claim
22 words
A process for forming a II-VI group compound crystal according to claim 30, wherein said crystal forming treatment is the MOCVD method.
Claim 36
Dependent Claim
35 words
A process for forming a II-VI group compound crystal according to claim 14, wherein the group II element of the II-VI group compound is replaced by the group I element and the group III element.