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EP0217463A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Method of determining an exposure dose of a photosensitive lacquer layer

Assignee: Koninklijke Philips NV
•
Filing: 1986-09-23
•
Granted: —
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Expires: 2006-09-23
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Abstract

Abstract On a photosensitive lacquer present on a substrate, details having a line width in the range of 0.5 µm - 2 µm have to be accurately reproduced in the lacquer layer. In order to determine the exposure dose, the lacquer layer is exposed through a raster pattern comprising alternately transparent and non-transparent line-shaped regions of the desired width. The raster pattern is then laterally displaced over a distance equal to the line width in a direction at right angles to the longitudinal direction of the lines, after which again an exposure is carried out at the same dose. The process is repeated at a few areas, but at a different exposure dose, after which a reference exposure dose is determined in that it is ascertained what dose is required to just dissolve entirely the photosensitive lacquer layer after development.

Inventors

  • 👤 Marinus C/O Int. Octrooibureau Vervoordeldonk
  • 👤 Rolandus C/O Int. Octrooibureau Leerschool

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 00:13
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70558; G03F7/20

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 168 words
A method of determining the exposure dose of a photosensitive lacquer layer present on a substrate in order to obtain a lacquer pattern on the substrate, in which after exposure through a mask followed by development of the lacquer details having a line width in the range of from 0.5 µm to 2 µm have to be accurately reproduced, characterized in that a lacquer layer present on the substrate is exposed through a raster pattern comprising alternately transparent and non-transparent line-shaped regions of desired width, and in that then the raster pattern is laterally displaced over a distance equal to the line width in a direction at right angles to the longitudinal direction of the lines, whereupon again an exposure is carried out at the same dose, which process is repeated at a few areas, but at a different exposure dose, after which a reference exposure dose is determined in that it is ascertained what dose is required to just dissolve entirely the photosensitive lacquer layer after development.
Claim 2
Independent Claim 168 words
A method of determining the exposure dose of a photosensitive lacquer layer present on a substrate in order to obtain a lacquer pattern on the substrate, in which after exposure through a mask followed by development of the lacquer details having a line width in the range of from 0.5 µm to 2 µm have to be accurately reproduced, characterized in that a lacquer layer present on the substrate is exposed through a raster pattern comprising alternately transparent and non-transparent line-shaped regions of desired width, and in that then the raster pattern is laterally displaced over a distance equal to the line width in a direction at right angles to the longitudinal direction of the lines, whereupon again an exposure is carried out at the same dose, which process is repeated at a few areas, but at a different exposure dose, after which a reference exposure dose is determined in that it is ascertained what dose is required to just dissolve entirely the photosensitive lacquer layer after development.
Claim 3
Dependent Claim 84 words
A method as claimed in Claim 1, characterized in that for a given kind of photosensitive lacquer the exposure required for obtaining the desired line width is determined, in that then the difference with the reference exposure dose obtained in the same process conditions is determined, and in that for each lot of substrates to be treated an exposure is chosen equal to sum of the reference exposure does in the process conditions then to be chosen and the said differential value is determined.

References Cited (Backward Citations)

US2495778A Cited
DE3305977A1 Cited

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