EP0267513A2
Expired / Lapsed
EP
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Microwave enhanced CVD method and apparatus
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1987-11-02
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Granted: —
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Expires: 2007-11-02
Abstract
Abstract A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.
Inventors
- 👤 Takashi Inujima
- 👤 Naoki Hirose
- 👤 Mamoru Tashiro
- 👤 Shunpei Yamazaki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 07:57
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/02; H05H1/04; H05H1/08; C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/27; C23C16/274; C23C16/277; C23C16/44; C23C16/458; C23C16/48; C23C16/481; C23C16/50; C23C16/511; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32431; H01J37/3266; H01J37/32678
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
85 words
A microwave enhanced CVD apparatus comprising: a reaction chamber; a gas feeding system for inputting a reactive gas into said reaction chamber; a microwave generator connected with said reaction chamber to emit a microwave into a resonating space defined in said reaction chamber; a magnet provided for inducing a magnetic field in said resonating space; and means for holding an object to be coated in a region of said resonating space, the electric field of said microwave takeing its approximately maximum value within said region.
Claim 2
Dependent Claim
85 words
A microwave enhanced CVD apparatus comprising: a reaction chamber; a gas feeding system for inputting a reactive gas into said reaction chamber; a microwave generator connected with said reaction chamber to emit a microwave into a resonating space defined in said reaction chamber; a magnet provided for inducing a magnetic field in said resonating space; and means for holding an object to be coated in a region of said resonating space, the electric field of said microwave takeing its approximately maximum value within said region.
Claim 3
Dependent Claim
15 words
The apparatus of claim 1 further comprising means for controlling the temperature of said object.
Claim 4
Dependent Claim
13 words
The apparatus of claim 2 wherein said controlling means is an infrared heater.
Claim 5
Dependent Claim
16 words
The apparatus of claim 3 wherein said heater irradiates said holding means with an infrared light.
Claim 6
Dependent Claim
15 words
The apparatus of claim 4 wherein said infrared light is focused on said holding means.
Claim 7
Dependent Claim
15 words
The apparatus of claim 5 wherein said resonating space is surrounded by a cylindrical wall.
Claim 8
Dependent Claim
19 words
The apparatus of claim 6 wherein said magnet is a solenoid encircling the outer side of said cylindrical wall.
Claim 9
Dependent Claim
75 words
A microwave enhanced chemical vapor reation apparatus comprising: areaction chamber provided with means for evacuating said reaction chamber to a negative pressure; means for generating a microwave in said reaction chamber; and means for inducing a magnetic field in said reaction chamber; said apparatus characterized in that an electron cyclotron resonance condition between the magnetic field and the microwave is established in a region where the electric field of said microwave takes its maximum value.
Claim 10
Dependent Claim
75 words
A microwave enhanced chemical vapor reation apparatus comprising: areaction chamber provided with means for evacuating said reaction chamber to a negative pressure; means for generating a microwave in said reaction chamber; and means for inducing a magnetic field in said reaction chamber; said apparatus characterized in that an electron cyclotron resonance condition between the magnetic field and the microwave is established in a region where the electric field of said microwave takes its maximum value.
Claim 11
Dependent Claim
16 words
The apparatus of claim 8 wherein said chemical vapor reaction is carried out in said region.
Claim 12
Dependent Claim
30 words
A microwave enhanced CVD apparatus having a reactive gas introduction system, and a deposition space where an electron cyclotron resonance condition is established with a microwave and a magnetic field.
Claim 13
Dependent Claim
30 words
A microwave enhanced CVD apparatus having a reactive gas introduction system, and a deposition space where an electron cyclotron resonance condition is established with a microwave and a magnetic field.
Claim 14
Dependent Claim
86 words
A microwave enhanced CVD method comprising: introducing a reactive gas into a reaction chamber; inducing a magnetic field in said reaction chamber; inputting a microwave into said reaction chamber; exciting said reactive gas by said microwave under said magnetic field; and depositing a film on a surface to be coated by a chemical vapor reaction, said method characterized in that the deposition region is defined in the exciting region where said magnetic field and the microwave are cooperating with each other to excite said reactive gas.
Claim 15
Dependent Claim
86 words
A microwave enhanced CVD method comprising: introducing a reactive gas into a reaction chamber; inducing a magnetic field in said reaction chamber; inputting a microwave into said reaction chamber; exciting said reactive gas by said microwave under said magnetic field; and depositing a film on a surface to be coated by a chemical vapor reaction, said method characterized in that the deposition region is defined in the exciting region where said magnetic field and the microwave are cooperating with each other to excite said reactive gas.
Claim 16
Dependent Claim
80 words
A chemical vapor deposition method comprising: introducing a reactive gas into a reaction chamber; inducing a magnetic field in said reaction chamber; inputting a microwave into said reaction chamber; exciting said reactive gas with the energy of said microwave under said magnetic field; and depositing a product on a surface to be coated by a chemical vapor reaction, said method characterized in that the pressure of the reactive gas is kept between 1 Torr and 800 Torr during the process.
Claim 17
Dependent Claim
80 words
A chemical vapor deposition method comprising: introducing a reactive gas into a reaction chamber; inducing a magnetic field in said reaction chamber; inputting a microwave into said reaction chamber; exciting said reactive gas with the energy of said microwave under said magnetic field; and depositing a product on a surface to be coated by a chemical vapor reaction, said method characterized in that the pressure of the reactive gas is kept between 1 Torr and 800 Torr during the process.
Claim 18
Dependent Claim
16 words
The method of claim 12 wherein said pressure is chosen between 3 Torr and 30 Torr.
Claim 19
Dependent Claim
14 words
The method of claim 12 wherein said reactive gas is at least one hydrocarbon.
Claim 20
Dependent Claim
12 words
The method of claim 14 wherein the deposited product is a diamond.
Claim 21
Dependent Claim
12 words
The method of claim 14 wherein the deposited product is an i-carbon.
Claim 22
Dependent Claim
14 words
The method of claim 12 wherein said reactive gas is C₂H₆, C₂H₄ and/or C₂H₂.
Claim 23
Dependent Claim
71 words
A chemical vapor rection method comprising: disposing an object to be processed in a reaction chamber; inputting an reactive gas into said reaction chamber; energizing the reactive gas by means of a microwave in cooperation with a magnetic field; carring out a chemical vapor reaction on said object to be processed, said method characterized in that the pressure of said reactive gas is chosen so that a mixed resonance takes place.
Claim 24
Dependent Claim
71 words
A chemical vapor rection method comprising: disposing an object to be processed in a reaction chamber; inputting an reactive gas into said reaction chamber; energizing the reactive gas by means of a microwave in cooperation with a magnetic field; carring out a chemical vapor reaction on said object to be processed, said method characterized in that the pressure of said reactive gas is chosen so that a mixed resonance takes place.
Claim 25
Dependent Claim
18 words
The method of claim 18 wherein the strength of said magnetic field is 1 Kilo Gauss or stronger.
Claim 26
Dependent Claim
15 words
The method of claim 18 wherein the strength of said magnetic field is 2.45 GHz.
Claim 27
Dependent Claim
11 words
The method of claim 18 wherein said reactive gas is CH₄.
Claim 28
Dependent Claim
24 words
The method of claim 21 wherein said reactive gas is prepared by oxygen bubbling of organic solution of components which constitutes a superconducting material.
Claim 29
Dependent Claim
17 words
The method of claim 22 wherein said solution if an organic solution of Y(OC₂H₅)₃, Ba(OC₂H₅)₃ and CuBr₃.
References Cited (Backward Citations)
No citation records indexed.
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