EP0244842A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Apparatus for forming thin film
Assignee: Mitsubishi Heavy Industries Ltd
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Filing: 1987-05-06
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Granted: —
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Expires: 2007-05-06
Abstract
Abstract The present invention is directed to a method for forming a thin film by the use of a glow discharge plasma which comprises generating a magnetic field in a direction crossing an electric field for discharge at right angles and fluctuating the magnetic field; and the present invention is also directed to an apparatus for practicing the above method, which apparatus is composed of a reaction vessel, a means for permitting the pressure reduction in the reaction vessel and the feed of reaction gases thereto, electrodes for discharge disposed face to face in the reaction vessel, a power source from which a voltage for glow discharge is fed to the electrodes for discharge, a coil, surrounding the electrodes for discharge, for generating a magnetic field in a direction crossing at right angles an electric field generated between the electrodes for discharge, and an AC power source from which a current for magnetic field generation is fed to the coil, whereby the thin film is formed on a base plate supported outside the range of the discharge electric field and in parallel with the direction of the electric field.
Inventors
- 👤 Masayoshi C/O Nagasaki Technical Institute Murata
- 👤 Takashi C/O Nagasaki Technical Institute Yamamoto
- 👤 Yoshio C/O Nagasaki Technical Institute Kayumi
- 👤 Shozo C/O Nagasaki Shipyard & Engine Works Kaneko
- 👤 Tadashi C/O Nagasaki Shipyard & Engine Wks. Gengo
- 👤 Joji C/O Nagasaki Shipyard & Engine Wks. Ichinari
- 👤 Hiroshi 53-131 Minego Fujiyama
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 18:33
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/517; H; H10; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
38 words
A method for forming a thin film by the use of a glow discharge plasma which comprises generating a magnetic field in a direction crossing an electric field for discharge at right angles and fluctuating said magnetic field.
Claim 2
Independent Claim
38 words
A method for forming a thin film by the use of a glow discharge plasma which comprises generating a magnetic field in a direction crossing an electric field for discharge at right angles and fluctuating said magnetic field.
Claim 3
Dependent Claim
27 words
A method for forming a thin film according to Claim 1 wherein an amorphous thin film is formed by feeding a monosilane gas to said electric field.
Claim 4
Dependent Claim
43 words
A method for forming a thin film according to Claim 1 wherein a stabilized zirconia thin film is formed by feeding an oxygen gas, a zirconium chloride vapor and a chloride vapor of a divalent or a trivalent metal to said electric field.
Claim 5
Independent Claim
31 words
A method for forming a thin film according to any one of Claims 1 to 3 wherein a power source used to generate said magnetic field is a low-frequency power source.
Claim 6
Independent Claim
133 words
An apparatus for forming a thin film which comprises a reaction vessel, a means for permitting the pressure reduction in said reaction vessel and the feed of reaction gases thereto, electrodes for discharge disposed face to face in said reaction vessel, a power source from which a voltage for glow discharge is fed to said electrodes for discharge, a coil, surrounding said electrodes for discharge, for generating a magnetic field in a direction crossing at right angles an electric field generated between said electrodes for discharge, and an AC power source from which a current for magnetic field generation is fed to said coil, whereby said thin film is formed on a base plate supported outside the range of said discharge electric field and in parallel with the direction of said electric field.
Claim 7
Independent Claim
133 words
An apparatus for forming a thin film which comprises a reaction vessel, a means for permitting the pressure reduction in said reaction vessel and the feed of reaction gases thereto, electrodes for discharge disposed face to face in said reaction vessel, a power source from which a voltage for glow discharge is fed to said electrodes for discharge, a coil, surrounding said electrodes for discharge, for generating a magnetic field in a direction crossing at right angles an electric field generated between said electrodes for discharge, and an AC power source from which a current for magnetic field generation is fed to said coil, whereby said thin film is formed on a base plate supported outside the range of said discharge electric field and in parallel with the direction of said electric field.
Claim 8
Dependent Claim
25 words
An apparatus for forming a thin film according to Claim 5 wherein said electrodes for discharge are prolonged in the direction of said magnetic field.
Claim 9
Dependent Claim
38 words
An apparatus for forming a thin film according to Claim 5 or 6 wherein said base plate is tabular, and said electrodes for discharge are disposed in lines, with said base plate located between groups of said electrodes.
Claim 10
Dependent Claim
33 words
An apparatus for forming a thin film according to Claim 5 or 6 wherein said base plate is cylindrical, and said electrodes for discharge are disposed so as to surround said base plate.
Claim 11
Independent Claim
40 words
An apparatus for forming a thin film according to any one of Claims 5 to 8 wherein parmanent magnets are disposed in at least a partial extent on the wall surface of said reaction vessel, with magnetic poles thereof alternated.
Claim 12
Dependent Claim
31 words
An apparatus for forming a thin film according to any one of Claim 5 to 9 wherein said power source used to generate said magnetic field is a low-frequency power source.
Claim 13
Dependent Claim
51 words
An apparatus for forming a thin film according to any one of Claim 5 to 10 wherein a monosilane gas is fed by said means for permitting the pressure reduction in said reaction vessel and the feed of said reaction gases thereto, whereby said thin film of amorphous silicon is formed.
Claim 14
Independent Claim
65 words
An apparatus for forming a thin film according to any one of Claims 5 to 10 wherein an oxygen gas, a zirconium chloride vapor and a chloride vapor of a divalent or a trivalent metal are fed by said means for permitting the pressure reduction in said reaction vessel and the feed of said reaction gases, whereby said thin film of stabilized zirconia is formed.
References Cited (Backward Citations)
No citation records indexed.
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