EP0238416A2
Expired / Lapsed
EP
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X-ray lithography system
Assignee: Fujitsu Ltd
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Filing: 1987-03-18
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Granted: —
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Expires: 2007-03-18
Abstract
Abstract An X-ray lithography system, in which a X-ray beam(14) is separated from synchrotron radiation beans and reflected by scanning mirror (15) which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber (17) via a beryllium window(16) which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.
Inventors
- 👤 Toshihiko Osada
- 👤 Ichiro Honjo
- 👤 Kenji Sugishima
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 15:15
CPC Classifications
H; H05; H05G; H05G1/00; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70075; G03F7/708; G03F7/70808
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
135 words
An X-ray lithography system comprising: an X-ray generation source including means for separating an X-ray beam from synchrotron radiation beams; a vacuum chamber for defining a passage of the X-ray beam; a scanning mirror arranged in one section of said vacuum chamber for reflecting the X-ray beam; means for oscillating said scanning mirror so as to vertically scan the reflected X-ray beam; a beryllium window defined as a part of said vacuum chamber, through which the X-ray beam is irradiated into an exposure chamber in which is arranged a work to be exposed to the X-ray radiation; and, means for vertically oscillating said beryllium window in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam at a position of said beryllium window.
Claim 2
Dependent Claim
135 words
An X-ray lithography system comprising: an X-ray generation source including means for separating an X-ray beam from synchrotron radiation beams; a vacuum chamber for defining a passage of the X-ray beam; a scanning mirror arranged in one section of said vacuum chamber for reflecting the X-ray beam; means for oscillating said scanning mirror so as to vertically scan the reflected X-ray beam; a beryllium window defined as a part of said vacuum chamber, through which the X-ray beam is irradiated into an exposure chamber in which is arranged a work to be exposed to the X-ray radiation; and, means for vertically oscillating said beryllium window in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam at a position of said beryllium window.
Claim 3
Dependent Claim
34 words
A system as set forth in claim 1, wherein said beryllium window is relatively wide in the horizontal direction, but narrow in the vertical direction, and the thickness said beryllium window is relatively thin.
Claim 4
Dependent Claim
43 words
A system as set forth in claim 1, wherein said beryllium window is relatively wide in the horizontal direction, but narrow in the vertical direction and has a size of 50 mm x 5 mm, and a relatively thin thickness of 10 µm.
Claim 5
Dependent Claim
29 words
A system as set forth in claim 1, wherein the oscillating means for both the mirror and the window comprise linear motor which are connected to a controller, respectively.
References Cited (Backward Citations)
No citation records indexed.
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