Hollow cathode gun and deposition device for ion plating process

Claim 2

A hollow cathode gun for ion plating provided with a hollow cathode applied to deposition and ionization of a substance to be deposited in the ion plating through HCD process, characterized in that said hollow cathode consists of an outer layer made from a graphite and an inner layer made from Ta, W or LaB₆.

Claim 3

The hollow cathode gun according to claim 1, wherein an inner diameter of said outer layer and an outer diameter of said inner layer are gradually reduced toward a top opening of said hollow cathode.

Claim 4

The hollow cathode gun according to claim 1, wherein said inner layer is concentrically arranged inside said outer layer at a given space.

Claim 5

The hollow cathode gun according to claim 1, wherein a part or a whole of said inner layer is made from a wire.

Claim 6

A deposition device for ion plating through HCD process comprising at least one crucible housing a substance to be deposited, at least one hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode consists of an outer layer made of a graphite, an inner layer concentrically arranged inside said outer layer at a certain space and made of Ta, W or LaB₆ and a focusing coil surrounding the outer periphery of the outer layer and is arranged so as to determine an emission of plasma beam in a slant and downward direction with respect to the substance housed in said crucible, and a focusing coil for deflecting the emitted plasma beam in a normal direction to the surface of said substance housed in said crucible is arranged so as to surround the outer periphery of said crucible to thereby eliminate obstructions from a passage of moving vapor of said substance toward said substrate.

Claim 7

A deposition device for ion plating through HCD process comprising at least one crucible housing a substance to be deposited, at least one hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode consists of an outer layer made of a graphite, an inner layer concentrically arranged inside said outer layer at a certain space and made of Ta, W or LaB₆ and a focusing coil surrounding the outer periphery of the outer layer and is arranged so as to determine an emission of plasma beam in a slant and downward direction with respect to the substance housed in said crucible, and a focusing coil for deflecting the emitted plasma beam in a normal direction to the surface of said substance housed in said crucible is arranged so as to surround the outer periphery of said crucible to thereby eliminate obstructions from a passage of moving vapor of said substance toward said substrate.

Claim 8

A deposition device for ion plating through HCD process comprising at least one crucible housing a substance to be deposited, at least one hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode consists of an outer layer made of a graphite, an inner layer concentrically arranged inside said outer layer at a certain space and made of Ta, W or LaB₆ and a focusing coil surrounding the outer periphery of the outer layer and is arranged so as to determine an emission of plasma beam in a slant and downward direction with respect to the substance housed in said crucible, and a focusing coil for deflecting the emitted plasma beam in a normal direction to the surface of said substance housed in said crucible is arranged so as to surround the outer periphery of said crucible, and a beam wobbling magnetic field generator is further arranged in the vicinity of the crucible to wobble the deflected beam on the surface of the substance housed in the crucible to thereby eliminate obstructions from a passage of moving vapor of said substance toward said substrate.

Claim 9

A deposition device for ion plating through HCD process comprising at least one crucible housing a substance to be deposited, at least one hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode consists of an outer layer made of a graphite, an inner layer concentrically arranged inside said outer layer at a certain space and made of Ta, W or LaB₆ and a focusing coil surrounding the outer periphery of the outer layer and is arranged so as to determine an emission of plasma beam in a slant and downward direction with respect to the substance housed in said crucible, and a focusing coil for deflecting the emitted plasma beam in a normal direction to the surface of said substance housed in said crucible is arranged so as to surround the outer periphery of said crucible, and a beam wobbling magnetic field generator is further arranged in the vicinity of the crucible to wobble the deflected beam on the surface of the substance housed in the crucible to thereby eliminate obstructions from a passage of moving vapor of said substance toward said substrate.

Claim 10

The deposition device according to claim 5 or 6, wherein said focusing coil surrounding the outer periphery of the crucible surrounds the passage of moving the vapor of the substance in a range of from the crucible near to the substrate.

Claim 11

The deposition device according to claim 5 or 6, wherein said focusing coil surrounding the outer periphery of said crucible as a diameter gradually increasing from the crucible toward the substrate so as to surround the passage of moving the vapor of the substance in a range of from the crucible near to the substrate.

Claim 12

The deposition device according to anyone of claims 5 to 8, wherein at least one focusing coil is further arranged so as to surround the outer peripheries of the focusing coils surrounding each of at least two crucibles.

Claim 13

The deposition device according to anyone of claims 5 to 9, wherein said focusing coil is rectan­gular, ellipsoidal or peanut-like.

Claim 14

The deposition device according to anyone of claims 5 to 7, wherein said inlet for reaction gas is provided with a voltage applicable tube extending from said inlet and protruding into the inside of said vacuum chamber.

Claim 15

The deposition device according to anyone of claims 5 to 7, wherein a beam of hollow cathode discharge diffused in form of sheet is protruded into said vaccum chamber for promoting ionization of reaction gas.