EP0198422A2
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EP
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Soft magnetic thin film
Assignee: Sony Corp
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Filing: 1986-04-10
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Granted: —
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Expires: 2006-04-10
Abstract
Abstract Disclosed is a soft magnetic thin film which has superior soft magnetic characteristics and high saturation magnetic flux density. The magnetic thin film is formed by physical vapour deposition process and composed of Fe, Ga, and Si with optional inclusion of Co, Ru, or Cr.
Inventors
- 👤 Kazuhiko Hayashi
- 👤 Masatoshi Hayakawa
- 👤 Yoshitaka Ochiai
- 👤 Hideki Matsuda
- 👤 Wataru Ishikawa
- 👤 You Iwasaki
- 👤 Kouichi Aso
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 13:15
CPC Classifications
H; H01; H01F; H01F10/00; H01F10/08; H01F10/10; H01F10/12; H01F10/16; H01F10/14; H01F10/142
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
32 words
A soft magnetic thin film having a composition represented by the following formula; wherein a, b, and c each represents atomic percent of the respective elements and satisfies the following relations of
Claim 2
Dependent Claim
32 words
A soft magnetic thin film having a composition represented by the following formula; wherein a, b, and c each represents atomic percent of the respective elements and satisfies the following relations of
Claim 3
Dependent Claim
33 words
A soft magnetic thin film having a composition represented by the following formula; wherein a, b, c, and d each represents atomic percent of the respective elements and satisfies the following relations of
Claim 4
Dependent Claim
33 words
A soft magnetic thin film having a composition represented by the following formula; wherein a, b, c, and d each represents atomic percent of the respective elements and satisfies the following relations of
Claim 5
Dependent Claim
29 words
A soft magnetic thin film according to claim 1, part of Fe, Ga, or Si is replaced by Ru with an amount ranging between 0.1 and 10 atomic percent.
Claim 6
Dependent Claim
21 words
A soft magnetic thin film according to claim 2, said thin film further includes between 0.5 and 7 atomic percent Cr.
References Cited (Backward Citations)
No citation records indexed.
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