EP0236914A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Fabrication of electronic devices utilizing lithographic techniques
Assignee: AT&T Inc
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Filing: 1987-03-03
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Granted: —
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Expires: 2007-03-03
Abstract
Abstract This invention concerns with a process for fabricating an article, such as an electronic device by the steps of forming a radiation-sensitive region on a substrate, patterning at least a portion of said region and further processing the substrate. The radiation-sensitive region comprises polymers formed from monomers such as chloromethyl styrene and trimethylsilylmethyl methacrylate. Such polymers form negative-acting resists that are sensitive to exposure by electron beam and deep UV radiation. These materials are particularly useful in bilevel resist applications for fabricating masks or for device processing.
Inventors
- 👤 Anthony Edward Novembre
- 👤 Elsa Reichmanis
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 13:31
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
105 words
A process for fabricating an article, comprising the steps of forming a radiation-sensitive region on a substrate, patterning at least a portion of said region, and further processing said substrate, CHARACTERIZED IN THAT said region comprises a composition formed by a polymerization process employing 1) at least one material represented by the formula: where n = 1, 2 or 3 and x , y , and z are individual methyl, ethyl, or methoxy, and 2) at least one material represented by the formula: where A is a naphthyl or phenyl moiety, and E is chosen from the group consisting of chloro, chloromethyl, dichloromethyl, and bromomethyl.
Claim 2
Dependent Claim
105 words
A process for fabricating an article, comprising the steps of forming a radiation-sensitive region on a substrate, patterning at least a portion of said region, and further processing said substrate, CHARACTERIZED IN THAT said region comprises a composition formed by a polymerization process employing 1) at least one material represented by the formula: where n = 1, 2 or 3 and x , y , and z are individual methyl, ethyl, or methoxy, and 2) at least one material represented by the formula: where A is a naphthyl or phenyl moiety, and E is chosen from the group consisting of chloro, chloromethyl, dichloromethyl, and bromomethyl.
Claim 3
Dependent Claim
17 words
The process according to claim 1, CHARACTERIZED IN THAT said composition is formed by a copolymerization process.
Claim 4
Dependent Claim
26 words
The process according to claim 1 or 2, CHARACTERIZED IN THAT a region capable of selective removal is interposed between said radiation-sensitive region and said substrate.
Claim 5
Dependent Claim
30 words
The process according to claim 3, CHARACTERIZED IN THAT said patterning comprises the step of subjecting said region to said radiation and then subjecting said region to a plasma discharge.
Claim 6
Dependent Claim
17 words
The process according to claim 4, CHARACTERIZED IN THAT said plasma discharge comprises an oxygen plasma discharge.
Claim 7
Dependent Claim
24 words
The process according to claim 4, CHARACTERIZED IN THAT said region capable of selective removal undergoes said removal by being subjected to a solvent.
Claim 8
Dependent Claim
14 words
The process according to claim 1, CHARACTERIZED IN THAT said article comprises a device.
Claim 9
Dependent Claim
15 words
The process according to claim 1, CHARACTERIZED IN THAT said article comprises a lithographic mask.
References Cited (Backward Citations)
No citation records indexed.
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