EP0204538A2
Expired / Lapsed
EP
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Phototreating method and apparatus therefor
Assignee: Toshiba Corp
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Filing: 1986-06-02
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Granted: —
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Expires: 2006-06-02
Abstract
Abstract A phototreating method comprises the steps of introducing a photoreactive gas into a chamber (11) housing a workpiece (12), emitting first light substantially perpendicularly to a surface of the workpiece (12), and emitting second light substantially perpendicularly to the surface of the workpiece (12) simultaneously with or after radiation of the first light. The surface of the workpiece (12) is treated utilizing a photochemical reaction of the photoreactive gas caused by radiation of the first light and/or the second light.
Inventors
- 👤 Makoto 1-2 Daisan-Matsuba-So Sekine
- 👤 Haruo Okano
- 👤 Yasuhiro Horiike
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-29 15:16
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/482; H; H10; H10P; H10P14/00; H10P14/60; H10P14/65; H10P14/6516; H10P14/6529; C23C16/483; C23F; C23F4/00; H10P14/6536; H10P14/6538; H10P14/6542; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10P50/244; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268; H10P50/28; H10P50/282; H10P50/283; H10P50/71
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
80 words
A phototreating method comprising the steps of: introducing a photoreactive gas into a chamber (11) housing a workpiece; applying first light substantially perpendicularly to a surface of the workpiece (12); and applying second light substantially perpendicularly to the surface of the workpiece (12) simultaneously with or after application of the first light, wherein the surface of the workpiece (12) is treated utilizing a photochemical reaction of the photoreactive gas caused by radiation of the first light and/or the second light.
Claim 2
Dependent Claim
80 words
A phototreating method comprising the steps of: introducing a photoreactive gas into a chamber (11) housing a workpiece; applying first light substantially perpendicularly to a surface of the workpiece (12); and applying second light substantially perpendicularly to the surface of the workpiece (12) simultaneously with or after application of the first light, wherein the surface of the workpiece (12) is treated utilizing a photochemical reaction of the photoreactive gas caused by radiation of the first light and/or the second light.
Claim 3
Dependent Claim
16 words
A method according to claim 1, characterized in that the photoreactive gas comprises an etching gas.
Claim 4
Dependent Claim
29 words
A method according to claim 2, characterized in that the etching gas is a member selected from the group including a halogen gas and a gas containing halogen atoms.
Claim 5
Dependent Claim
25 words
A method according to claim 2, characterized in that the etching gas is a member selected from the group consisting of chlorine and carbon tetrachloride.
Claim 6
Dependent Claim
47 words
A method according to claim 2, characterized in that the first light has a wavelength that promotes reaction between the etching gas and the workpiece (12), and the second light has a wavelength that promotes dissociation of a product formed by the reaction on the workpiece (12).
Claim 7
Dependent Claim
41 words
A method according to claim 2, characterized in that the first light and the second light have the same wavelength, the first light is radiated onto an entire surface of the workpiece (12), and the second light is selectively radiated thereonto.
Claim 8
Dependent Claim
16 words
A method according to claim 1, characterized in that the photoreactive gas comprises a deposition gas.
Claim 9
Dependent Claim
22 words
A method according to claim 7, characterized in that the deposition gas comprises one of an organometallic compound and a halide thereof.
Claim 10
Dependent Claim
35 words
A method according to claim 8, characterized in that the organometallic compound is a member selected from the group consisting of an organosilane compound, organogermanium compound, organoaluminum compound, organophosphine compound, organoborane compound and organoarsine compound.
Claim 11
Dependent Claim
25 words
A method according to claim 7, characterized in that the deposition gas is a member selected from the group consisting of silane, arsine and phosphine.
Claim 12
Dependent Claim
77 words
A method according to claim 7, characterized in that the first light has a wavelength that allows dissociation of the deposition gas to form a film on the surface of the workpiece (12), the second light has a wavelength that can ablate the film, and the second light is emitted selectively after the first light is radiated on the entire surface of the workpiece (12), thereby selectively removing a film on the surface of the workpiece (12).
Claim 13
Dependent Claim
22 words
A method according to claim 11, characterized in that selective radiation of the second light is performed through a mask pattern (31).
Claim 14
Dependent Claim
69 words
A method according to claim 7, characterized in that the first light and second light have a wavelength that allows dissociation of the deposition gas to form a film on the surface of the workpiece (71), the surface of the workpiece (71) has a step (72), and the second light is radiated on the step after the first light is radiated on the entire surface of the workpiece (71).
Claim 15
Dependent Claim
41 words
A method according to claim 1, characterized in that the etching gas and the deposition gas are introduced into said container (11), the etching gas is dissociated by the first light, and the deposition gas is dissociated by the second light.
Claim 16
Dependent Claim
22 words
A method according to claim 14, characterized in that the first light and second light are alternately applied a plurality of times.
Claim 17
Dependent Claim
57 words
A phototreating apparatus comprising: a chamber (11) for housing a workpiece (11); means for evacuating a gas in said chamber; a first light source (16) for applying first light substantially perpendicularly to a surface of the workpiece (12); and a second light source (19) for applying second light substantially perpendicularly to the surface of the workpiece (12).
Claim 18
Dependent Claim
57 words
A phototreating apparatus comprising: a chamber (11) for housing a workpiece (11); means for evacuating a gas in said chamber; a first light source (16) for applying first light substantially perpendicularly to a surface of the workpiece (12); and a second light source (19) for applying second light substantially perpendicularly to the surface of the workpiece (12).
Claim 19
Dependent Claim
19 words
An apparatus according to claim 16, characterized in that said first and second light sources (16, 19) are lasers.
Claim 20
Dependent Claim
28 words
An apparatus according to claim 16, characterized in that said first light source (16) is an excimer laser and said second light source (19) is a mercury lamp.
Claim 21
Dependent Claim
27 words
An apparatus according to claim 16, characterized in that at least one of said first and second light sources (16, 19) comprises an optical lens system (32).
Claim 22
Dependent Claim
31 words
An apparatus according to claim 16, characterized by further comprising a reflective mirror (38) for applying at least one of the first light and second light perpendicularly onto the workpiece (12).
References Cited (Backward Citations)
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