EP0260718A2
Expired / Lapsed
EP
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An X-ray-transparent membrane and its production method
Assignee: Fujitsu Ltd
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Filing: 1987-09-18
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Granted: —
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Expires: 2007-09-18
Abstract
Abstract A membrane (12) of the present invention used for a mask (10 -13) for X-ray exposure is made of an amorphous of boron nitride carbide hydrogenated, containing 1 to 10 atomic percent of carbon. This membrane (12) is made in a plasma CVD, whose source gases are ammonia, diborane and ethane diluted in argon gas. The flow rate ratio of the ammonia to the diborane is 0.6 to 1.55, the deposition temperature is 350 to 500°C, the gas pressure is 60 to 250 Pa, an applied RF power is 0.1 to 0.17 W/cm². Thus formed membrane (12) is adequately transparent to visible light and the X-ray used for mask alignment, while keeping the stiffness enough and the residual stress properly tensile.
Inventors
- 👤 Masafumi Nakaishi
- 👤 Masao Maison De Noblesse 308 Yamada
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 11:45
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/36
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
141 words
A method for producing a hydrogenated amorphous boron nitride carbide of a membrane (12) of an X-ray mask (10 - 13) by a plasma chemical vapor deposition characterized by using a diborane gas (36) and ammonia gas (34) both diluted by an inert gas; and a methane gas (32), wherein the production conditions are specified by that: gas pressure is 60 to 250 Pascal; and correlation of deposition temperature and said flow rate ratio of said ammonia gas (34) to said diborane gas (36) is specified in between below-cited two formulas, where R indicates flow rate ratio of ammonia to diborane and T indicates deposition temperature in degree centigrade; for 350 to 450°C deposition temperature, R = 0.01T - 2.8 and R = 0.01 T - 3.2; and for 450 to 500°C deposition temperature, R = 1.7 and R = 1.3.
Claim 2
Independent Claim
141 words
A method for producing a hydrogenated amorphous boron nitride carbide of a membrane (12) of an X-ray mask (10 - 13) by a plasma chemical vapor deposition characterized by using a diborane gas (36) and ammonia gas (34) both diluted by an inert gas; and a methane gas (32), wherein the production conditions are specified by that: gas pressure is 60 to 250 Pascal; and correlation of deposition temperature and said flow rate ratio of said ammonia gas (34) to said diborane gas (36) is specified in between below-cited two formulas, where R indicates flow rate ratio of ammonia to diborane and T indicates deposition temperature in degree centigrade; for 350 to 450°C deposition temperature, R = 0.01T - 2.8 and R = 0.01 T - 3.2; and for 450 to 500°C deposition temperature, R = 1.7 and R = 1.3.
Claim 3
Dependent Claim
45 words
A method for producing a hydrogenated amorphous boron nitride carbide according to claim 1, characterizd by an applied radio frequency power which is 0.10 to 0.17 W/cm² calculated by area of a radio frequency electrode plate (23, 24) used in the plasma chemical vapor deposition.
Claim 4
Dependent Claim
51 words
A method for producing a hydrogenated amorphous boron nitride carbide according to claim 1 or 2, characterized in that said methane gas (32) is added to the ammonia (34) and the diborane gas (36) by 33 to 84 % in volume of the total of the ammonia and the diborane gas.
Claim 5
Dependent Claim
29 words
A method for producing a hydrogenated amorphous boron nitride carbide according to claim 2 or 3, characterized in that said applied radio frequency power (29) is of 13.56 MHz.
Claim 6
Independent Claim
43 words
A method for producing a hydrogenated amorphous boron nitride arbide according to any one of claims 2 to 4, characterized in that said electrodes (23, 24) to which said radio frequency power (29) is applied are in parallel and spaced by 35 mm.
Claim 7
Independent Claim
27 words
A method for producing a hydrogenated amorphous boron nitride carbide according to any one of claims 1 to 5, characterized in that said inert gas is argon.
Claim 8
Independent Claim
27 words
A method for producing a hydrogenated amorphous boron nitride carbide according to any one of claims 1 to 5, characterized in that said inert gas is nitrogen.
Claim 9
Dependent Claim
27 words
A hydrogenated amorphous boron nitride carbide of a membrane (12) of an X-ray mask (10 -13), characterized by comprising carbon atom contents by 1 to 10 %.
Claim 10
Dependent Claim
27 words
A hydrogenated amorphous boron nitride carbide of a membrane (12) of an X-ray mask (10 -13), characterized by comprising carbon atom contents by 1 to 10 %.
References Cited (Backward Citations)
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