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EP0282075A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Thin film single crystal substrate

Assignee: Sumitomo Electric Industries Ltd
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Filing: 1988-03-11
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Granted: —
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Expires: 2008-03-11
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Abstract

Abstract A thin film single crystal substrate useful in the production of a semiconductor, comprising a base substrate made of single crystal diamond and at least one thin film of a single crystal of a material selected from the group con­sisting of silicon carbide, silicon, boron nitride, gallium nitride, indium nitride, aluminum nitride, boron phosphide, cadmium selenide, germanium, gallium arsenide, gallium phos­phide, indium phosphide, gallium antimonide, indium arse­nide, indium antimonide, aluminum phosphide, aluminum arse­nide, aluminum antimonide, cadmium telluride, mercury sul­fide, zinc oxide, zinc sulfide, zinc selenide and zinc telluride, and optionally an intermediate layer between the base substrate and the thin film of single crystal, which optionally comprises an intermediate layer between the base substrate and the thin film of single crystal.

Inventors

  • 👤 Takahiro C/O Itami Works Imai
  • 👤 Naoji C/O Itami Works Fujimori
  • 👤 Hideaki C/O Itami Works Nakahata

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-29 16:38
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2903; H10P14/24; H10P14/32; H10P14/3202; H10P14/3204; H10P14/3206; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3408; H10P14/3411; H10P14/3438; H10P14/3441; H10P14/3442; H10P14/3444; Y; Y10; Y10S; Y10S438/00; Y10S438/931

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 82 words
A thin film single crystal substrate which comprises a base substrate made of single crystal diamond and at least one thin film of a single crystal of a material selected from the group consisting of silicon carbide, sili­con, boron nitride, gallium nitride, indium nitride, alumi­num nitride, boron phosphide, cadmium selenide, germanium, gallium arsenide, gallium phosphide, indium phosphide, gallium antimonide, indium arsenide, indium antimonide, aluminum phosphide, aluminum arsenide, aluminum antimonide, cadmium telluride, mercury sulfide, zinc oxide, zinc sul­fide, zinc selenide and zinc telluride.
Claim 2
Dependent Claim 82 words
A thin film single crystal substrate which comprises a base substrate made of single crystal diamond and at least one thin film of a single crystal of a material selected from the group consisting of silicon carbide, sili­con, boron nitride, gallium nitride, indium nitride, alumi­num nitride, boron phosphide, cadmium selenide, germanium, gallium arsenide, gallium phosphide, indium phosphide, gallium antimonide, indium arsenide, indium antimonide, aluminum phosphide, aluminum arsenide, aluminum antimonide, cadmium telluride, mercury sulfide, zinc oxide, zinc sul­fide, zinc selenide and zinc telluride.
Claim 3
Dependent Claim 27 words
The thin film single crystal substrate accord­ing to claim 1, which further comprises an intermediate layer between the base substrate and the thin film of single crystal.
Claim 4
Dependent Claim 19 words
The thin film single crystal substrate accord­ing to claim 2, wherein the intermediate layer comprises a diamond single crystal.
Claim 5
Dependent Claim 37 words
The thin film single crystal substrate accord­ing to claim 1, wherein the diamond single crystal base is made of a p-type diamond containing at least one impurity element selected from the group consisting of boron and aluminum.
Claim 6
Dependent Claim 28 words
The thin film single crystal substrate accord­ing to claim 1, wherein the thin film single crystal comp­ rises a thin film of cubic system silicon carbide single crystal.
Claim 7
Dependent Claim 27 words
The thin film single crystal substrate accord­ing to claim 1, wherein the thin film single crystal comp­rises a thin film of hexagonal system silicon carbide single crystal.
Claim 8
Dependent Claim 44 words
The thin film single crystal substrate accord­ing to claim 1, wherein the thin film single crystal comp­rises a thin film of a p-type silicon carbide single crystal containing at least one impurity element selected from the group consisting of boron, aluminum, gallium and indium.
Claim 9
Dependent Claim 45 words
The thin film single crystal substrate accord­ing to claim 1, wherein the thin film single crystal comp­rises a thin film of an n-type silicon carbide single crys­tal containing at least one impurity element selected from the group consisting of nitrogen, phosphorus, arsenic, anti­mony and lithium.

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