EP0202458A2
Expired / Lapsed
EP
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Cross-linked polyalkenyl phenol based photoresist compositions
Assignee: International Business Machines Corp
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Filing: 1986-04-11
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Granted: —
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Expires: 2006-04-11
Abstract
Abstract A film forming, radiation sensitive resist composition having improved thermal stability and a reduced dissolution rate in developer solutions, comprised of a sensitizer and a polyalkenyl phenol such as a polyvinyl phenol cross-linked, prior to irradiation, with a polyfunctional cross-linking agent such as dimethylol p-cresol or hexamethylene tetramine and a process for the production of a resist image using said composition is described.
Inventors
- 👤 Stephen Edward Greco
- 👤 Dennis Clinton Green
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 09:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/022; G03F7/023; G03F7/0233; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
46 words
Process for the production of a resist image which comprises depositing a layer on a substrate, the layer comprised of a sensitizer and a polyalkenyl phenol cross-linked with a polyfunctional cross-linking compound, exposing the layer patter- nwise to radiation and then developing the pattern- exposed layer.
Claim 2
Dependent Claim
46 words
Process for the production of a resist image which comprises depositing a layer on a substrate, the layer comprised of a sensitizer and a polyalkenyl phenol cross-linked with a polyfunctional cross-linking compound, exposing the layer patter- nwise to radiation and then developing the pattern- exposed layer.
Claim 3
Dependent Claim
11 words
Process of claim 1 wherein the polyalkenyl phenol is polyvinyl phenol.
Claim 4
Dependent Claim
12 words
Process of claim 1 wherein the cross-linking agent is a polymethylol phenol.
Claim 5
Dependent Claim
11 words
Process of claim 3 wherein the polymethylol phenol is dimethylol p-cresol.
Claim 6
Dependent Claim
12 words
Process of claim 1 wherein the cross-linking agent is a hydrolyzable polyamine.
Claim 7
Dependent Claim
11 words
Process of claim 5 wherein the polyamine is hydrolyzable aliphatic polyamine.
Claim 8
Dependent Claim
11 words
Process of claim 6 wherein the aliphatic polyamine is hexamethylene tetramine.
Claim 9
Dependent Claim
21 words
Process of claim 1 wherein the polyalkenyl phenol is cross-linked with 1 to 15 percent by weight of the polyfunctional compound.
Claim 10
Dependent Claim
17 words
Process of claim 1 wherein the layer contains 0.1 to 25 percent by weight of the sensitizer.
Claim 11
Dependent Claim
16 words
Process of claim 1 wherein the cross-linked polyalkenyl phenol containing layer is exposed to ultraviolet radiation.
Claim 12
Dependent Claim
18 words
Process of claim 1 wherein the radiation exposed cross-linked polyalkenyl phenol layer is developed in an alkaline solution.
Claim 13
Dependent Claim
34 words
Film forming, radiation sensitive photoresist composition comprised of a sensitizer and a polyalkenyl phenol cross-linked with a polyfunctional cross-linking agent prior to irradiation for use in a process according to claims 1 to 11.
References Cited (Backward Citations)
No citation records indexed.
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