EP0182377A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Process for making a thin film capacitor
Assignee: Individual
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Filing: 1985-11-21
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Granted: —
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Expires: 2005-11-21
Abstract
Abstract Translated from German Mit dem erfindungsgemässen Verfahren lassen sich Dünnschichtkondensatoren (20) mit LCVD-Technologie auf einem Substrat herstellen. Dieses Substrat kann insbesondere ein solches einer IC-Schaltung sein. With the method according to the invention, thin-film capacitors (20) can be produced on a substrate using LCVD technology. This substrate can in particular be one of an IC circuit.
Inventors
- 👤 Dieter Prof. Dr. Bäuerle
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 23:55
CPC Classifications
H; H01; H01G; H01G4/00; H01G4/002; H01G4/018; H01G4/06; H01G4/08; H01G4/085; H01G4/30; H01G4/306; Y; Y10; Y10S; Y10S148/00; Y10S148/014; Y10S148/093
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