EP0206145A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
A method of metallising an organic substrate so as to achieve improved adhesion of the metal
Assignee: International Business Machines Corp
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Filing: 1986-06-12
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Granted: —
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Expires: 2006-06-12
Abstract
Abstract Metal-organic substrate adhesion is improved by irradiating the substrate with low energy reactive ions, electrons, or photons to alter the chemical composition of a surface layer of the substrate to a depth of from about 1 nm to a few tens of nanometers. The energy of the incident reactive ions and electrons can be in the range of about 50 to 2000 eV, while the energy of the incident photons can be in the range of about 0.2 -500 eV. Irradiation of the substrate can occur prior to or during metal deposition. For simultaneous metal deposition/particle irradiation, the arrival rates of the metal atoms and the substrate treatment particles are within a few orders of magnitude of one another. The low energy irradiation can be conducted at room temperature or elevated temperatures.
Inventors
- 👤 Joachim Gerhard Clabes
- 👤 Peter Otto Hahn
- 👤 Paul Siu-Chung Ho
- 👤 Haralambos Nmn Lefakis
- 👤 Gary Wayne Rubloff
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-25 19:58
CPC Classifications
B; B29; B29C; B29C59/00; B29C59/16; C; C23; C23C; C23C14/00; C23C14/02; C23C14/021; C23C14/022; C23C16/00; C23C16/02; C23C16/0254; C23C16/0263; B29C35/00; B29C35/02; B29C35/08; B29C35/0866; B29C2035/0872; B29C2035/0877; B29K; B29K2079/00
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
112 words
A method of metallising an organic substrate so as to achieve improved adhesion of the metal, comprising irradiating a surface of the substrate with low energy particles, said particles being either (a) reactive ions or electrons having energies in the range of about 50 to 2000 eV; or (b) photons having energies in the range of about 0.2 to 500 eV, the surface being subjected to said irradiation until the chemical composition of the substrate is altered due to said irradiation to a depth of approximately 1 to 30 nm from said surface, and depositing metal onto the irradiated surface at an initial rate of approximately 0.1 to 10 nm per second.
Claim 2
Independent Claim
112 words
A method of metallising an organic substrate so as to achieve improved adhesion of the metal, comprising irradiating a surface of the substrate with low energy particles, said particles being either (a) reactive ions or electrons having energies in the range of about 50 to 2000 eV; or (b) photons having energies in the range of about 0.2 to 500 eV, the surface being subjected to said irradiation until the chemical composition of the substrate is altered due to said irradiation to a depth of approximately 1 to 30 nm from said surface, and depositing metal onto the irradiated surface at an initial rate of approximately 0.1 to 10 nm per second.
Claim 3
Dependent Claim
18 words
A method as claimed in claim 1, in which the metal is deposited by vacuum deposition or sputtering.
Claim 4
Dependent Claim
18 words
A method as claimed in claim or claim 2, in which the metal is deposited at room temperature.
Claim 5
Dependent Claim
40 words
A method as claimed in claim 1 or claim 2, in which the substrate is a polymer and in which the metal is deposited at a temperature greater than room temperature but less than the curing temperature of the polymer.
Claim 6
Dependent Claim
19 words
A method as claimed in claim 4, in which the substrate consists of polymide, polyester, Mylar, Teflon or epoxy.
Claim 7
Independent Claim
20 words
A method as claimed in any preceding claim, in which the irradiation occurs prior to the deposition of the metal.
Claim 8
Independent Claim
62 words
A method as claimed in any of claims 1 to 5, in which the irradiation and the metal deposition occur simultaneously at least until a continuous metal film is formed on said substrate surface, the rates of arrival at said substrate surface of said low energy particles and atoms of said metal being within approximately 2 orders of magnitude of one another.
Claim 9
Independent Claim
24 words
A method as claimed in any preceding claim, in which the irradiation occurs with a particle flux of about 10 15 -10 17 particleslcm2-sec.
Claim 10
Independent Claim
29 words
A method as claimed in any preceding claim, in which the irradiation is with reactive ions or electrons having energies in the range of about 200 to 500 eV.
Claim 11
Independent Claim
29 words
A method as claimed in any of claims 1 to 8, in which the irradiation is with photons having energies in the range of about 0.5 to 10 eV.
Claim 12
Independent Claim
25 words
A method as claimed in any preceding claim, in which the metal consists of Ni, Cu, Ti, AI, Cr, Mo, W, Rh, Pt or Pd.
Claim 13
Dependent Claim
27 words
A method as claimed in claim 11, in which the irradiation is with ions of 0, N. S, F, Cl, CF 4 , CC4, CO, or H.
Claim 14
Independent Claim
36 words
A method as claimed in any preceding claim, in. which the substrate consists of polyimide, the substrate surface is irradiated with low energy oxygen or nitrogen ions and copper is deposited on the irradiated substrate surface.
References Cited (Backward Citations)
No citation records indexed.
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