EP0177312A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Gas-sensitive composite material comprising metal and dielectric and process for producing same
Assignee: Tonen General Sekiyu KK
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Filing: 1985-09-30
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Granted: —
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Expires: 2005-09-30
Abstract
Abstract A gas-sensitive composite material comprises a porous dielectric having micropores and a thin film consisting of ultrafine metal particles dispersed in, and supported by, at least the porous surface layers of the dielectric.The gas-sensitive composite material is produced by a method comprising the steps of: forming a thin film of conductive ultrafine metal particles on at least the porous surface layers of a porous dielectric and dispersing the thin film metal, in a size similar to the pore opening, continuously or partly discontinuously in the porous layers, whereby a three-dimensional composite material is obtained.
Inventors
- 👤 Hiroshi Komiyama
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 21:07
CPC Classifications
G; G01; G01N; G01N27/00; G01N27/02; G01N27/04; G01N27/12; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24942; Y10T428/2495; Y10T428/249921; Y10T428/249953; Y10T428/249955; Y10T428/249956; Y10T428/249957; Y10T428/249967; Y10T428/249969; Y10T428/24997; Y10T428/249978; Y10T428/249979; Y10T428/249986
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
33 words
A gas-sensitive composite material comprising a porous dielectric having micropores and a thin film consisting of ultrafine metal particles dispersed in, and supported by, at least the porous surface layers of the dielectric.
Claim 2
Dependent Claim
33 words
A gas-sensitive composite material comprising a porous dielectric having micropores and a thin film consisting of ultrafine metal particles dispersed in, and supported by, at least the porous surface layers of the dielectric.
Claim 3
Dependent Claim
27 words
A composite material as claimed in claim 1, characterised in that said porous dielectric is at least one selected from metal oxides and nitrides having dielectric properties.
Claim 4
Dependent Claim
51 words
A composite material as claimed in claim 1, characterised in that said metal oxide or nitride is at least one selected from the oxides and nitrides of the metals of Groups IIA, IIIA, IIIB excluding boron, IVB excluding carbon, VA, VIA, and VIB excluding oxygen and sulfur of the Periodic Table.
Claim 5
Dependent Claim
39 words
A composite material as claimed in claim 2 or claim 3, characterised in that said porous dielectric is one consisting of a substance selected from porous glass, Ti0 2 -containing porous glass, porous alumina, porous titania, and porous zirconia.
Claim 6
Dependent Claim
41 words
A composite material as claimed in claim 1, characterised in that said thin film consisting of ultrafine metal particles is one consisting of ultrafine particles of at least one metal selected from the metals of Groups IB, IIB, VIIB, and VIII.
Claim 7
Dependent Claim
49 words
A composite material as claimed in claim 5, characterised in that said thin film of ultrafine metal particles is one consisting of ultrafine particles of at least one metal selected from Ag, Au, Cu, Fe, Co, Ni, Ru, Rh, Pd, Pt, Ir, Cr, Al, Zn, Sn, In, and Pb.
Claim 8
Dependent Claim
28 words
A composite material as claimed in claim 1, characterised in that said porous surface layers of said porous dielectric have a thickness of 50 to 10 7 A.
Claim 9
Dependent Claim
50 words
A composite material as claimed in claim 1, characterised in that the total volume of micropores 500 A or smaller in size that are present in the porous surface layers of said porous dielectric account for 10 to 70% of the total volume of at least said porous surface layers.
Claim 10
Dependent Claim
49 words
A composite material as claimed in claim 1, characterised in that the gases to which said material is sensitive are 0 2 , NO, N 2 0, N0 2 , S0 2 , S0 3 , CO, H 2 , NH 3 , methane, ethylene, ethane, propylene, and propane.
Claim 11
Dependent Claim
65 words
A process for producing a gas-sensitive composite material comprising a metal and a dielectric characterised by forming a thin film of conductive ultrafine metal particles on at least the porous surface layers of a porous dielectric and dispersing the thin film metal, in a size similar to the pore opening, continuously or partly discontinuously in the porous layers, whereby a three-dimensional composite material is obtained.
Claim 12
Dependent Claim
65 words
A process for producing a gas-sensitive composite material comprising a metal and a dielectric characterised by forming a thin film of conductive ultrafine metal particles on at least the porous surface layers of a porous dielectric and dispersing the thin film metal, in a size similar to the pore opening, continuously or partly discontinuously in the porous layers, whereby a three-dimensional composite material is obtained.
Claim 13
Dependent Claim
26 words
A process as claimed in claim 10, characterised in that said porous dielectric is at least one selected from metal oxides and nitrides having dielectric properties.
Claim 14
Dependent Claim
50 words
A process as claimed in claim 11, .characterised in that said metal oxide or nitride is at least one selected from the oxides and nitrides of the metals of Groups IIA, IIIA, IIIB excluding boron, IVB excluding carbon, VA, VIA, and VIB excluding oxygen and sulfur of the Periodic Table.
Claim 15
Dependent Claim
40 words
A process as claimed in claim 10, characterised in that said thin film consisting of ultrafine metal particles is one consisting of ultrafine particles of at least one metal selected from the metals of Groups IB, IIB, VIIB, and VIII.
Claim 16
Dependent Claim
140 words
A process as claimed in claim 10 for producing a gas-sensitive composite material comprising a metal and a dielectric, which process comprises the sequence of steps of (a) contacting said porous dielectric with one or two solutions selected from among aqueous solutions of at least one or organic and inorganic salts of said metal and organic solvent solutions of at least one of organic and inorganic salts of said metal; (b) drying the dielectric treated in the step (a); (c) repeating the steps (a) and (b), according to the necessity, until the porous layers of the dielectric is impregnated with a predetermined amount of the metal salt or salts; and (d) reducing the metal salt or salts contained in a predetermined amount in the porous dielectric obtained by the step (a), (b), or (c) to form the metal or metals.
Claim 17
Dependent Claim
73 words
A process as claimed in claim 10, characterised by forming the thin film of conductive ultrafine metal particles on at least the porous surface layers of the porous dielectric by at least one means selected from sputtering, vacuum deposition, and chemical vapour deposition (CVD) and dispersing the thin film metal, in a size similar to the pore opening, continuously or partly discontinuously in the porous layers, whereby a three-dimensional composite material is obtained.
References Cited (Backward Citations)
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