EP0190051A2
Expired / Lapsed
EP
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Method and apparatus for forming films
Assignee: Toshiba Corp
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Filing: 1986-01-30
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Granted: —
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Expires: 2006-01-30
Abstract
Abstract In a method and apparatus for forming a film wherein ions formed by electric discharge are caused to sputter a target electrode (7), and atoms emitted by the target electrode (7) as a result of sputtering are deposited on the surface of a substrate (9) to form the film, light is projected upon the surface of the substrate (9) to activate the same.
Inventors
- 👤 Tetsuo Matsuda
- 👤 Hitoshi Ito
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 06:34
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3435
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
55 words
A method of forming a film of the type wherein a target electrode is sputtered by ions formed by electric discharge for depositing material of the target electrode on the surface of a substrate to form the film, characterized by the step of depositing said material on said surface while activating the same with light.
Claim 2
Independent Claim
55 words
A method of forming a film of the type wherein a target electrode is sputtered by ions formed by electric discharge for depositing material of the target electrode on the surface of a substrate to form the film, characterized by the step of depositing said material on said surface while activating the same with light.
Claim 3
Dependent Claim
22 words
The method according to claim 1 wherein said substrate contains non-refractory metal and said light has a wavelength shorter than 1000 nm.
Claim 4
Dependent Claim
24 words
The method according to claim 1 wherein said film is made of silicon dioxide and said light has a wavelength longer than 5000 nm.
Claim 5
Dependent Claim
29 words
The method according to claim 1 wherein said film is made of a member selected from the group consisting of refractory metals, silicide of refractory metal, and polycrystalline silicon.
Claim 6
Dependent Claim
60 words
Film forming apparatus of the type wherein ions formed by electric discharge are caused to collide upon a target electrode and atoms emitted from the target electrode as a result of sputtering of the ions are deposited on the surface of a substrate characterized in that there. is provided means for projecting light of a predetermined wavelength upon the substrate.
Claim 7
Dependent Claim
60 words
Film forming apparatus of the type wherein ions formed by electric discharge are caused to collide upon a target electrode and atoms emitted from the target electrode as a result of sputtering of the ions are deposited on the surface of a substrate characterized in that there. is provided means for projecting light of a predetermined wavelength upon the substrate.
References Cited (Backward Citations)
No citation records indexed.
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