EP0220652A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method for manufacturing phase gratings of a combination pattern-refraction modification type
Assignee: Kuraray Co Ltd
•
Filing: 1986-10-20
•
Granted: —
•
Expires: 2006-10-20
Abstract
Abstract A method for manufacturing a combination pattern-refraction modification type phase grating comprises the steps of (1) forming a thin film of composition which includes a photosensitive acrylic acid or methacrylic acid group polymer including double bonds between carbons and at least one of compounds selected from aromatic aldehyde and aromatic ketone which have a substituent or a no-substituent, (2) irradiating the thin film in a regularly arranged pattern with ultraviolet rays and (3) removing the non-reacted compound.
Inventors
- 👤 Nobuhiro Kawatsuki
- 👤 Masao Uetsuki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 17:32
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/18; G03; G03F; G03F7/00; G03F7/0005; G03F7/001; G02B5/1847; G02B5/1857; G02B5/1866; G02B5/1871
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
79 words
A method for manufacturing combination pattern-refraction modification type phase gratings, comprising the steps of: (1) forming a thin film of composition which includes (A) an acrylic acid or methacrylic acid ester polymer including photosensitive double bonds between two carbons and (B) at least one of compounds selected from aromatic aldehyde and aromatic ketone which have a substituent or a no-substituent; (2) irradiating to thin film in a regularly arranged pattern with ultraviolet rays; and (3) removing non-reacted compound (B).
Claim 2
Independent Claim
79 words
A method for manufacturing combination pattern-refraction modification type phase gratings, comprising the steps of: (1) forming a thin film of composition which includes (A) an acrylic acid or methacrylic acid ester polymer including photosensitive double bonds between two carbons and (B) at least one of compounds selected from aromatic aldehyde and aromatic ketone which have a substituent or a no-substituent; (2) irradiating to thin film in a regularly arranged pattern with ultraviolet rays; and (3) removing non-reacted compound (B).
Claim 3
Dependent Claim
75 words
(2) A method according to Claim 1, in which the photosensitive acrylic acid ester or the methacrylic acid group polymer including double bonds between carbons comprises alcohol and ester including double bonds within molecules thereof and has the following general formula (I): where R, represents a hydrogen atom or an alkyl substituent including one to four carbons, R2 represents a substituent including at least one non-conjugate carbon-carbon double bond, preferably chain or cyclic terpene residue.
Claim 4
Dependent Claim
75 words
A method according to Claim 1, in which the aromatic aldehyde and the aromatic ketone comprise at least one carbonyl group and have the following general formula (II) or (III): where X, to X 6 represent hydrogen atoms, alkyl group including one to seven carbons, alkoxy group or allyloxy group including one to seven carbons, or halogen atoms and X, to X,. represent hydrogen atoms or halogen atoms, and n represents zero or an integer.
Claim 5
Dependent Claim
23 words
A method according to Claim 3, in which the aromatic ketone has triplet energy within a range from 65 kcal/mol to 77 kcal/mol.
Claim 6
Dependent Claim
25 words
A method according to Claim 1, in which the step of removing non-reacted compound (B) is effected by a heating process under a reduced pressure.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.